MATSUI; Hidefumi

Patent Applications and Registrations

Patent applications and USPTO patent grants for MATSUI; Hidefumi.The latest application filed is for "maintenance control method of controlling maintenance of processing device and control device".

Company Profile

1.14.18

MATSUI; Hidefumi - Yamanashi JP
Matsui; Hidefumi - Nirasaki N/A JP
Matsui; Hidefumi - Nirasaki City JP
Matsui; Hidefumi - Nirasaki-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Maintenance Control Method Of Controlling Maintenance Of Processing Device And Control Device App 20200126829 - MATSUI; Hidefumi ; et al.	2020-04-23
Substrate cleaning method and substrate cleaning device Grant 9,209,010 - Matsui , et al. December 8, 2	2015-12-08
Vacuum exhaust method and a substrate processing apparatus therefor Grant 8,945,313 - Matsui , et al. February 3, 2	2015-02-03
Substrate wiring method and semiconductor manufacturing device Grant 8,940,638 - Hoshino , et al. January 27, 2	2015-01-27
Substrate cleaning method Grant 8,585,831 - Matsui , et al. November 19, 2	2013-11-19
Substrate cleaning method and apparatus Grant 8,475,602 - Matsui , et al. July 2, 2	2013-07-02
Vacuum Exhaust Method And A Substrate Processing Apparatus Therefor App 20130092185 - Matsui; Hidefumi ; et al.	2013-04-18
Substrate Cleaning Method And Substrate Cleaning Device App 20130056033 - Matsui; Hidefumi ; et al.	2013-03-07
Substrate Cleaning Method And Semiconductor Manufacturing Apparatus App 20130056024 - Hoshino; Satohiko ; et al.	2013-03-07
Substrate Wiring Method And Semiconductor Manufacturing Device App 20130040459 - Hoshino; Satohiko ; et al.	2013-02-14
Substrate Cleaning Method App 20120031434 - Matsui; Hidefumi ; et al.	2012-02-09
Substrate Cleaning Method And Apparatus App 20100101608 - MATSUI; Hidefumi ; et al.	2010-04-29
Vacuum Exhaust Method And A Substrate Processing Apparatus Therefor App 20100104760 - MATSUI; Hidefumi ; et al.	2010-04-29
Substrate processing apparatus and substrate processing method Grant 7,401,988 - Katano , et al. July 22, 2	2008-07-22
Substrate Processing Apparatus And Substrate Processing Method App 20070127916 - Kitano; Junichi ; et al.	2007-06-07
Substrate processing apparatus and substrate processing method Grant 7,208,066 - Kitano , et al. April 24, 2	2007-04-24
Substrate processing method and substrate processing apparatus App 20050130445 - Matsui, Hidefumi ; et al.	2005-06-16
Substrate processing method and substrate processing apparatus Grant 6,875,466 - Matsui , et al. April 5, 2	2005-04-05
Substrate processing apparatus and substrate processing method App 20040050321 - Kitano, Junichi ; et al.	2004-03-18
Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern Grant 6,617,095 - Kitano , et al. September 9, 2	2003-09-09
Substrate processing method and substrate processing apparatus App 20030094137 - Matsui, Hidefumi ; et al.	2003-05-22
Substrate processing method and substrate processing apparatus Grant 6,485,203 - Katano , et al. November 26, 2	2002-11-26
Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern App 20020009592 - Kitano, Junichi ; et al.	2002-01-24
Substrate processing apparatus and substrate processing method App 20010013161 - Kitano, Junichi ; et al.	2001-08-16
Substrate processing method and substrate processing apparatus App 20010014372 - Katano, Takayuki ; et al.	2001-08-16

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