MATSUMOTO; Hiroie

Patent Applications and Registrations

Patent applications and USPTO patent grants for MATSUMOTO; Hiroie.The latest application filed is for "etching method and plasma processing apparatus".

Company Profile

0.3.5

MATSUMOTO; Hiroie - Miyagi JP
Matsumoto; Hiroie - Watervliet NY
MATSUMOTO; Hiroie - Albany NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching Method And Plasma Processing Apparatus App 20220102159 - YOKOYAMA; Takahiro ; et al.	2022-03-31
Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) Grant 9,818,610 - Matsumoto , et al. November 14, 2	2017-11-14
Trench And Hole Patterning With Euv Resists Using Dual Frequency Capacitively Coupled Plasma (ccp) App 20170263443 - Matsumoto; Hiroie ; et al.	2017-09-14
Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) Grant 9,607,834 - Matsumoto , et al. March 28, 2	2017-03-28
Trench And Hole Patterning With Euv Resists Using Dual Frequency Capacitively Coupled Plasma (ccp) App 20160293405 - Matsumoto; Hiroie ; et al.	2016-10-06
Plasma Processing Method And Plasma Processing Apparatus App 20150287618 - MATSUMOTO; Hiroie ; et al.	2015-10-08
Plasma processing method and plasma processing apparatus Grant 9,099,285 - Matsumoto , et al. August 4, 2	2015-08-04
Plasma Processing Method And Plasma Processing Apparatus App 20140120732 - MATSUMOTO; Hiroie ; et al.	2014-05-01

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