Matsumura; Yuushi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Matsumura; Yuushi.The latest application filed is for "radiation-sensitive resin composition and resist pattern-forming method".

Company Profile

6.9.16

Matsumura; Yuushi - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound Grant 11,454,890 - Nosaka , et al. September 27, 2	2022-09-27
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20220260908 - KANEKO; Tetsurou ; et al.	2022-08-18
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound Grant 11,402,757 - Nosaka , et al. August 2, 2	2022-08-02
Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate Grant 11,320,739 - Wakamatsu , et al. May 3, 2	2022-05-03
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20210389671 - KANEKO; Tetsurou ; et al.	2021-12-16
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound Grant 11,126,084 - Nosaka , et al. September 21, 2	2021-09-21
Cleaning composition for semiconductor substrate Grant 11,053,457 - Aoki , et al. July 6, 2	2021-07-06
Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound Grant 11,003,079 - Nosaka , et al. May 11, 2	2021-05-11
Composition For Resist Underlayer Film Formation, Resist Underlayer Film And Forming Method Thereof, Patterned Substrate-produci App 20200272053 - NOSAKA; Naoya ; et al.	2020-08-27
Composition, Film, Film-forming Method And Patterned Substrate-producing Method App 20200199093 - NAKATSU; Hiroki ; et al.	2020-06-25
Cleaning Composition For Semiconductor Substrate App 20200040282 - AOKI; Shun ; et al.	2020-02-06
Semiconductor Substrate Treatment Agent And Substrate-treating Method App 20190264035 - AOKI; Shun ; et al.	2019-08-29
Composition For Resist Underlayer Film Formation, Resist Underlayer Film And Forming Method Thereof, Production Method Of Patter App 20190243247 - NOSAKA; Naoya ; et al.	2019-08-08
Composition For Film Formation, Film, Resist Underlayer Film-forming Method, Production Method Of Patterned Substrate, And Compound App 20190094695 - NOSAKA; Naoya ; et al.	2019-03-28
Composition For Resist Underlayer Film Formation, Resist Underlayer Film And Method For Producing Patterned Substrate App 20180348633 - Wakamatsu; Goji ; et al.	2018-12-06
Composition For Forming Film For Use In Cleaning Semiconductor Substrate, And Cleaning Method For Semiconductor Substrate App 20180211828 - CHUNG; Kang-go ; et al.	2018-07-26
Method for film formation, and pattern-forming method Grant 9,958,781 - Matsumura , et al. May 1, 2	2018-05-01
Composition For Resist Underlayer Film Formation, Resist Underlayer Film, And Production Method Of Patterned Substrate App 20170137663 - WAKAMATSU; Goji ; et al.	2017-05-18
Method For Film Formation, And Pattern-forming Method App 20160314984 - MATSUMURA; Yuushi ; et al.	2016-10-27
Composition For Resist Underlayer Film Formation, Resist Underlayer Film, And Production Method Of Patterned Substrate App 20160257842 - WAKAMATSU; Goji ; et al.	2016-09-08
Composition for forming resist underlayer film, and pattern-forming method Grant 9,250,526 - Seko , et al. February 2, 2	2016-02-02
Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method Grant 9,091,922 - Nakafuji , et al. July 28, 2	2015-07-28
Resin Composition, Resist Underlayer Film, Resist Underlayer Film-forming Method And Pattern-forming Method App 20140014620 - NAKAFUJI; Shin-ya ; et al.	2014-01-16
Composition For Forming Resist Underlayer Film, And Pattern-forming Method App 20130233826 - SEKO; Tomoaki ; et al.	2013-09-12
Resin Composition, Resist Underlayer Film, Resist Underlayer Film-forming Method And Pattern-forming Method App 20130153535 - NAKAFUJI; Shin-ya ; et al.	2013-06-20

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