| Patent | Date |
|---|
Chemically Amplified Positive Resist Composition And Resist Pattern Forming Process
App 20220308451 - Masunaga; Keiichi ; et al. | 2022-09-29 |
Chemically Amplified Negative Resist Composition And Resist Pattern Forming Process
App 20220276557 - Masunaga; Keiichi ; et al. | 2022-09-01 |
Onium salt, negative resist composition, and resist pattern forming process
Grant 11,429,023 - Domon , et al. August 30, 2 | 2022-08-30 |
Chemically Amplified Positive Resist Composition And Resist Pattern Forming Process
App 20220269174 - Kotake; Masaaki ; et al. | 2022-08-25 |
Chemically amplified negative resist composition and resist pattern forming process
Grant 11,231,650 - Kotake , et al. January 25, 2 | 2022-01-25 |
Resist composition and resist patterning process
Grant 11,131,926 - Suzuki , et al. September 28, 2 | 2021-09-28 |
Sulfonium compound, positive resist composition, and resist pattern forming process
Grant 11,124,477 - Inoue , et al. September 21, 2 | 2021-09-21 |
Conductive Polymer Composition, Coated Product And Patterning Process
App 20200292941 - NAGASAWA; Takayuki ; et al. | 2020-09-17 |
Multifunctional Polymers
App 20200278607 - Bozano; Luisa D. ; et al. | 2020-09-03 |
Chemically amplified negative resist composition and resist pattern forming process
Grant 10,725,377 - Kotake , et al. | 2020-07-28 |
Onium Salt, Negative Resist Composition, And Resist Pattern Forming Process
App 20200133121 - Domon; Daisuke ; et al. | 2020-04-30 |
Photomask blank, method for manufacturing photomask, and mask pattern formation method
Grant 10,585,345 - Irie , et al. | 2020-03-10 |
Sulfonium Compound, Positive Resist Composition, And Resist Pattern Forming Process
App 20200071268 - Inoue; Naoya ; et al. | 2020-03-05 |
Chemically amplified positive resist composition and resist pattern forming process
Grant 10,495,969 - Kotake , et al. De | 2019-12-03 |
Monomer, Polymer, Negative Resist Composition, Photomask Blank, And Resist Pattern Forming Process
App 20190361347 - Domon; Daisuke ; et al. | 2019-11-28 |
Chemically Amplified Negative Resist Composition And Resist Pattern Forming Process
App 20190361348 - Kotake; Masaaki ; et al. | 2019-11-28 |
Positive resist composition, resist pattern forming process, and photomask blank
Grant 10,416,558 - Masunaga , et al. Sept | 2019-09-17 |
Negative-tone resist compositions and multifunctional polymers therein
Grant 10,345,700 - Bozano , et al. July 9, 2 | 2019-07-09 |
Resist Composition And Resist Patterning Process
App 20190010119 - SUZUKI; Takahiro ; et al. | 2019-01-10 |
Negative resist composition and resist pattern forming process
Grant 10,120,279 - Masunaga , et al. November 6, 2 | 2018-11-06 |
Photomask Blank, Method For Manufacturing Photomask, And Mask Pattern Formation Method
App 20180267398 - IRIE; Shigeo ; et al. | 2018-09-20 |
Chemically Amplified Negative Resist Composition And Resist Pattern Forming Process
App 20180180998 - Kotake; Masaaki ; et al. | 2018-06-28 |
Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
App 20180180992 - Kotake; Masaaki ; et al. | 2018-06-28 |
Polymer compound, negative resist composition, laminate, patterning process, and compound
Grant 9,969,829 - Domon , et al. May 15, 2 | 2018-05-15 |
Polymer compound, positive resist composition, laminate, and resist patterning process
Grant 9,944,738 - Domon , et al. April 17, 2 | 2018-04-17 |
Chemically amplified negative resist composition and patterning process
Grant RE46,765 - Masunaga , et al. March 27, 2 | 2018-03-27 |
Chemically amplified negative resist composition and patterning process
Grant RE46,736 - Masunaga , et al. February 27, 2 | 2018-02-27 |
Photomask blank, resist pattern forming process, and method for making photomask
Grant 9,904,169 - Adachi , et al. February 27, 2 | 2018-02-27 |
Positive Resist Composition, Resist Pattern Forming Process, And Photomask Blank
App 20180039177 - Masunaga; Keiichi ; et al. | 2018-02-08 |
