Matsuo; Seitaro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Matsuo; Seitaro.The latest application filed is for "ecr plasma source and ecr plasma device".
- Matsuo; Seitaro - Mitaka JP
- Matsuo, Seitaro - Tokyo JP
- Matsuo; Seitaro - Kanagawa JP
- Matsuo; Seitaro - Atsugi JP
- Matsuo; Seitaro - Hachioji JP
- Matsuo; Seitaro - Isehara JP
| Patent | Date |
|---|---|
| ECR plasma source and ECR plasma device Grant 7,485,204 - Matsuo , et al. February 3, 2 | 2009-02-03 |
| Ecr plasma source and ecr plasma device App 20050145339 - Matsuo, Seitaro ; et al. | 2005-07-07 |
| Optical projection exposure method and system using the same Grant 5,208,629 - Matsuo , et al. May 4, 1 | 1993-05-04 |
| Microwave transforming method and plasma processing Grant 5,003,152 - Matsuo , et al. March 26, 1 | 1991-03-26 |
| Microwave ion source Grant 4,857,809 - Torii , et al. August 15, 1 | 1989-08-15 |
| Manufacturing process for semiconductor integrated circuits Grant 4,566,940 - Itsumi , et al. January 28, 1 | 1986-01-28 |
| Semiconductor device and manufacturing process thereof Grant 4,564,997 - Matsuo , et al. January 21, 1 | 1986-01-21 |
| Semiconductor integrated circuits and manufacturing process thereof Grant 4,543,592 - Itsumi , et al. September 24, 1 | 1985-09-24 |
| Plasma deposition method and apparatus Grant 4,492,620 - Matsuo , et al. January 8, 1 | 1985-01-08 |
| Ion shower apparatus Grant 4,450,031 - Ono , et al. May 22, 1 | 1984-05-22 |
| Method for the manufacture of semiconductor device using refractory metal in a lift-off step Grant 4,448,800 - Ehara , et al. May 15, 1 | 1984-05-15 |
| Plasma deposition apparatus Grant 4,401,054 - Matsuo , et al. August 30, 1 | 1983-08-30 |
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