Patent | Date |
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Photoresist Development With Halide Chemistries App 20220244645 - Tan; Samantha SiamHwa ;   et al. | 2022-08-04 |
Vacuum-integrated Hardmask Processes And Apparatus App 20220075260 - Marks; Jeffrey ;   et al. | 2022-03-10 |
Vacuum-integrated hardmask processes and apparatus Grant 11,209,729 - Marks , et al. December 28, 2 | 2021-12-28 |
Methods and apparatus for extended dynamic range from single exposures in capillary electrophoresis Grant 10,902,593 - Marks , et al. January 26, 2 | 2021-01-26 |
Plasma Etching Chemistries Of High Aspect Ratio Features In Dielectrics App 20210005472 - KANARIK; Keren J. ;   et al. | 2021-01-07 |
Vacuum-integrated hardmask processes and apparatus Grant 10,831,096 - Marks , et al. November 10, 2 | 2020-11-10 |
Directional deposition on patterned structures Grant 10,825,680 - Kabansky , et al. November 3, 2 | 2020-11-03 |
Dry plasma etch method to pattern MRAM stack Grant 10,749,103 - Tan , et al. A | 2020-08-18 |
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20200161139 - Kanarik; Keren Jacobs ;   et al. | 2020-05-21 |
Vacuum-integrated Hardmask Processes And Apparatus App 20200089104 - Marks; Jeffrey ;   et al. | 2020-03-19 |
Methods And Apparatus For Extended Dynamic Range From Single Exposures In Capillary Electrophoresis App 20200074624 - MARKS; Jeffrey ;   et al. | 2020-03-05 |
Automated Quality Control And Spectral Error Correction For Sample Analysis Instruments App 20200003728 - Majumdar; Nivedita ;   et al. | 2020-01-02 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 10,515,816 - Kanarik , et al. Dec | 2019-12-24 |
Vacuum-integrated hardmask processes and apparatus Grant 10,514,598 - Marks , et al. Dec | 2019-12-24 |
System and methods for calibrating binding dyes Grant 10,501,788 - Chu , et al. Dec | 2019-12-10 |
Dry Plasma Etch Method To Pattern Mram Stack App 20190312194 - Tan; Samantha ;   et al. | 2019-10-10 |
Methods and systems for analyzing biological reaction systems Grant 10,403,000 - Chu , et al. Sep | 2019-09-03 |
Dry plasma etch method to pattern MRAM stack Grant 10,374,144 - Tan , et al. | 2019-08-06 |
Ale smoothness: in and outside semiconductor industry Grant 10,304,659 - Kanarik , et al. | 2019-05-28 |
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20190139778 - Kanarik; Keren Jacobs ;   et al. | 2019-05-09 |
Systems And Methods For Biological Analysis App 20190126281 - CHU; Yong ;   et al. | 2019-05-02 |
Vacuum-integrated Hardmask Processes And Apparatus App 20190094685 - Marks; Jeffrey ;   et al. | 2019-03-28 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) Grant 10,186,426 - Kanarik , et al. Ja | 2019-01-22 |
Methods and systems for streamlining optical calibration Grant 10,147,182 - Freudenthal , et al. De | 2018-12-04 |
Methods And Systems For Biological Instrument Calibration App 20180292320 - Chu; Yong ;   et al. | 2018-10-11 |
Atomic layer etching of tungsten and other metals Grant 10,096,487 - Yang , et al. October 9, 2 | 2018-10-09 |
Methods And Systems For Analyzing Biological Reaction Systems App 20180276849 - Chu; Yong ;   et al. | 2018-09-27 |
Atomic layer etching of GaN and other III-V materials Grant 10,056,264 - Yang , et al. August 21, 2 | 2018-08-21 |
Ale Smoothness: In And Outside Semiconductor Industry App 20180233325 - Kanarik; Keren Jacobs ;   et al. | 2018-08-16 |
Directional Deposition On Patterned Structures App 20180233357 - Kabansky; Alexander ;   et al. | 2018-08-16 |
