| Patent | Date |
|---|
Method For Forming Insulation Film
App 20220235456 - MATSUKI; Nobuo | 2022-07-28 |
Interlayer Film For Laminated Glass And Laminated Glass
App 20220063248 - MATSUKI; Nobuo ; et al. | 2022-03-03 |
Interlayer For Laminated Glass And Laminated Glass
App 20220009205 - HIGASHIONNA; Yui ; et al. | 2022-01-13 |
Intermediate Film For Laminated Glass, And Laminated Glass
App 20210039360 - Ishikawa; Yuki ; et al. | 2021-02-11 |
Deposition apparatus
Grant 10,738,380 - Nozawa , et al. A | 2020-08-11 |
Deposition Apparatus
App 20170211179 - NOZAWA; Naoyuki ; et al. | 2017-07-27 |
Method for forming silicon carbide film containing oxygen
Grant 8,080,282 - Fukazawa , et al. December 20, 2 | 2011-12-20 |
Method for forming dielectric film using siloxane-silazane mixture
Grant 8,003,174 - Fukazawa , et al. August 23, 2 | 2011-08-23 |
Method for forming inorganic silazane-based dielectric film
Grant 7,781,352 - Fukazawa , et al. August 24, 2 | 2010-08-24 |
Method for forming insulation film having high density
Grant 7,718,553 - Fukazawa , et al. May 18, 2 | 2010-05-18 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
Grant 7,655,577 - Hyodo , et al. February 2, 2 | 2010-02-02 |
Method for forming silazane-based dielectric film
Grant 7,651,959 - Fukazawa , et al. January 26, 2 | 2010-01-26 |
Method of forming a carbon polymer film using plasma CVD
Grant 7,638,441 - Morisada , et al. December 29, 2 | 2009-12-29 |
Device Isolation Technology On Semiconductor Substrate
App 20090298257 - Lee; Woo Jin ; et al. | 2009-12-03 |
Device isolation technology on semiconductor substrate
Grant 7,622,369 - Lee , et al. November 24, 2 | 2009-11-24 |
Method of stabilizing film quality of low-dielectric constant film
Grant 7,560,144 - Fukazawa , et al. July 14, 2 | 2009-07-14 |
Method For Forming Dielectric Film Using Siloxane-silazane Mixture
App 20090156017 - FUKAZAWA; Atsuki ; et al. | 2009-06-18 |
Method For Forming Silazane-based Dielectric Film
App 20090142935 - FUKUZAWA; Atsuki ; et al. | 2009-06-04 |
Method of forming a carbon polymer film using plasma CVD
Grant 7,504,344 - Matsuki , et al. March 17, 2 | 2009-03-17 |
Method Of Forming A Carbon Polymer Film Using Plasma Cvd
App 20090068852 - MORISADA; Yoshinori ; et al. | 2009-03-12 |
Method of forming a carbon polymer film using plasma CVD
Grant 7,470,633 - Matsuki , et al. December 30, 2 | 2008-12-30 |
Method For Forming Inorganic Silazane-based Dielectric Film
App 20080305648 - FUKAZAWA; Atsuki ; et al. | 2008-12-11 |
Plasma Cvd Apparatus Having Non-metal Susceptor
App 20080299326 - Fukazawa; Atsuki ; et al. | 2008-12-04 |
Method of forming carbon polymer film using plasma CVD
Grant 7,410,915 - Morisada , et al. August 12, 2 | 2008-08-12 |
Method for forming insulation film
Grant 7,354,873 - Fukazawa , et al. April 8, 2 | 2008-04-08 |
Method for forming insulation film having high density
App 20080076266 - Fukazawa; Atsuki ; et al. | 2008-03-27 |
Method For Forming Silicon Carbide Film Containing Oxygen
App 20080038485 - FUKAZAWA; Atsuki ; et al. | 2008-02-14 |
Method of forming carbon polymer film using plasma CVD
App 20070224833 - Morisada; Yoshinori ; et al. | 2007-09-27 |
Method of forming a carbon polymer film using plasma CVD
App 20070218705 - Matsuki; Nobuo ; et al. | 2007-09-20 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Film Stress
App 20070111540 - HYODO; Yasuyoshi ; et al. | 2007-05-17 |
Plasma CVD film formation apparatus provided with mask
App 20070065597 - Kaido; Shintaro ; et al. | 2007-03-22 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Film Stress
App 20070066086 - HYODO; Yasuyoshi ; et al. | 2007-03-22 |
Insulation film and method for manufacturing same
App 20070009673 - Fukazawa; Atsuki ; et al. | 2007-01-11 |
Method For Forming Insulation Film
App 20070004204 - Fukazawa; Atsuki ; et al. | 2007-01-04 |
Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
Grant 7,147,900 - Tsuji , et al. December 12, 2 | 2006-12-12 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
Grant 7,148,154 - Hyodo , et al. December 12, 2 | 2006-12-12 |
Formation technology for nanoparticle films having low dielectric constant
App 20060269690 - Watanabe; Yukio ; et al. | 2006-11-30 |
Method for forming insulation film
App 20060258176 - Fukazawa; Atsuki ; et al. | 2006-11-16 |
Method of stabilizing film quality of low-dielectric constant film
App 20060216433 - Fukazawa; Atsuki ; et al. | 2006-09-28 |
Method for forming low-k hard film
Grant 7,064,088 - Hyodo , et al. June 20, 2 | 2006-06-20 |
