Masuyama; Tatsuro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Masuyama; Tatsuro.The latest application filed is for "compound, resin, resist composition and method for producing resist pattern".

Company Profile

23.71.70

Masuyama; Tatsuro - Osaka JP
MASUYAMA; Tatsuro - Osaka-shi Osaka
Masuyama; Tatsuro - Toyonaka N/A JP
MASUYAMA; Tatsuro - Toyonaka-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Salt, acid generator, resist composition and method for producing resist pattern Grant 11,366,387 - Masuyama , et al. June 21, 2	2022-06-21
Photoresist composition and process for producing photoresist pattern Grant 11,327,399 - Masuyama , et al. May 10, 2	2022-05-10
Resin, resist composition and method for producing resist pattern Grant 11,261,273 - Masuyama , et al. March 1, 2	2022-03-01
Compound, resin, resist composition and method for producing resist pattern Grant 11,214,635 - Masuyama , et al. January 4, 2	2022-01-04
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20210389669 - MASUYAMA; Tatsuro ; et al.	2021-12-16
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20210389672 - MASUYAMA; Tatsuro ; et al.	2021-12-16
Resin, resist composition and method for producing resist pattern Grant 11,198,748 - Masuyama , et al. December 14, 2	2021-12-14
Carboxylate, Carboxylic Acid Generator, Resist Composition And Method For Producing Resist Pattern App 20210263416 - MASUYAMA; Tatsuro ; et al.	2021-08-26
Salt, Acid Generator, Resist Composition And Method For Producing Resist Pattern App 20210255545 - MASUYAMA; Tatsuro ; et al.	2021-08-19
Salt and photoresist composition containing the same Grant 10,975,028 - Masuyama , et al. April 13, 2	2021-04-13
Salt and photoresist composition containing the same Grant 10,882,839 - Masuyama , et al. January 5, 2	2021-01-05
Salt and photoresist composition containing the same Grant 10,816,902 - Masuyama , et al. October 27, 2	2020-10-27
Compound, resin, photoresist composition and process for producing photoresist pattern Grant 10,781,198 - Masuyama , et al. Sept	2020-09-22
Compound, resin, resist composition and method for producing resist pattern Grant 10,774,029 - Masuyama , et al. Sept	2020-09-15
Compound, resin, resist composition and method for producing resist pattern Grant 10,725,380 - Masuyama , et al.	2020-07-28
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20200231720 - MASUYAMA; Tatsuro ; et al.	2020-07-23
Salt and photoresist composition containing the same Grant 10,670,963 - Masuyama , et al.	2020-06-02
Salt, Acid Generator, Resist Composition And Method For Producing Resist Pattern App 20200096866 - MASUYAMA; Tatsuro ; et al.	2020-03-26
Salt, Acid Generator, Resist Composition And Method For Producing Resist Pattern App 20200057369 - MASUYAMA; Tatsuro ; et al.	2020-02-20
Photoresist composition Grant 10,564,544 - Masuyama , et al. Feb	2020-02-18
Resin, Resist Composition And Method For Producing Resist Pattern App 20200010594 - MASUYAMA; Tatsuro ; et al.	2020-01-09
Process for producing photoresist pattern and photoresist composition Grant 10,520,810 - Masuyama , et al. Dec	2019-12-31
Salt, Acid Generator, Resist Composition And Method For Producing Resist Pattern App 20190369490 - MASUYAMA; Tatsuro ; et al.	2019-12-05
Resin, Resist Composition And Method For Producing Resist Pattern App 20190292287 - MASUYAMA; Tatsuro ; et al.	2019-09-26
Compound, Resist Composition And Method For Producing Resist Pattern App 20190250508 - MASUYAMA; Tatsuro ; et al.	2019-08-15
Salt And Photoresist Composition Containing The Same App 20190112286 - MASUYAMA; Tatsuro ; et al.	2019-04-18
Salt And Photoresist Composition Containing The Same App 20190112265 - MASUYAMA; Tatsuro ; et al.	2019-04-18