Methods And Systems For Pure Dye Instrument Normalization App 20180230511 - Marks; Jeffrey | 2018-08-16 |
Methods and systems for biological instrument calibration Grant 10,012,590 - Chu , et al. July 3, 2 | 2018-07-03 |
ALE smoothness: in and outside semiconductor industry Grant 9,984,858 - Kanarik , et al. May 29, 2 | 2018-05-29 |
Methods and systems for analyzing biological reaction systems Grant 9,898,820 - Chu , et al. February 20, 2 | 2018-02-20 |
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20180033635 - Kanarik; Keren Jacobs ;   et al. | 2018-02-01 |
Dry Plasma Etch Method To Pattern Mram Stack App 20180019387 - Tan; Samantha ;   et al. | 2018-01-18 |
Vacuum-integrated Hardmask Processes And Apparatus App 20180004083 - Marks; Jeffrey ;   et al. | 2018-01-04 |
Methods and systems for pure dye instrument normalization Grant 9,809,849 - Marks November 7, 2 | 2017-11-07 |
Dry plasma etch method to pattern MRAM stack Grant 9,806,252 - Tan , et al. October 31, 2 | 2017-10-31 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 9,805,941 - Kanarik , et al. October 31, 2 | 2017-10-31 |
Vacuum-integrated hardmask processes and apparatus Grant 9,778,561 - Marks , et al. October 3, 2 | 2017-10-03 |
Directional Deposition On Patterned Structures App 20170178899 - Kabansky; Alexander ;   et al. | 2017-06-22 |
Methods and Systems for Streamlining Optical Calibration App 20170161429 - Freudenthal; Jacob ;   et al. | 2017-06-08 |
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20170117159 - Kanarik; Keren Jacobs ;   et al. | 2017-04-27 |
Ale Smoothness: In And Outside Semiconductor Industry App 20170069462 - Kanarik; Keren Jacobs ;   et al. | 2017-03-09 |
Atomic Layer Etching Of Tungsten And Other Metals App 20170053810 - Yang; Wenbing ;   et al. | 2017-02-23 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 9,576,811 - Kanarik , et al. February 21, 2 | 2017-02-21 |
ATOMIC LAYER ETCHING OF GaN AND OTHER III-V MATERIALS App 20160358782 - Yang; Wenbing ;   et al. | 2016-12-08 |
Dry Plasma Etch Method To Pattern Mram Stack App 20160308112 - Tan; Samantha ;   et al. | 2016-10-20 |
Methods And Systems For Analyzing Biological Reaction Systems App 20160275687 - CHU; Yong ;   et al. | 2016-09-22 |
Methods And Systems For Pure Dye Instrument Nomalization App 20160237474 - Marks; Jeffrey | 2016-08-18 |
Methods And Systems For Biological Instrument Calibration App 20160231246 - Chu; Yong ;   et al. | 2016-08-11 |
System and Methods for Calibrating Binding Dyes App 20160230209 - Chu; Yong ;   et al. | 2016-08-11 |
Systems and Methods for Biological Analysis App 20160228876 - Chu; Yong ;   et al. | 2016-08-11 |
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20160203995 - Kanarik; Keren Jacobs ;   et al. | 2016-07-14 |
Method to etch non-volatile metal materials Grant 9,391,267 - Shen , et al. July 12, 2 | 2016-07-12 |
Method to etch non-volatile metal materials Grant 9,257,638 - Tan , et al. February 9, 2 | 2016-02-09 |
Method To Etch Non-volatile Metal Materials App 20150340603 - SHEN; Meihua ;   et al. | 2015-11-26 |
CVD based metal/semiconductor OHMIC contact for high volume manufacturing applications Grant 9,153,486 - Arghavani , et al. October 6, 2 | 2015-10-06 |
Method To Etch Non-volatile Metal Materials App 20150280114 - SHEN; Meihua ;   et al. | 2015-10-01 |
Method To Etch Non-volatile Metal Materials App 20150280113 - TAN; Samantha S.H. ;   et al. | 2015-10-01 |
