Maruyama; Tamotsu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Maruyama; Tamotsu.The latest application filed is for "photomask blank, photomask and fabrication method thereof".

Company Profile

0.8.9

Maruyama; Tamotsu - Niigata JP
Maruyama; Tamotsu - Niigata-ken JP
Maruyama; Tamotsu - Kubiki-mura JP
Maruyama; Tamotsu - Nakakubiki-gun JP
Maruyama; Tamotsu - Annaka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photomask blank, photomask and fabrication method thereof Grant 7,771,893 - Yoshikawa , et al. August 10, 2	2010-08-10
Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof Grant 7,622,227 - Inazuki , et al. November 24, 2	2009-11-24
Photomask blank, photomask and fabrication method thereof App 20070020534 - Yoshikawa; Hiroki ; et al.	2007-01-25
Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof App 20060257755 - Inazuki; Yukio ; et al.	2006-11-16
Photomask blank, photomask and method of manufacture Grant 6,733,930 - Shinagawa , et al. May 11, 2	2004-05-11
Photomask blank and photomask Grant 6,727,027 - Tsukamoto , et al. April 27, 2	2004-04-27
Phase shift mask blank, phase shift mask, and methods of manufacture Grant 6,641,958 - Inazuki , et al. November 4, 2	2003-11-04
Phase shift mask blank, phase shift mask and method of manufacture Grant 6,511,778 - Okazaki , et al. January 28, 2	2003-01-28
Photomask blank, photomask and method of manufacture Grant 6,503,669 - Kaneko , et al. January 7, 2	2003-01-07
Photomask blank, photomask and method of manufacture App 20020136966 - Shinagawa, Tsutomu ; et al.	2002-09-26
Photomask blank and photomask App 20020115003 - Tsukamoto, Tetsushi ; et al.	2002-08-22
Phase shift mask blank, phase shift mask, and methods of manufacture App 20020025478 - Inazuki, Yukio ; et al.	2002-02-28
Phase shift mask and method of manufacture App 20010028982 - Okazaki, Satoshi ; et al.	2001-10-11
Photomask blank, photomask and method of manufacture App 20010019801 - Kaneko, Hideo ; et al.	2001-09-06
Phase shift mask blank, phase shift mask, and method of manufacture App 20010007731 - Inazuki, Yukio ; et al.	2001-07-12
Phase shift mask blank, phase shift mask and method of manufacture App 20010006754 - Okazaki, Satoshi ; et al.	2001-07-05
Semiconductor single crystalline substrate and method for production thereof Grant 5,751,055 - Maruyama , et al. May 12, 1	1998-05-12

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