Formation technology of nano-particle films having low dielectric constant
App 20060105583 - Ikeda; Shingo ; et al. | 2006-05-18 |
Method of forming a carbon polymer film using plasma CVD
App 20060084280 - Matsuki; Nobuo ; et al. | 2006-04-20 |
Gas-shield electron-beam gun for thin-film curing application
Grant 7,012,268 - Matsuki , et al. March 14, 2 | 2006-03-14 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,881,683 - Matsuki , et al. April 19, 2 | 2005-04-19 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
App 20050042884 - Hyodo, Yasuyoshi ; et al. | 2005-02-24 |
Method and apparatus for forming silicon-containing insulation film having low dielectric constant
App 20050034667 - Tsuji, Naoto ; et al. | 2005-02-17 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,852,650 - Matsuki , et al. February 8, 2 | 2005-02-08 |
Apparatus and method for forming low dielectric constant film
Grant 6,830,007 - Matsuki , et al. December 14, 2 | 2004-12-14 |
Gas-shield electron-beam gun for thin-film curing application
App 20040232355 - Matsuki, Nobuo ; et al. | 2004-11-25 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,784,123 - Matsuki , et al. August 31, 2 | 2004-08-31 |
Method for forming low dielectric constant interlayer insulation film
Grant 6,759,344 - Matsuki , et al. July 6, 2 | 2004-07-06 |
Plasma CVD film-forming device
Grant 6,740,367 - Matsuki , et al. May 25, 2 | 2004-05-25 |
Method of forming low dielectric constant insulation film for semiconductor device
Grant 6,737,366 - Matsuki May 18, 2 | 2004-05-18 |
Method for forming low-k hard film
App 20040038514 - Hyodo, Yasuyoshi ; et al. | 2004-02-26 |
Insulation film on semiconductor substrate and method for forming same
App 20030224622 - Matsuki, Nobuo ; et al. | 2003-12-04 |
Silicone polymer insulation film on semiconductor substrate
Grant 6,653,719 - Matsuki November 25, 2 | 2003-11-25 |
Plasma CVD film-forming device
Grant 6,631,692 - Matsuki , et al. October 14, 2 | 2003-10-14 |
Insulation film on semiconductor substrate and method for forming same
App 20030162408 - Matsuki, Nobuo ; et al. | 2003-08-28 |
Apparatus and method for forming low dielectric constant film
App 20030154921 - Matsuki, Nobuo ; et al. | 2003-08-21 |
Apparatus for forming thin film on semiconductor substrate by plasma reaction
Grant 6,602,800 - Matsuki August 5, 2 | 2003-08-05 |
Method for forming low dielectric constant interlayer insulation film
App 20030143867 - Matsuki, Nobuo ; et al. | 2003-07-31 |
Method of forming low dielectric constant insulation film for semiconductor device
App 20030124874 - Matsuki, Nobuo | 2003-07-03 |
Insulation film on semiconductor substrate and method for forming same
App 20030119336 - Matsuki, Nobuo ; et al. | 2003-06-26 |
Plasma CVD film-forming device
App 20030089314 - Matsuki, Nobuo ; et al. | 2003-05-15 |
Siloxan polymer film on semiconductor substrate
Grant 6,559,520 - Matsuki , et al. May 6, 2 | 2003-05-06 |
Apparatus and method for forming low dielectric constant film
Grant 6,537,928 - Matsuki , et al. March 25, 2 | 2003-03-25 |
Silicone polymer insulation film on semiconductor substrate
App 20030054666 - Matsuki, Nobuo | 2003-03-20 |
Siloxan polymer film on semiconductor substrate and method for forming same
Grant 6,514,880 - Matsuki , et al. February 4, 2 | 2003-02-04 |
Method of forming low dielectric constant insulation film for semiconductor device
App 20020168870 - Matsuki, Nobuo | 2002-11-14 |
Siloxan polymer film on semiconductor substrate
App 20020160626 - Matsuki, Nobuo ; et al. | 2002-10-31 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,455,445 - Matsuki September 24, 2 | 2002-09-24 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,432,846 - Matsuki August 13, 2 | 2002-08-13 |
Method for forming film with low dielectric constant on semiconductor substrate
Grant 6,410,463 - Matsuki June 25, 2 | 2002-06-25 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,383,955 - Matsuki , et al. May 7, 2 | 2002-05-07 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,352,945 - Matsuki , et al. March 5, 2 | 2002-03-05 |
Siloxan polymer film on semiconductor substrate and method for forming same
App 20010046567 - Matsuki, Nobuo ; et al. | 2001-11-29 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
App 20010021590 - Matsuki, Nobuo | 2001-09-13 |
Method of manufacturing fluorine-containing silicon oxide films for semiconductor device
Grant 6,149,976 - Matsuki , et al. November 21, 2 | 2000-11-21 |
| 