Photoresist composition Grant 10,209,618 - Masuyama , et al. Feb	2019-02-19
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20190025698 - MASUYAMA; Tatsuro ; et al.	2019-01-24
Salt And Photoresist Composition Containing The Same App 20190011837 - MASUYAMA; Tatsuro ; et al.	2019-01-10
Photoresist composition and process of producing photoresist pattern Grant 10,168,616 - Masuyama , et al. J	2019-01-01
Compound, Resin, Photoresist Composition And Process For Producing Photoresist Pattern App 20180373146 - MASUYAMA; Tatsuro ; et al.	2018-12-27
Compound, Resin, Photoresist Composition And Process For Producing Photoresist Pattern App 20180354927 - MASUYAMA; Tatsuro ; et al.	2018-12-13
Photoresist Composition And Process For Producing Photoresist Pattern App 20180348632 - MASUYAMA; Tatsuro ; et al.	2018-12-06
Salt And Photoresist Composition Containing The Same App 20180259851 - MASUYAMA; Tatsuro ; et al.	2018-09-13
Non-ionic compound, resin, resist composition and method for producing resist pattern Grant 10,073,343 - Masuyama , et al. September 11, 2	2018-09-11
Salt and photoresist composition containing the same Grant 10,047,046 - Masuyama , et al. August 14, 2	2018-08-14
Compound, resin, resist composition and method for producing resist pattern Grant 9,971,241 - Masuyama , et al. May 15, 2	2018-05-15
Compound, resin, resist composition and method for producing resist pattern Grant 9,869,930 - Masuyama , et al. January 16, 2	2018-01-16
Resin, resist composition and method for producing resist pattern Grant 9,869,929 - Masuyama , et al. January 16, 2	2018-01-16
Compound, resin, resist composition and method for producing resist pattern Grant 9,822,060 - Masuyama , et al. November 21, 2	2017-11-21
Process For Producing Photoresist Pattern And Photoresist Composition App 20170329224 - MASUYAMA; Tatsuro ; et al.	2017-11-16
Photoresist Composition App 20170329219 - MASUYAMA; Tatsuro ; et al.	2017-11-16
Photoresist Composition App 20170329223 - MASUYAMA; Tatsuro ; et al.	2017-11-16
Salt, acid generator, resist composition and method for producing resist pattern Grant 9,760,005 - Masuyama , et al. September 12, 2	2017-09-12
Salt And Photoresist Composition Containing The Same App 20170247323 - MASUYAMA; Tatsuro ; et al.	2017-08-31
Photoresist composition and method for producing photoresist pattern Grant 9,740,102 - Masuyama , et al. August 22, 2	2017-08-22
Compound, resin and photoresist composition Grant 9,671,692 - Masuyama , et al. June 6, 2	2017-06-06
Compound, resin and photoresist composition Grant 9,644,056 - Masuyama , et al. May 9, 2	2017-05-09
Resist composition and method for producing resist pattern Grant 9,638,997 - Masuyama , et al. May 2, 2	2017-05-02
Resist composition and method for producing resist pattern Grant 9,638,996 - Masuyama , et al. May 2, 2	2017-05-02
Salt and photoresist composition comprising the same Grant 9,612,533 - Masuyama , et al. April 4, 2	2017-04-04
Resist composition and method for producing resist pattern Grant 9,563,125 - Masuyama , et al. February 7, 2	2017-02-07
Photoresist composition, compound and process of producing photoresist pattern Grant 9,563,123 - Masuyama , et al. February 7, 2	2017-02-07
Compound, resin, resist composition and method for producing resist pattern Grant 9,562,122 - Masuyama , et al. February 7, 2	2017-02-07
Salt and photoresist composition comprising the same Grant 9,562,032 - Masuyama , et al. February 7, 2	2017-02-07
Photoresist composition and method for producing photoresist pattern Grant 9,563,124 - Masuyama , et al. February 7, 2	2017-02-07
Photoresist composition, compound and process of producing photoresist pattern Grant 9,448,475 - Masuyama , et al. September 20, 2	2016-09-20
