loadpatents
Patent applications and USPTO patent grants for Matsuzawa; Koumei.The latest application filed is for "film-forming apparatus and film-forming method".
Patent | Date |
---|---|
Substrate treatment method and film forming method, film forming apparatus, and computer program Grant 7,699,945 - Yoshii , et al. April 20, 2 | 2010-04-20 |
Film-forming Apparatus And Film-forming Method App 20090029047 - Yoshii; Naoki ;   et al. | 2009-01-29 |
Method for cleaning substrate processing chamber Grant 7,456,109 - Yamasaki , et al. November 25, 2 | 2008-11-25 |
Substrate Treatment Method And Film Forming Method, Film Forming Apparatus, And Computer Program App 20080020934 - YOSHII; Naoki ;   et al. | 2008-01-24 |
CVD process capable of reducing incubation time Grant 7,063,871 - Yamasaki , et al. June 20, 2 | 2006-06-20 |
Method for cleaning substrate processing chamber App 20060124151 - Yamasaki; Hideaki ;   et al. | 2006-06-15 |
Film deposition method App 20060121307 - Matsuzawa; Koumei ;   et al. | 2006-06-08 |
Deposition method App 20060099348 - Narushima; Masaki ;   et al. | 2006-05-11 |
Film formation method App 20060084266 - Narushima; Masaki ;   et al. | 2006-04-20 |
CVD process capable of reducing incubation time App 20040025789 - Yamasaki, Hideaki ;   et al. | 2004-02-12 |
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