Negative Resist Composition And Resist Pattern Forming Process
App 20180039175 - Masunaga; Keiichi ; et al. | 2018-02-08 |
Chemically amplified negative resist composition using novel onium salt and resist pattern forming process
Grant 9,740,098 - Masunaga , et al. August 22, 2 | 2017-08-22 |
Chemically amplified positive resist composition and pattern forming process
Grant 9,720,323 - Kotake , et al. August 1, 2 | 2017-08-01 |
Polymer Compound, Negative Resist Composition, Laminate, Patterning Process, And Compound
App 20170210836 - DOMON; Daisuke ; et al. | 2017-07-27 |
Negative resist composition and pattern forming process
Grant 9,645,493 - Domon , et al. May 9, 2 | 2017-05-09 |
Sulfonium salt, resist composition and resist pattern forming process
Grant 9,604,921 - Domon , et al. March 28, 2 | 2017-03-28 |
Polymer Compound, Positive Resist Composition, Laminate, And Resist Patterning Process
App 20170037167 - DOMON; Daisuke ; et al. | 2017-02-09 |
Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition
Grant 9,558,862 - Sawai , et al. January 31, 2 | 2017-01-31 |
Onium salt, chemically amplified positive resist composition, and patterning process
Grant 9,535,325 - Domon , et al. January 3, 2 | 2017-01-03 |
Chemically-amplified positive resist composition and resist patterning process using the same
Grant 9,500,949 - Domon , et al. November 22, 2 | 2016-11-22 |
Chemically Amplified Negative Resist Composition Using Novel Onium Salt And Resist Pattern Forming Process
App 20160299428 - Masunaga; Keiichi ; et al. | 2016-10-13 |
Negative Resist Composition And Pattern Forming Process
App 20160299430 - Domon; Daisuke ; et al. | 2016-10-13 |
Photomask Blank, Resist Pattern Forming Process, And Method For Making Photomask
App 20160299431 - Adachi; Teppei ; et al. | 2016-10-13 |
Chemically-amplified negative resist composition and resist patterning process using the same
Grant 9,436,083 - Domon , et al. September 6, 2 | 2016-09-06 |
Chemically Amplified Positive Resist Composition And Pattern Forming Process
App 20160246175 - Kotake; Masaaki ; et al. | 2016-08-25 |
Photomask Blank, Resist Pattern Forming Process, And Method For Making Photomask
App 20160147142 - Adachi; Teppei ; et al. | 2016-05-26 |
Chemically amplified resist composition and pattern forming process
Grant 9,348,227 - Fukushima , et al. May 24, 2 | 2016-05-24 |
Chemically amplified negative resist composition and patterning process
Grant 9,329,476 - Domon , et al. May 3, 2 | 2016-05-03 |
Sulfonium Salt, Resist Composition And Resist Pattern Forming Process
App 20160090355 - Domon; Daisuke ; et al. | 2016-03-31 |
Sulfonium salt, resist composition and resist pattern forming process
Grant 9,285,678 - Domon , et al. March 15, 2 | 2016-03-15 |
Negative-tone Resist Compositions And Multifunctional Polymers Therein
App 20160070169 - Bozano; Luisa D. ; et al. | 2016-03-10 |
Chemically amplified negative resist composition and pattern forming process
Grant 9,244,348 - Masunaga , et al. January 26, 2 | 2016-01-26 |
Chemically Amplified Resist Composition And Pattern Forming Process
App 20150355544 - Fukushima; Masahiro ; et al. | 2015-12-10 |
Chemically amplified negative resist composition and patterning process
Grant 9,182,670 - Masunaga , et al. November 10, 2 | 2015-11-10 |
Chemically-amplified Negative Resist Composition And Resist Patterning Process Using The Same
App 20150268556 - DOMON; Daisuke ; et al. | 2015-09-24 |
Chemically-amplified Positive Resist Composition And Resist Patterning Process Using The Same
App 20150253664 - DOMON; Daisuke ; et al. | 2015-09-10 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20150198877 - DOMON; Daisuke ; et al. | 2015-07-16 |
Onium Salt, Chemically Amplified Positive Resist Composition, And Patterning Process
App 20150198876 - DOMON; Daisuke ; et al. | 2015-07-16 |
Chemically amplified negative resist composition and patterning process
Grant 9,075,306 - Takeda , et al. July 7, 2 | 2015-07-07 |