Salt, photoresist composition and method for producing photoresist pattern Grant 9,428,485 - Masuyama , et al. August 30, 2	2016-08-30
Compound, Resin And Photoresist Composition App 20160244400 - MASUYAMA; Tatsuro ; et al.	2016-08-25
Compound, Resin And Photoresist Composition App 20160237190 - MASUYAMA; Tatsuro ; et al.	2016-08-18
Photoresist Composition And Method For Producing Photoresist Pattern App 20160170300 - MASUYAMA; Tatsuro ; et al.	2016-06-16
Non-ionic Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20160145186 - MASUYAMA; Tatsuro ; et al.	2016-05-26
Resist Composition And Method For Producing Resist Pattern App 20160147146 - MASUYAMA; Tatsuro ; et al.	2016-05-26
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20160139508 - MASUYAMA; Tatsuro ; et al.	2016-05-19
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20160130212 - MASUYAMA; Tatsuro ; et al.	2016-05-12
Resist Composition And Method For Producing Resist Pattern App 20160131975 - MASUYAMA; Tatsuro ; et al.	2016-05-12
Resist composition and method for producing resist pattern Grant 9,291,893 - Masuyama , et al. March 22, 2	2016-03-22
Resin, Resist Composition And Method For Producing Resist Pattern App 20160077429 - MASUYAMA; Tatsuro ; et al.	2016-03-17
Salt, Acid Generator, Resist Composition And Method For Producing Resist Pattern App 20160062233 - MASUYAMA; Tatsuro ; et al.	2016-03-03
Resist Composition And Method For Producing Resist Pattern App 20160062234 - MASUYAMA; Tatsuro ; et al.	2016-03-03
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20160052861 - MASUYAMA; Tatsuro ; et al.	2016-02-25
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20160052860 - MASUYAMA; Tatsuro ; et al.	2016-02-25
Compound, Resin, Resist Composition And Method For Producing Resist Pattern App 20160053032 - MASUYAMA; Tatsuro ; et al.	2016-02-25
Salt and photoresist composition comprising the same Grant 9,229,321 - Masuyama , et al. January 5, 2	2016-01-05
Resist composition and method for producing resist pattern Grant 9,176,379 - Ichikawa , et al. November 3, 2	2015-11-03
Photoresist Composition And Process Of Producing Photoresist Pattern App 20150286137 - MASUYAMA; Tatsuro ; et al.	2015-10-08
Photoresist composition and method for producing photoresist pattern Grant 9,134,607 - Masuyama , et al. September 15, 2	2015-09-15
Photoresist Composition, Compound And Process Of Producing Photoresist Pattern App 20150248052 - MASUYAMA; Tatsuro ; et al.	2015-09-03
Photoresist Composition, Compound And Process Of Producing Photoresist Pattern App 20150241769 - MASUYAMA; Tatsuro ; et al.	2015-08-27
Salt And Photoresist Composition Comprising The Same App 20150212408 - MASUYAMA; Tatsuro ; et al.	2015-07-30
Salt And Photoresist Composition Comprising The Same App 20150212407 - MASUYAMA; Tatsuro ; et al.	2015-07-30
Salt And Photoresist Composition Comprising The Same App 20150168828 - MASUYAMA; Tatsuro ; et al.	2015-06-18
Salt, photoresist composition and method for producing photoresist pattern Grant 9,051,251 - Masuyama , et al. June 9, 2	2015-06-09
Resist composition and method for producing resist pattern Grant 8,951,709 - Masuyama , et al. February 10, 2	2015-02-10
Photoresist composition Grant 8,900,790 - Masuyama , et al. December 2, 2	2014-12-02
Resin and photoresist composition comprising same Grant 8,765,357 - Masuyama , et al. July 1, 2	2014-07-01
Resist composition and method for producing resist pattern Grant 8,652,753 - Ichikawa , et al. February 18, 2	2014-02-18
Photoresist Composition And Method For Producing Photoresist Pattern App 20140030654 - MASUYAMA; Tatsuro ; et al.	2014-01-30