Method to etch non-volatile metal materials Grant 9,130,158 - Shen , et al. September 8, 2 | 2015-09-08 |
Vacuum-integrated Hardmask Processes And Apparatus App 20150221519 - Marks; Jeffrey ;   et al. | 2015-08-06 |
Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods App 20150079795 - Hemker; David J. ;   et al. | 2015-03-19 |
Cvd Based Metal/semiconductor Ohmic Contact For High Volume Manufacturing Applications App 20140308812 - Arghavani; Reza ;   et al. | 2014-10-16 |
Apparatus And Methods For Conducting Communications With A Telephony Device That Is Assigned Multiple Identifiers Associated With Different Geographical Regions App 20140269438 - BUGOS; Alan Ronald ;   et al. | 2014-09-18 |
Apparatus And Methods For Conducting Communications With A Telephony Device That Is Assigned Multiple Identifiers Associated With Different Geographical Regions App 20140269675 - BUGOS; Alan Ronald ;   et al. | 2014-09-18 |
Layer-layer Etch Of Non Volatile Materials App 20130270227 - GUHA; Joydeep ;   et al. | 2013-10-17 |
Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods App 20120088370 - Hemker; David J. ;   et al. | 2012-04-12 |
User Generated Content App 20090064247 - Biniak; Bryan ;   et al. | 2009-03-05 |
Tuning/customization App 20090064017 - Biniak; Bryan ;   et al. | 2009-03-05 |
Heat Index App 20090062941 - Biniak; Bryan ;   et al. | 2009-03-05 |
Pitch reduction Grant 7,429,533 - Huang , et al. September 30, 2 | 2008-09-30 |
Multiple frequency plasma processor method and apparatus Grant 7,405,521 - Dhindsa , et al. July 29, 2 | 2008-07-29 |
System For Providing And Presenting Fantasy Sports Data App 20080081700 - BINIAK; BRYAN ;   et al. | 2008-04-03 |
System For Providing Secondary Content Based On Primary Broadcast App 20080082922 - BINIAK; BRYAN ;   et al. | 2008-04-03 |
System For Providing Promotional Content As Part Of Secondary Content Associated With A Primary Broadcast App 20080083003 - BINIAK; BRYAN ;   et al. | 2008-04-03 |
System and method for counting and tracking individuals, animals and objects in defined locations App 20080067244 - Marks; Jeffrey | 2008-03-20 |
Display device App 20080055885 - Marks; Jeffrey | 2008-03-06 |
Pitch reduction App 20070264830 - Huang; Zhisong ;   et al. | 2007-11-15 |
Reduction of feature critical dimensions using multiple masks Grant 7,271,107 - Marks , et al. September 18, 2 | 2007-09-18 |
Methods and apparatus for fabricating conductive features on glass substrates used in liquid crystal displays App 20070082299 - Marks; Jeffrey | 2007-04-12 |
Personalized picture frame assembly Grant 7,114,278 - Marks , et al. October 3, 2 | 2006-10-03 |
Reduction of feature critical dimensions using multiple masks App 20060172540 - Marks; Jeffrey ;   et al. | 2006-08-03 |
Reduction of etch mask feature critical dimensions App 20060134917 - Huang; Zhisong ;   et al. | 2006-06-22 |
Personalized picture frame assembly App 20050252059 - Marks, Jeffrey ;   et al. | 2005-11-17 |
Method and apparatus for detecting endpoint during plasma etching of thin films Grant 6,908,846 - McMillin , et al. June 21, 2 | 2005-06-21 |
Multiple frequency plasma etch reactor App 20050039682 - Dhindsa, Raj ;   et al. | 2005-02-24 |
Method and apparats for detecting endpoint during plasma etching of thin films App 20040080050 - McMillin, Brian K, ;   et al. | 2004-04-29 |
Plasma reactor using inductive RF coupling, and processes Grant 6,545,420 - Collins , et al. April 8, 2 | 2003-04-08 |
