Maruyama; Kimiyuki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Maruyama; Kimiyuki.The latest application filed is for "highly heat-resistant, negative-type photosensitive resin composition".
- Maruyama; Kimiyuki - Fuji JP
| Patent | Date |
|---|---|
| Highly heat-resistant, negative-type photosensitive resin composition Grant 7,282,323 - Kanatani , et al. October 16, 2 | 2007-10-16 |
| Highly heat-resistant, negative-type photosensitive resin composition App 20050244739 - Kanatani, Ryuichiro ; et al. | 2005-11-03 |
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