Photoresist Composition And Method For Producing Photoresist Pattern App 20140023971 - MASUYAMA; Tatsuro ; et al.	2014-01-23
Resist composition and method for producing resist pattern Grant 8,574,811 - Masuyama , et al. November 5, 2	2013-11-05
Resist composition and method for producing resist pattern Grant 8,563,219 - Ichikawa , et al. October 22, 2	2013-10-22
Photoresist composition Grant 8,530,137 - Masuyama , et al. September 10, 2	2013-09-10
Photoresist Composition App 20130177851 - KAWAMURA; Maki ; et al.	2013-07-11
Compound and photoresist composition containing the same Grant 8,475,999 - Masuyama , et al. July 2, 2	2013-07-02
Photoresist composition Grant 8,426,106 - Masuyama , et al. April 23, 2	2013-04-23
Salt, Photoresist Composition And Method For Producing Photoresist Pattern App 20130040237 - MASUYAMA; Tatsuro ; et al.	2013-02-14
Resist Composition And Method For Producing Resist Pattern App 20130022921 - ICHIKAWA; Koji ; et al.	2013-01-24
Salt and photoresist composition containing the same Grant 8,354,217 - Ichikawa , et al. January 15, 2	2013-01-15
Salt, Photoresist Composition And Method For Producing Photoresist Pattern App 20120315580 - MASUYAMA; Tatsuro ; et al.	2012-12-13
Imide compound and chemically amplified resist composition containing the same Grant 8,329,377 - Takemoto , et al. December 11, 2	2012-12-11
Salt and photoresist composition containing the same Grant 8,318,403 - Ichikawa , et al. November 27, 2	2012-11-27
Photoresist composition Grant 8,304,164 - Masuyama , et al. November 6, 2	2012-11-06
Resin And Photoresist Composition Comprising Same App 20120270154 - MASUYAMA; Tatsuro ; et al.	2012-10-25
Resist Composition And Method For Producing Resist Pattern App 20120264059 - ICHIKAWA; Koji ; et al.	2012-10-18
Salt and photoresist composition containing the same Grant 8,278,023 - Ichikawa , et al. October 2, 2	2012-10-02
Resist Composition And Method For Producing Resist Pattern App 20120219909 - ICHIKAWA; Koji ; et al.	2012-08-30
Sulfonium compound Grant 8,173,353 - Masuyama , et al. May 8, 2	2012-05-08
Oxime compound and resist composition containing the same Grant 8,173,350 - Masuyama , et al. May 8, 2	2012-05-08
Resist Composition And Method For Producing Resist Pattern App 20120100482 - MASUYAMA; Tatsuro ; et al.	2012-04-26
Resist Composition And Method For Producing Resist Pattern App 20120100483 - MASUYAMA; Tatsuro ; et al.	2012-04-26
Resist Composition And Method For Producing Resist Pattern App 20120052443 - MASUYAMA; Tatsuro ; et al.	2012-03-01
Photoresist Composition App 20110200935 - MASUYAMA; Tatsuro ; et al.	2011-08-18
Photoresist Composition App 20110171575 - MASUYAMA; Tatsuro ; et al.	2011-07-14
Photoresist Composition App 20110091807 - MASUYAMA; Tatsuro ; et al.	2011-04-21
Photoresist Composition App 20110091808 - MASUYAMA; Tatsuro ; et al.	2011-04-21
Photoresist Composition App 20110065047 - MASUYAMA; Tatsuro ; et al.	2011-03-17
Photoresist Composition App 20110065040 - MASUYAMA; Tatsuro ; et al.	2011-03-17
Compound And Photoresist Composition Containing The Same App 20110039209 - Masuyama; Tatsuro ; et al.	2011-02-17
Photoresist Composition Containing The Same App 20110039208 - Hata; Mitsuhiro ; et al.	2011-02-17
Salt And Photoresist Composition Containing The Same App 20100304292 - ICHIKAWA; Koji ; et al.	2010-12-02
Salt And Photoresist Composition Containing The Same App 20100304294 - ICHIKAWA; Koji ; et al.	2010-12-02
Sulfonium Compound App 20100248135 - MASUYAMA; Tatsuro ; et al.	2010-09-30
Imide Compound and Chemically Amplified Resist Composition Containing The Same App 20100028807 - TAKEMOTO; Ichiki ; et al.	2010-02-04
Oxime Compound and Resist Composition Containing the Same App 20100021847 - MASUYAMA; Tatsuro ; et al.	2010-01-28