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Patent applications and USPTO patent grants for Maria Maas; Wouterus Johannes Petrus.The latest application filed is for "lithographic apparatus and method".
Patent | Date |
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Lithographic Apparatus And Method App 20090279061 - JACOBS; Johannes Henricus Wilhelmus ;   et al. | 2009-11-12 |
Optimized correction of water thermal deformations in a lithographic process App 20070257209 - Ottens; Joost Jeroen ;   et al. | 2007-11-08 |
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