Maruyama; Taketo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Maruyama; Taketo.The latest application filed is for "support apparatus for balance correction".

Company Profile

0.14.15

Maruyama; Taketo - Tokyo JP
Maruyama; Taketo - Niigata N/A JP
Maruyama; Taketo - Chiba JP
Maruyama; Taketo - Niigata-ken JP
MARUYAMA, TAKETO - NIIGATA-SHI JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Support apparatus for balance correction Grant 10,054,129 - Miyahara , et al. August 21, 2	2018-08-21
Support Apparatus For Balance Correction App 20160333888 - MIYAHARA; Kazumasa ; et al.	2016-11-17
Etching solution for copper/molybdenum-based multilayer thin film Grant 9,365,770 - Okabe , et al. June 14, 2	2016-06-14
Etching liquid for a copper/titanium multilayer thin film Grant 8,980,121 - Adaniya , et al. March 17, 2	2015-03-17
Etching Solution For Copper/molybdenum-based Multilayer Thin Film App 20140162403 - Okabe; Satoshi ; et al.	2014-06-12
Etching Liquid For A Copper/titanium Multilayer Thin Film App 20130048904 - Adaniya; Tomoyuki ; et al.	2013-02-28
Etching Solution For Multilayer Thin Film Having Copper Layer And Molybdenum Layer Contained Therein App 20120319033 - Okabe; Satoshi ; et al.	2012-12-20
Etching composition and etching process Grant 8,048,331 - Matsubara , et al. November 1, 2	2011-11-01
Etching Composition And Etching Process App 20110049088 - MATSUBARA; Masahide ; et al.	2011-03-03
Etching Composition And Etching Process App 20070278185 - Matsubara; Masahide ; et al.	2007-12-06
Photoresist stripping composition and cleaning composition Grant 7,049,275 - Ikemoto , et al. May 23, 2	2006-05-23
Etching composition for laminated film including reflective electrode and method for forming laminated wiring structure App 20050190322 - Okabe, Satoshi ; et al.	2005-09-01
Photoresist stripping composition and process for stripping resist Grant 6,815,150 - Nakahara , et al. November 9, 2	2004-11-09
Photoresist stripper composition App 20040081922 - Ikemoto, Kazuto ; et al.	2004-04-29
Cleaning agent and cleaning process using the same Grant 6,686,322 - Nohara , et al. February 3, 2	2004-02-03
Resist stripping agent and process of producing semiconductor devices using the same Grant 6,638,694 - Ikemoto , et al. October 28, 2	2003-10-28
Resist Stripping Agent And Process Of Producing Semiconductor Devices Using The Same App 20030186175 - Ikemoto, Kazuto ; et al.	2003-10-02
Photoresist stripping composition and cleaning composition App 20030181344 - Ikemoto, Kazuto ; et al.	2003-09-25
Photoresist stripping composition and process for stripping resist App 20030152874 - Nakahara, Hijiri ; et al.	2003-08-14
Photoresist stripping composition and process for stripping photoresist Grant 6,458,517 - Nohara , et al. October 1, 2	2002-10-01
Photoresist removing composition Grant 6,440,326 - Maruyama , et al. August 27, 2	2002-08-27
Photoresist stripping composition and process for stripping photoresist App 20020009674 - Nohara, Masahiro ; et al.	2002-01-24
Resist Film Removing Composition And Method For Manufacturing Thin Film Circuit Element Using The Composition App 20010013502 - NOHARA, MASAHIRO ; et al.	2001-08-16
Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same Grant 6,265,309 - Gotoh , et al. July 24, 2	2001-07-24
Cleaning liquid for semiconductor devices Grant 5,962,385 - Maruyama , et al. October 5, 1	1999-10-05

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