Matsuhashi; Hideaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Matsuhashi; Hideaki.The latest application filed is for "field effect transistor and semiconductor device".

Company Profile

0.10.11

Matsuhashi; Hideaki - Kyoto JP
Matsuhashi; Hideaki - Tokyo JP
Matsuhashi; Hideaki - Kyoto-shi JP
Matsuhashi; Hideaki - Saitama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Scroll compressor and method for machining scroll wrap Grant 7,540,726 - Matsuhashi June 2, 2	2009-06-02
Non-rotary cutting tool and process of machining scroll member by using the same Grant 7,293,945 - Matsuhashi , et al. November 13, 2	2007-11-13
Process of machining scroll member by using non-rotary cutting tool Grant 7,237,992 - Matsuhashi , et al. July 3, 2	2007-07-03
Field effect transistor and semiconductor device App 20070018277 - Matsuhashi; Hideaki	2007-01-25
Scroll compressor and method of machining scroll lap App 20060159580 - Matsuhashi; Hideaki	2006-07-20
Non-rotary cutting tool and process of machining scroll member by using the same App 20060133904 - Matsuhashi; Hideaki ; et al.	2006-06-22
Process of machining scroll member by using non-rotary cutting tool App 20050166739 - Matsuhashi, Hideaki ; et al.	2005-08-04
Method of manufacturing a capacitor with copper electrodes and diffusion barriers Grant 6,921,689 - Matsuhashi July 26, 2	2005-07-26
Capacitor having copper electrodes and diffusion barrier layers Grant 6,856,501 - Matsuhashi February 15, 2	2005-02-15
Method for manufacturing field effect transistor Grant 6,833,589 - Matsuhashi , et al. December 21, 2	2004-12-21
Non-rotary cutting tool and process of machining scroll member by using the same App 20040221696 - Matsuhashi, Hideaki ; et al.	2004-11-11
Semiconductor device formed on an SOI structure with a stress-relief layer Grant 6,809,380 - Matsuhashi October 26, 2	2004-10-26
Capacitor having copper electrodes and diffusion barrier layers App 20040190220 - Matsuhashi, Hideaki	2004-09-30
Method of manufacturing a capacitor with copper electrodes and diffusion barriers App 20040188748 - Matsuhashi, Hideaki	2004-09-30
Capacitor and a manufacturing process therefor Grant 6,759,703 - Matsuhashi July 6, 2	2004-07-06
MOSFET fabrication method Grant 6,727,147 - Nakamura , et al. April 27, 2	2004-04-27
Semiconductor device App 20040075142 - Matsuhashi, Hideaki	2004-04-22
Mosfet Fabrication Method App 20030228735 - Nakamura, Toshiyuki ; et al.	2003-12-11
Method for manufacturing field effect transistor App 20030049940 - Matsuhashi, Hideaki ; et al.	2003-03-13
Fabrication Method Of A Dual-gate Cmosfet App 20020061617 - Matsuhashi, Hideaki	2002-05-23
Method of depositing a tungsten film Grant 5,108,952 - Matsuhashi April 28, 1	1992-04-28

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