| Patent | Date |
|---|
Systems And Methods For Cleaning An Edge Ring Pocket
App 20220254616 - Hudson; Eric ; et al. | 2022-08-11 |
Systems And Methods For Optimizing Power Delivery To An Electrode Of A Plasma Chamber
App 20220199366 - Bhowmick; Ranadeep ; et al. | 2022-06-23 |
Systems and methods for optimizing power delivery to an electrode of a plasma chamber
Grant 11,335,539 - Bhowmick , et al. May 17, 2 | 2022-05-17 |
High Speed Synchronization Of Plasma Source/Bias Power Delivery
App 20220005674 - RADOMSKI; Aaron T. ; et al. | 2022-01-06 |
Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators
Grant 11,195,706 - Marakhtanov , et al. December 7, 2 | 2021-12-07 |
High speed synchronization of plasma source/bias power delivery
Grant 11,158,488 - Radomski , et al. October 26, 2 | 2021-10-26 |
Systems And Methods For Optimizing Power Delivery To An Electrode Of A Plasma Chamber
App 20210319980 - Bhowmick; Ranadeep ; et al. | 2021-10-14 |
Electrostatic Chuck Design For Cooling-gas Light-up Prevention
App 20210296099 - Matyushkin; Alexander ; et al. | 2021-09-23 |
Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
Grant 11,069,553 - Matyushkin , et al. July 20, 2 | 2021-07-20 |
Electrostatic chuck design for cooling-gas light-up prevention
Grant 11,024,532 - Matyushkin , et al. June 1, 2 | 2021-06-01 |
Active control of radial etch uniformity
Grant 10,916,409 - Marakhtanov , et al. February 9, 2 | 2021-02-09 |
High Speed Synchronization Of Plasma Source/Bias Power Delivery
App 20200411289 - RADOMSKI; Aaron T. ; et al. | 2020-12-31 |
Three or more states for achieving high aspect ratio dielectric etch
Grant 10,861,708 - Yanagawa , et al. December 8, 2 | 2020-12-08 |
Ring Structures and Systems for Use in a Plasma Chamber
App 20200365378 - Kellogg; Michael C. ; et al. | 2020-11-19 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 10,825,656 - Kellogg , et al. November 3, 2 | 2020-11-03 |
Ion energy control by RF pulse shape
Grant 10,755,895 - Marakhtanov , et al. A | 2020-08-25 |
Multi Zone Gas Injection Upper Electrode System
App 20200243307 - Bise; Ryan ; et al. | 2020-07-30 |
Pulsed Plasma Chamber In Dual Chamber Configuration
App 20200227237 - Marakhtanov; Alexei ; et al. | 2020-07-16 |
Systems And Methods For Controlling Directionality Of Ions In An Edge Region By Using An Electrode Within A Coupling Ring
App 20200227238 - Kellogg; Michael C. ; et al. | 2020-07-16 |
Multi zone gas injection upper electrode system
Grant 10,622,195 - Bise , et al. | 2020-04-14 |
Systems and methods for controlling a plasma edge region
Grant 10,622,190 - Marakhtanov , et al. | 2020-04-14 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 10,615,003 - Kellogg , et al. | 2020-04-07 |
Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
App 20200105508 - Belau; Leonid ; et al. | 2020-04-02 |
Three Or More States For Achieving High Aspect Ratio Dielectric Etch
App 20200090948 - Yanagawa; Takumi ; et al. | 2020-03-19 |
Multi-radiofrequency impedance control for plasma uniformity tuning
Grant 10,593,516 - Marakhtanov , et al. | 2020-03-17 |
Pulsed plasma chamber in dual chamber configuration
Grant 10,553,399 - Marakhtanov , et al. Fe | 2020-02-04 |
Active Control Of Radial Etch Uniformity
App 20190385822 - Marakhtanov; Alexei ; et al. | 2019-12-19 |
Three or more states for achieving high aspect ratio dielectric etch
Grant 10,504,744 - Yanagawa , et al. Dec | 2019-12-10 |
Control Of Etch Rate Using Modeling, Feedback And Impedance Match
App 20190318919 - Lyndaker; Bradford J. ; et al. | 2019-10-17 |
Control of etch rate using modeling, feedback and impedance match
