loadpatents
name:-0.048293828964233
name:-0.021209001541138
name:-0.0059890747070312
MATSUYAMA; Shoichiro Patent Filings

MATSUYAMA; Shoichiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for MATSUYAMA; Shoichiro.The latest application filed is for "electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing method".

Company Profile
7.21.39
  • MATSUYAMA; Shoichiro - Kurokawa-gun Miyagi
  • MATSUYAMA; Shoichiro - Miyagi JP
  • - Yamanashi JP
  • Matsuyama; Shoichiro - Yamanashi N/A JP
  • MATSUYAMA; Shoichiro - Kurogkawa-gun JP
  • Matsuyama; Shoichiro - Yamanashi-Ken N/A JP
  • Matsuyama; Shoichiro - Nirasaki JP
  • Matsuyama; Shoichiro - Kurokawa JP
  • Matsuyama; Shoichiro - Nirasaki-Shi JP
  • MATSUYAMA; Shoichiro - Nirasaki City JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Electrostatic Chuck, Focus Ring, Support Base, Plasma Processing Apparatus, And Plasma Processing Method
App 20210366694 - SASAKI; Yasuharu ;   et al.		2021-11-25
Plasma Processing Apparatus, Semiconductive Member, And Semiconductive Ring
App 20210280397 - KUROSAWA; Yoichi ;   et al.		2021-09-09
Plasma Processing Apparatus And Plasma Processing Method
App 20210233794 - MATSUYAMA; Shoichiro ;   et al.		2021-07-29
Edge Ring And Substrate Processing Apparatus
App 20210175051 - MATSUYAMA; Shoichiro		2021-06-10
Plasma processing apparatus and plasma processing method
Grant 11,004,717 - Matsuyama , et al. May 11, 2		2021-05-11
Attracting Method, Mounting Table, And Plasma Processing Apparatus
App 20210126559 - MATSUYAMA; Shoichiro		2021-04-29
Plasma Processing Apparatus, Electrostatic Attraction Method, And Electrostatic Attraction Program
App 20210074522 - MATSUYAMA; Shoichiro ;   et al.		2021-03-11
Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program
Grant 10,879,050 - Matsuyama , et al. December 29, 2		2020-12-29
Mounting Stage, Substrate Processing Device, and Edge Ring
App 20200194239 - SASAKI; Yasuharu ;   et al.		2020-06-18
Plasma Processing Apparatus And Plasma Processing Method
App 20190088523 - MATSUYAMA; Shoichiro ;   et al.		2019-03-21
Plasma Processing Apparatus, Electrostatic Attraction Method, And Electrostatic Attraction Program
App 20180350565 - MATSUYAMA; Shoichiro ;   et al.		2018-12-06
Substrate processing apparatus
Grant 9,390,943 - Nagaseki , et al. July 12, 2		2016-07-12
Method of manufacturing semiconductor device
Grant 9,230,824 - Takayama , et al. January 5, 2		2016-01-05
Method Of Manufacturing Semiconductor Device
App 20150179466 - TAKAYAMA; Wataru ;   et al.		2015-06-25
Electrode and plasma processing apparatus
Grant 08920598 - 		2014-12-30
Electrode and plasma processing apparatus
Grant 8,920,598 - Hayashi , et al. December 30, 2		2014-12-30
Plasma Etching Method And Plasma Etching Apparatus
App 20140284308 - MATSUYAMA; Shoichiro ;   et al.		2014-09-25
Plasma etching unit
Grant 8,840,753 - Honda , et al. September 23, 2		2014-09-23
Table for use in plasma processing system and plasma processing system
Grant 8,741,098 - Koshiishi , et al. June 3, 2		2014-06-03
Upper electrode and plasma processing apparatus
Grant 8,636,872 - Matsuyama January 28, 2		2014-01-28
Substrate Processing Apparatus
App 20130220547 - NAGASEKI; Kazuya ;   et al.		2013-08-29
Electrostatic chuck and substrate processing apparatus having same
Grant 8,295,026 - Matsuyama October 23, 2		2012-10-23
Dry etching method
Grant 8,293,655 - Honda , et al. October 23, 2		2012-10-23
Electrostatic chuck device
Grant 8,284,538 - Himori , et al. October 9, 2		2012-10-09
Upper Electrode And Plasma Processing Apparatus
App 20120206033 - Matsuyama; Shoichiro		2012-08-16