Sulfonium Salt, Resist Composition And Resist Pattern Forming Process
App 20150168829 - Domon; Daisuke ; et al. | 2015-06-18 |
Conductive Polymer Composition, Coated Article Having Antistatic Film Formed From The Composition, And Patterning Process Using The Composition
App 20150140492 - Sawai; Toshiya ; et al. | 2015-05-21 |
Positive resist composition and patterning process
Grant 8,968,979 - Takemura , et al. March 3, 2 | 2015-03-03 |
Chemically amplified negative resist composition and patterning process
Grant 8,951,710 - Masunaga , et al. February 10, 2 | 2015-02-10 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20140342274 - Masunaga; Keiichi ; et al. | 2014-11-20 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20140329183 - Masunaga; Keiichi ; et al. | 2014-11-06 |
Chemically amplified negative resist composition and patterning process
Grant 8,859,181 - Masunaga , et al. October 14, 2 | 2014-10-14 |
Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
Grant 8,835,097 - Domon , et al. September 16, 2 | 2014-09-16 |
Chemically amplified negative resist composition and patterning process
Grant 8,835,096 - Masunaga , et al. September 16, 2 | 2014-09-16 |
Negative resist composition and patterning process
Grant 8,828,645 - Tanaka , et al. September 9, 2 | 2014-09-09 |
Chemically amplified negative resist composition and patterning process
Grant 8,815,491 - Masunaga , et al. August 26, 2 | 2014-08-26 |
Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
Grant 8,691,490 - Ohashi , et al. April 8, 2 | 2014-04-08 |
Resist pattern forming process
Grant 8,685,629 - Masunaga , et al. April 1, 2 | 2014-04-01 |
Negative Resist Composition And Patterning Process
App 20140051025 - TANAKA; Akinobu ; et al. | 2014-02-20 |
Polymer, chemically amplified positive resist composition and pattern forming process
Grant 8,632,939 - Masunaga , et al. January 21, 2 | 2014-01-21 |
Negative resist composition and patterning process
Grant 8,603,724 - Tanaka , et al. December 10, 2 | 2013-12-10 |
Negative resist composition and patterning process
Grant 8,597,868 - Domon , et al. December 3, 2 | 2013-12-03 |
Negative resist composition, patterning process, and testing process and preparation process of negative resist composition
Grant 8,557,509 - Tanaka , et al. October 15, 2 | 2013-10-15 |
Chemically amplified positive resist composition and pattern forming process
Grant 8,546,060 - Masunaga , et al. October 1, 2 | 2013-10-01 |
Chemically Amplified Negative Resist Composition And Pattern Forming Process
App 20130209922 - MASUNAGA; Keiichi ; et al. | 2013-08-15 |
Negative resist composition and patterning process
Grant 8,470,509 - Tanaka , et al. June 25, 2 | 2013-06-25 |
Chemically amplified negative resist composition for EB or EUV lithography and patterning process
Grant 8,470,511 - Masunaga , et al. June 25, 2 | 2013-06-25 |
Polymer, chemically amplified negative resist composition, and patterning process
Grant 8,470,512 - Masunaga , et al. June 25, 2 | 2013-06-25 |
Chemically amplified positive resist composition for EB or EUV lithography and patterning process
Grant 8,426,108 - Masunaga , et al. April 23, 2 | 2013-04-23 |
Positive resist composition and pattern forming process
Grant 8,389,201 - Tanaka , et al. March 5, 2 | 2013-03-05 |
Preparation process of chemically amplified resist composition
Grant 8,367,295 - Masunaga , et al. February 5, 2 | 2013-02-05 |
Negative resist composition and patterning process using the same
Grant 8,361,692 - Tanaka , et al. January 29, 2 | 2013-01-29 |
Chemically amplified positive photoresist composition and pattern forming process
Grant 8,361,693 - Masunaga , et al. January 29, 2 | 2013-01-29 |
Photomask blank, resist pattern forming process, and photomask preparation process
Grant 8,343,694 - Koitabashi , et al. January 1, 2 | 2013-01-01 |
Sulfonium Salt, Polymer, Chemically Amplified Resist Composition Using Said Polymer, And Resist Patterning Process
App 20120308920 - DOMON; Daisuke ; et al. | 2012-12-06 |