Grant 10,381,201 - Lyndaker , et al. A | 2019-08-13 |
Systems And Methods For Achieving A Pre-determined Factor Associated With An Edge Region Within A Plasma Chamber By Synchronizin
App 20190244788 - Marakhtanov; Alexei ; et al. | 2019-08-08 |
Tapered Upper Electrode For Uniformity Control In Plasma Processing
App 20190244793 - Chen; Zhigang ; et al. | 2019-08-08 |
Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
Grant 10,340,122 - Chen , et al. | 2019-07-02 |
Multi regime plasma wafer processing to increase directionality of ions
Grant 10,304,662 - Marakhtanov , et al. | 2019-05-28 |
Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators
Grant 10,283,330 - Marakhtanov , et al. | 2019-05-07 |
Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
Grant 10,276,348 - Marakhtanov , et al. | 2019-04-30 |
Control of impedance of RF return path
Grant 10,249,476 - Marakhtanov , et al. | 2019-04-02 |
Multi Regime Plasma Wafer Processing to Increase Directionality of Ions
App 20190080885 - Marakhtanov; Alexei ; et al. | 2019-03-14 |
Systems And Methods For Controlling Directionality Of Ions In An Edge Region By Using An Electrode Within A Coupling Ring
App 20190057839 - Kellogg; Michael C. ; et al. | 2019-02-21 |
Negative ion control for dielectric etch
Grant 10,181,412 - Marakhtanov , et al. Ja | 2019-01-15 |
Electrostatic Chuck Design For Cooling-gas Light-up Prevention
App 20190006225 - Matyushkin; Alexander ; et al. | 2019-01-03 |
Control of impedance of RF delivery path
Grant 10,157,730 - Marakhtanov , et al. Dec | 2018-12-18 |
Uniformity control circuit for use within an impedance matching circuit
Grant 10,115,564 - Marakhtanov , et al. October 30, 2 | 2018-10-30 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 10,115,568 - Kellogg , et al. October 30, 2 | 2018-10-30 |
Systems And Methods For Tailoring Ion Energy Distribution Function By Odd Harmonic Mixing
App 20180301320 - Chen; Zhigang ; et al. | 2018-10-18 |
Electrostatic chuck design for cooling-gas light-up prevention
Grant 10,083,853 - Matyushkin , et al. September 25, 2 | 2018-09-25 |
Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
Grant 10,026,592 - Chen , et al. July 17, 2 | 2018-07-17 |
Multi regime plasma wafer processing to increase directionality of ions
Grant 10,002,746 - Marakhtanov , et al. June 19, 2 | 2018-06-19 |
Multi-radiofrequency Impedance Control For Plasma Uniformity Tuning
App 20180166256 - Marakhtanov; Alexei ; et al. | 2018-06-14 |
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
Grant 9,984,859 - Marakhtanov , et al. May 29, 2 | 2018-05-29 |
Systems And Methods For Controlling Directionality Of Ions In An Edge Region By Using An Electrode Within A Coupling Ring
App 20180082822 - Kellogg; Michael C. ; et al. | 2018-03-22 |
Systems And Methods For Achieving A Pre-determined Factor Associated With An Edge Region Within A Plasma Chamber By Synchronizing Main And Edge Rf Generators
App 20180025891 - Marakhtanov; Alexei ; et al. | 2018-01-25 |
Systems And Methods For Tailoring Ion Energy Distribution Function By Odd Harmonic Mixing
App 20180005802 - Chen; Zhigang ; et al. | 2018-01-04 |
Ion To Neutral Control For Wafer Processing With Dual Plasma Source Reactor
App 20180005852 - Dhindsa; Rajinder ; et al. | 2018-01-04 |
Uniformity Control Circuit For Use Within An Impedance Matching Circuit
App 20170372872 - Marakhtanov; Alexei ; et al. | 2017-12-28 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 9,852,889 - Kellogg , et al. December 26, 2 | 2017-12-26 |
Ion to neutral control for wafer processing with dual plasma source reactor