Electrode And Plasma Processing Apparatus
App 20110226420 - Hayashi; Daisuke ;   et al.		2011-09-22
Table For Plasma Processing Apparatus And Plasma Processing Apparatus
App 20110192540 - Higuma; Masakazu ;   et al.		2011-08-11
Plasma Processing Apparatus, Electrode Plate For Plasma Processing Apparatus, And Electrode Plate Manufacturing Method
App 20110162802 - OKUMURA; Katsuya ;   et al.		2011-07-07
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
Grant 7,922,862 - Okumura , et al. April 12, 2		2011-04-12
Plasma Processing Apparatus And Plasma Processing Method
App 20110056912 - Matsuyama; Shoichiro		2011-03-10
Capacitive coupling plasma processing apparatus
Grant 7,767,055 - Himori , et al. August 3, 2		2010-08-03
Electrostatic Chuck And Substrate Processing Apparatus Having Same
App 20100118464 - MATSUYAMA; Shoichiro		2010-05-13
Dry Etching Method
App 20100081287 - HONDA; Masanobu ;   et al.		2010-04-01
Dry Etching Method
App 20100068888 - HONDA; Masanobu ;   et al.		2010-03-18
Dry Etching Method
App 20100062607 - HONDA; Masanobu ;   et al.		2010-03-11
Plasma Etching Unit
App 20100024983 - Honda; Masanobu ;   et al.		2010-02-04
Plasma etching method and plasma etching unit
Grant 7,625,494 - Honda , et al. December 1, 2		2009-12-01
Plasma Processing Apparatus, Electrode Plate For Plasma Processing Apparatus, And Electrode Plate Manufacturing Method
App 20090285998 - Okumura; Katsuya ;   et al.		2009-11-19
Electrostatic chuck
Grant 7,619,870 - Himori , et al. November 17, 2		2009-11-17
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
Grant 7,585,386 - Okumura , et al. September 8, 2		2009-09-08
Plasma Etching Method, Plasma Etching Apparatus And Computer-readable Storage Medium
App 20090203219 - MATSUYAMA; Shoichiro ;   et al.		2009-08-13
Plasma Etching Method And Computer-readable Storage Medium
App 20090203218 - Matsuyama; Shoichiro ;   et al.		2009-08-13
Table for plasma processing apparatus and plasma processing apparatus
App 20090101284 - Higuma; Masakazu ;   et al.		2009-04-23
Method and device for plasma-etching organic material film
Grant 7,419,613 - Honda , et al. September 2, 2		2008-09-02
Stage for plasma processing apparatus, and plasma processing apparatus
App 20080073032 - Koshiishi; Akira ;   et al.		2008-03-27
Electrostatic Chuck Device
App 20080062610 - HIMORI; Shinji ;   et al.		2008-03-13
Electrostatic Chuck Device
App 20080062611 - HIMORI; Shinji ;   et al.		2008-03-13
Electrostatic Chuck Device
App 20080062609 - HIMORI; Shinji ;   et al.		2008-03-13
Stage for plasma processing apparatus, and plasma processing apparatus
App 20080041312 - Matsuyama; Shoichiro ;   et al.		2008-02-21
Electrostatic Chuck
App 20080037195 - HIMORI; Shinji ;   et al.		2008-02-14
Table for use in plasma processing system and plasma processing system
App 20080038162 - Koshiishi; Akira ;   et al.		2008-02-14
Method and device for plasma-etching organic material film
App 20060213865 - Honda; Masanobu ;   et al.		2006-09-28
Capacitive coupling plasma processing apparatus
App 20060118044 - Himori; Shinji ;   et al.		2006-06-08
Capacitive coupling plasma processing apparatus
App 20060081337 - Himori; Shinji ;   et al.		2006-04-20
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
App 20050276928 - Okumura, Katsuya ;   et al.		2005-12-15
Plasma etching method and plasma etching unit
App 20050039854 - Matsuyama, Shoichiro ;   et al.		2005-02-24
Plasma etching method and plasma etching unit
App 20040219797 - Honda, Masanobu ;   et al.		2004-11-04

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed