Matsuyama; Seiji
Patent Applications and Registrations
Patent applications and USPTO patent grants for Matsuyama; Seiji.The latest application filed is for "ultrathin atomic layer deposition film accuracy thickness control".
Company Profile
3.21.27
- Matsuyama; Seiji - Toyama JP
- Matsuyama; Seiji - Ibaraki JP
- Matsuyama; Seiji - Kyoto JP
- Matsuyama; Seiji - Amagasaki JP
- MATSUYAMA; Seiji - Minami-ku JP
- Matsuyama; Seiji - Hyogo JP
- MATSUYAMA; Seiji - Amagasaki-shi JP
- Matsuyama; Seiji - Nirasaki-shi JP
- Matsuyama; Seiji - Nirasaki JP
- Matsuyama, Seiji - Yamanashi JP
Patent Activity
| Patent | Date |
|---|---|
| Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20210343520 - Qian; Jun ; et al. | 2021-11-04 |
| Ultrathin atomic layer deposition film accuracy thickness control Grant 11,101,129 - Qian , et al. August 24, 2 | 2021-08-24 |
| Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20200152446 - Qian; Jun ; et al. | 2020-05-14 |
| Ultrathin atomic layer deposition film accuracy thickness control Grant 10,566,187 - Qian , et al. Feb | 2020-02-18 |
| Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20190378710 - Qian; Jun ; et al. | 2019-12-12 |
| Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20160276148 - Qian; Jun ; et al. | 2016-09-22 |
| Semiconductor device and manufacturing method thereof Grant 8,288,833 - Matsuyama October 16, 2 | 2012-10-16 |
| Plasma processing method Grant 8,183,165 - Matsuyama , et al. May 22, 2 | 2012-05-22 |
| Method of modifying insulating film Grant 8,021,987 - Sugawara , et al. September 20, 2 | 2011-09-20 |
| Plasma Processing Method And Computer Storage Medium App 20110124202 - MATSUYAMA; Seiji ; et al. | 2011-05-26 |
| Semiconductor Device And Manufacturing Method Thereof App 20110062530 - Matsuyama; Seiji | 2011-03-17 |
| Plasma processing method and computer storage medium Grant 7,897,518 - Matsuyama , et al. March 1, 2 | 2011-03-01 |
| Insulating film formation method which exhibits improved thickness uniformity and improved composition uniformity Grant 7,883,746 - Suzuki , et al. February 8, 2 | 2011-02-08 |
| Plasma Processing Method And Computer Storage Medium App 20100196627 - MATSUYAMA; Seiji ; et al. | 2010-08-05 |
| Substrate treating method and production method for semiconductor device Grant 7,759,598 - Sugawara , et al. July 20, 2 | 2010-07-20 |
| Plasma processing method and computer storage medium Grant 7,723,241 - Matsuyama , et al. May 25, 2 | 2010-05-25 |
| Method Of Modifying Insulating Film App 20100105215 - SUGAWARA; Takuya ; et al. | 2010-04-29 |
| Method for Forming Insulation Film App 20100096707 - Sugawara; Takuya ; et al. | 2010-04-22 |
| Method for forming insulation film Grant 7,662,236 - Sugawara , et al. February 16, 2 | 2010-02-16 |
| Method of modifying insulating film Grant 7,655,574 - Sugawara , et al. February 2, 2 | 2010-02-02 |
| Method for forming underlying insulation film Grant 7,622,402 - Sugawara , et al. November 24, 2 | 2009-11-24 |
| Substrate Treating Method App 20090163036 - Sugawara; Takuya ; et al. | 2009-06-25 |
| Substrate treating method Grant 7,517,751 - Sugawara , et al. April 14, 2 | 2009-04-14 |
| Method for Forming Insulation Film App 20080274370 - Sugawara; Takuya ; et al. | 2008-11-06 |
| Method for forming insulation film Grant 7,446,052 - Sugawara , et al. November 4, 2 | 2008-11-04 |
| Nitriding method of gate oxide film Grant 7,429,539 - Matsuyama , et al. September 30, 2 | 2008-09-30 |
| Insulating film formation method, semiconductor device, and substrate processing apparatus App 20080026251 - Suzuki; Jun ; et al. | 2008-01-31 |
| Semiconductor device and semiconductor device manufacturing method App 20080017954 - Suzuki; Jun ; et al. | 2008-01-24 |
| Substrate treating method and production method for semiconductor device App 20070235421 - Sugawara; Takuya ; et al. | 2007-10-11 |
| Method for producing material of electronic device App 20070224837 - Sugawara; Takuya ; et al. | 2007-09-27 |
| Process for producing materials for electronic device App 20070218687 - Sugawara; Takuya ; et al. | 2007-09-20 |
| Substrate Processing Method And Material For Electronic Device App 20070204959 - NAKANISHI; Toshio ; et al. | 2007-09-06 |
| Substrate processing method and material for electronic device Grant 7,250,375 - Nakanishi , et al. July 31, 2 | 2007-07-31 |
| Substrate processing method Grant 7,232,772 - Matsuyama , et al. June 19, 2 | 2007-06-19 |
| Substrate treating method and production method for semiconductor device Grant 7,226,848 - Sugawara , et al. June 5, 2 | 2007-06-05 |
| Substrate processing method Grant 7,226,874 - Matsuyama , et al. June 5, 2 | 2007-06-05 |
| Process for producing materials for electronic device Grant 7,217,659 - Sugawara , et al. May 15, 2 | 2007-05-15 |
| Plasma processing method and computer storage medium App 20070059944 - Matsuyama; Seiji ; et al. | 2007-03-15 |
| Method of modifying insulating film App 20060199398 - Sugawara; Takuya ; et al. | 2006-09-07 |
| Method for forming underlying insulation film App 20050255711 - Sugawara, Takuya ; et al. | 2005-11-17 |
| Method for producing material of electronic device App 20050233599 - Sugawara, Takuya ; et al. | 2005-10-20 |
| Process for producing materials for electronic device App 20050176263 - Sugawara, Takuya ; et al. | 2005-08-11 |
| Substrate treating method and production method for semiconductor device App 20050170543 - Sugawara, Takuya ; et al. | 2005-08-04 |
| Substrate treating method App 20050164523 - Sugawara, Takuya ; et al. | 2005-07-28 |
| Method for forming insulation film App 20050161434 - Sugawara, Takuya ; et al. | 2005-07-28 |
| Method of producing electronic device material Grant 6,897,149 - Sugawara , et al. May 24, 2 | 2005-05-24 |
| Method for producing material of electronic device App 20040142577 - Sugawara, Takuya ; et al. | 2004-07-22 |
| Method of producing electronic device material App 20040048452 - Sugawara, Takuya ; et al. | 2004-03-11 |
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