loadpatents
Patent applications and USPTO patent grants for Maria Zaal; Koen Jacobus Johannes.The latest application filed is for "lithographic apparatus and device manufacturing method".
Patent | Date |
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System and method for compensating for radiation induced thermal distortions in a substrate or projection system Grant 7,830,493 - Tinnemans , et al. November 9, 2 | 2010-11-09 |
Lithographic apparatus and device manufacturing method App 20070153244 - Maria Zaal; Koen Jacobus Johannes ;   et al. | 2007-07-05 |
Lithographic apparatus and device manufacturing method App 20070097346 - Maria Zaal; Koen Jacobus Johannes ;   et al. | 2007-05-03 |
System and method for compensating for radiation induced thermal distortions App 20070076180 - Tinnemans; Patricius Aloysius Jacobus ;   et al. | 2007-04-05 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby App 20060158638 - Maria Zaal; Koen Jacobus Johannes ;   et al. | 2006-07-20 |
Lithographic apparatus and device manufacturing method App 20060102277 - Maria Zaal; Koen Jacobus Johannes ;   et al. | 2006-05-18 |
Lithographic apparatus and device manufacturing method App 20060049698 - Maria Zaal; Koen Jacobus Johannes ;   et al. | 2006-03-09 |
Lithographic apparatus and device manufacturing method App 20050219499 - Maria Zaal, Koen Jacobus Johannes ;   et al. | 2005-10-06 |
Lithographic apparatus and device manufacturing method App 20050195382 - Ottens, Joost Jeroen ;   et al. | 2005-09-08 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby App 20050030512 - Maria Zaal, Koen Jacobus Johannes ;   et al. | 2005-02-10 |
Lithographic apparatus, substrate holder and method of manufacturing App 20040247361 - Maria Zaal, Koen Jacobus Johannes ;   et al. | 2004-12-09 |
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