Chemically amplified resist composition and pattern forming process
Grant 8,288,076 - Masunaga , et al. October 16, 2 | 2012-10-16 |
Deprotection method of protected polymer
Grant 8,273,830 - Masunaga , et al. September 25, 2 | 2012-09-25 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20120219888 - MASUNAGA; Keiichi ; et al. | 2012-08-30 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20120219887 - Masunaga; Keiichi ; et al. | 2012-08-30 |
Resist Pattern Forming Process
App 20120196211 - Masunaga; Keiichi ; et al. | 2012-08-02 |
Resist patterning process and manufacturing photo mask
Grant 8,110,335 - Takeda , et al. February 7, 2 | 2012-02-07 |
Polymer, Chemically Amplified Negative Resist Composition, And Patterning Process
App 20120028190 - Masunaga; Keiichi ; et al. | 2012-02-02 |
Photomask Blank, Resist Pattern Forming Process, And Photomask Preparation Process
App 20110294047 - Koitabashi; Ryuji ; et al. | 2011-12-01 |
Polymer, Chemically Amplified Positive Resist Composition And Pattern Forming Process
App 20110212391 - Masunaga; Keiichi ; et al. | 2011-09-01 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20110212390 - Masunaga; Keiichi ; et al. | 2011-09-01 |
Chemically Amplified Negative Resist Composition For Eb Or Euv Lithography And Patterning Process
App 20110200942 - Masunaga; Keiichi ; et al. | 2011-08-18 |
Chemically Amplified Positive Resist Composition And Pattern Forming Process
App 20110200919 - MASUNAGA; Keiichi ; et al. | 2011-08-18 |
Chemically Amplified Positive Resist Composition For Eb Or Euv Lithography And Patterning Process
App 20110200941 - MASUNAGA; Keiichi ; et al. | 2011-08-18 |
Novel Sulfonium Salt, Polymer, Method For Producing The Polymer, Resist Composition And Patterning Process
App 20110189607 - OHASHI; Masaki ; et al. | 2011-08-04 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20110177464 - Takeda; Takanobu ; et al. | 2011-07-21 |
Negative Resist Composition And Patterning Process
App 20110171579 - Domon; Daisuke ; et al. | 2011-07-14 |
Negative Resist Composition And Patterning Process
App 20110143266 - Tanaka; Akinobu ; et al. | 2011-06-16 |
Negative Resist Composition And Patterning Process
App 20110129765 - TANAKA; Akinobu ; et al. | 2011-06-02 |
Deprotection Method Of Protected Polymer
App 20110086986 - Masunaga; Keiichi ; et al. | 2011-04-14 |
Positive Resist Composition And Pattern Forming Process
App 20110003251 - TANAKA; Akinobu ; et al. | 2011-01-06 |
Chemically Amplified Positive Photoresist Composition And Pattern Forming Process
App 20100316955 - Masunaga; Keiichi ; et al. | 2010-12-16 |
Chemically Amplified Resist Composition And Pattern Forming Process
App 20100304302 - MASUNAGA; Keiichi ; et al. | 2010-12-02 |
Negative resist composition and patterning process using the same
App 20100304301 - Tanaka; Akinobu ; et al. | 2010-12-02 |
Negative resist composition, patterning process, and testing process and preparation process of negative resist composition
App 20100291484 - Tanaka; Akinobu ; et al. | 2010-11-18 |
Positive Resist Composition And Pattering Process
App 20100129738 - Takemura; Katsuya ; et al. | 2010-05-27 |
Resist patterning process and manufacturing photo mask
App 20100009271 - Takeda; Takanobu ; et al. | 2010-01-14 |
Polymer, resist composition and patterning process using the same
Grant 7,501,223 - Takeda , et al. March 10, 2 | 2009-03-10 |
Photomask Blank, Resist Pattern Forming Process, And Photomask Preparation Process
App 20080305411 - KOITABASHI; Ryuji ; et al. | 2008-12-11 |
Preparation Process Of Chemically Amplified Resist Composition
App 20080274422 - Masunaga; Keiichi ; et al. | 2008-11-06 |
Chemically Amplified Negative Resist Composition And Patterning Process
App 20080241751 - TAKEDA; Takanobu ; et al. | 2008-10-02 |
Novel polymer, resist composition and patterning process using the same
App 20080090179 - Takeda; Takanobu ; et al. | 2008-04-17 |
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