Plasma reactor using inductive RF coupling, and processes Grant 6,518,195 - Collins , et al. February 11, 2 | 2003-02-11 |
Magnetic confinement in a plasma reactor having an RF bias electrode Grant 6,488,807 - Collins , et al. December 3, 2 | 2002-12-03 |
Method for processing substrates using gaseous silicon scavenger Grant 6,444,137 - Collins , et al. September 3, 2 | 2002-09-03 |
High temperature silicon surface providing high selectivity in an oxide etch process Grant 6,399,514 - Marks , et al. June 4, 2 | 2002-06-04 |
Enhanced resist strip in a dielectric etcher using downstream plasma App 20020052114 - Marks, Jeffrey | 2002-05-02 |
Enhanced resist strip in a dielectric etcher using downstream plasma Grant 6,362,110 - Marks March 26, 2 | 2002-03-26 |
Processes Used In An Inductively Coupled Plasma Reactor App 20020004309 - COLLINS, KENNETH S. ;   et al. | 2002-01-10 |
Apparatus and method for distribution of slurry in a chemical mechanical polishing system Grant 6,280,297 - Tolles , et al. August 28, 2 | 2001-08-28 |
Plasma etch processes Grant 6,251,792 - Collins , et al. June 26, 2 | 2001-06-26 |
Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography Grant 6,194,325 - Yang , et al. February 27, 2 | 2001-02-27 |
Process used in an RF coupled plasma reactor Grant 6,068,784 - Collins , et al. May 30, 2 | 2000-05-30 |
Plasma reactor with heated source of a polymer-hardening precursor material Grant 6,036,877 - Collins , et al. March 14, 2 | 2000-03-14 |
Plasma reactor with heated source of a polymer-hardening precursor material Grant 6,024,826 - Collins , et al. February 15, 2 | 2000-02-15 |
Method and apparatus for removing a substrate from a polishing pad in a chemical mechanical polishing system Grant 5,899,801 - Tolles , et al. May 4, 1 | 1999-05-04 |
Plasma reactor and processes using RF inductive coupling and scavenger temperature control Grant 5,888,414 - Collins , et al. March 30, 1 | 1999-03-30 |
Process for etching oxides in an electromagnetically coupled planar plasma apparatus Grant 5,772,832 - Collins , et al. June 30, 1 | 1998-06-30 |
Plasma etch apparatus with heated scavenging surfaces Grant 5,770,099 - Rice , et al. June 23, 1 | 1998-06-23 |
Electrostatic chuck usable in high density plasma Grant 5,583,737 - Collins , et al. December 10, 1 | 1996-12-10 |
Silicon scavenger in an inductively coupled RF plasma reactor Grant 5,556,501 - Collins , et al. September 17, 1 | 1996-09-17 |
Electrostatic chuck usable in high density plasma Grant 5,539,609 - Collins , et al. July 23, 1 | 1996-07-23 |
Plasma etch apparatus with heated scavenging surfaces Grant 5,477,975 - Rice , et al. December 26, 1 | 1995-12-26 |
Selectivity for etching an oxide over a nitride Grant 5,423,945 - Marks , et al. June 13, 1 | 1995-06-13 |
Etching titanium nitride using carbon-fluoride and carbon-oxide gas Grant 5,399,237 - Keswick , et al. March 21, 1 | 1995-03-21 |
Electrostatic chuck for high power plasma processing Grant 5,350,479 - Collins , et al. September 27, 1 | 1994-09-27 |
Method for planarizing an integrated circuit structure using low melting inorganic material and flowing while depositing Grant 5,244,841 - Marks , et al. * September 14, 1 | 1993-09-14 |
Method for planarizing an integrated circuit structure using low melting inorganic material Grant 5,204,288 - Marks , et al. April 20, 1 | 1993-04-20 |
Method for planarizing an integrated circuit structure using low melting inorganic material and flowing while depositing Grant 5,112,776 - Marks , et al. * May 12, 1 | 1992-05-12 |