Matsushita; Takaya
Patent Applications and Registrations
Patent applications and USPTO patent grants for Matsushita; Takaya.The latest application filed is for "semiconductor device producing method".
- Matsushita; Takaya - Yokkaichi N/A JP
- Matsushita; Takaya - Yokkaichi-Shi JP
- Matsushita; Takaya - Yokohama JP
- Matsushita; Takaya - Yokohama-Shi JP
- Matsushita; Takaya - Tokyo JP
| Patent | Date |
|---|---|
| Semiconductor device producing method Grant 8,513,134 - Omura , et al. August 20, 2 | 2013-08-20 |
| Semiconductor Device Producing Method App 20120021605 - OMURA; Mitsuhiro ; et al. | 2012-01-26 |
| Substrate Cleaning Method And Substrate Cleaning Apparatus App 20110168205 - TAHARA; Shigeru ; et al. | 2011-07-14 |
| Method Of Manufacturing Semiconductor Memory Device And Semiconductor Memory Device App 20110147942 - YAHASHI; Katsunori ; et al. | 2011-06-23 |
| Semiconductor device and method of manufacturing the semiconductor device Grant 7,943,459 - Akiyama , et al. May 17, 2 | 2011-05-17 |
| Semiconductor device and method of manufacturing the semiconductor device App 20080054395 - Akiyama; Kazutaka ; et al. | 2008-03-06 |
| Method of manufacturing semiconductor device Grant 7,232,763 - Omura , et al. June 19, 2 | 2007-06-19 |
| Method of manufacturing semiconductor device App 20050106866 - Omura, Mitsuhiro ; et al. | 2005-05-19 |
| Semiconductor device and method for manufacturing the same Grant 6,627,557 - Seta , et al. September 30, 2 | 2003-09-30 |
| Semiconductor device and method for manufacturing the same App 20010029105 - Seta, Shoji ; et al. | 2001-10-11 |
| Electrostatic chucking device Grant 5,851,641 - Matsunaga , et al. December 22, 1 | 1998-12-22 |
| Electrostatic chucking device Grant 5,645,921 - Matsunaga , et al. July 8, 1 | 1997-07-08 |
| Plasma etching method Grant 5,595,627 - Inazawa , et al. January 21, 1 | 1997-01-21 |
| Dry etching method Grant 5,356,515 - Tahara , et al. October 18, 1 | 1994-10-18 |
| Dry etching method Grant 5,310,454 - Ohiwa , et al. May 10, 1 | 1994-05-10 |
| Plasma processing apparatus Grant 5,271,788 - Hasegawa , et al. December 21, 1 | 1993-12-21 |
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