Grant 9,793,126 - Dhindsa , et al. October 17, 2 | 2017-10-17 |
Plasma processing chamber with dual axial gas injection and exhaust
Grant 9,793,128 - Dhindsa , et al. October 17, 2 | 2017-10-17 |
Uniformity control circuit for use within an impedance matching circuit
Grant 9,761,414 - Marakhtanov , et al. September 12, 2 | 2017-09-12 |
Multifrequency Capacitively Coupled Plasma Etch Chamber
App 20170213734 - Marakhtanov; Alexei ; et al. | 2017-07-27 |
Ion To Neutral Control For Wafer Processing With Dual Plasma Source Reactor
App 20170213747 - Dhindsa; Rajinder ; et al. | 2017-07-27 |
Control Of Etch Rate Using Modeling, Feedback And Impedance Match
App 20170194130 - Lyndaker; Bradford J. ; et al. | 2017-07-06 |
Impedance Matching Circuit For Operation With A Kilohertz Rf Generator And A Megahertz Rf Generator To Control Plasma Processes
App 20170162368 - Marakhtanov; Alexei ; et al. | 2017-06-08 |
Electrostatic Chuck Design For Cooling-gas Light-up Prevention
App 20170110356 - Matyushkin; Alexander ; et al. | 2017-04-20 |
Uniformity Control Circuit For Use Within An Impedance Matching Circuit
App 20170103870 - Marakhtanov; Alexei ; et al. | 2017-04-13 |
Control of etch rate using modeling, feedback and impedance match
Grant 9,620,334 - Lyndaker , et al. April 11, 2 | 2017-04-11 |
Ion Energy Control By RF Pulse Shape
App 20170084429 - Marakhtanov; Alexei ; et al. | 2017-03-23 |
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
Grant 9,595,424 - Marakhtanov , et al. March 14, 2 | 2017-03-14 |
Ion energy control by RF pulse shape
Grant 9,536,749 - Marakhtanov , et al. January 3, 2 | 2017-01-03 |
Method and apparatus for DC voltage control on RF-powered electrode
Grant 9,536,711 - Dhindsa , et al. January 3, 2 | 2017-01-03 |
Systems And Methods For Controlling A Plasma Edge Region
App 20160307737 - Marakhtanov; Alexei ; et al. | 2016-10-20 |
Control Of Impedance Of Rf Delivery Path
App 20160307738 - Marakhtanov; Alexei ; et al. | 2016-10-20 |
Impedance Matching Circuit For Operation With A Kilohertz Rf Generator And A Megahertz Rf Generator To Control Plasma Processes
App 20160260584 - Marakhtanov; Alexei ; et al. | 2016-09-08 |
Control of Impedance of RF Return Path
App 20160233058 - Marakhtanov; Alexei ; et al. | 2016-08-11 |
Control of impedance of RF delivery path
Grant 9,401,264 - Marakhtanov , et al. July 26, 2 | 2016-07-26 |
Systems and methods for controlling a plasma edge region
Grant 9,396,908 - Marakhtanov , et al. July 19, 2 | 2016-07-19 |
Ion Energy Control By RF Pulse Shape
App 20160172216 - Marakhtanov; Alexei ; et al. | 2016-06-16 |
Methods And Apparatus For A Hybrid Capacitively-coupled And An Inductively-coupled Plasma Processing System
App 20160155615 - MARAKHTANOV; Alexei ; et al. | 2016-06-02 |
Pulsed Plasma Chamber In Dual Chamber Configuration
App 20160148786 - Marakhtanov; Alexei ; et al. | 2016-05-26 |
Grounded confinement ring having large surface area
Grant 9,337,004 - Marakhtanov , et al. May 10, 2 | 2016-05-10 |
Control of impedance of RF return path
Grant 9,337,000 - Marakhtanov , et al. May 10, 2 | 2016-05-10 |
Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control
App 20160079039 - Dhindsa; Rajinder ; et al. | 2016-03-17 |
Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
Grant 9,287,096 - Marakhtanov , et al. March 15, 2 | 2016-03-15 |
Movable Ground Ring For Movable Substrate Support Assembly Of A Plasma Processing Chamber
App 20160050781 - Kellogg; Michael C. ; et al. | 2016-02-18 |
Dual zone temperature control of upper electrodes
Grant 9,263,240 - Marakhtanov , et al. February 16, 2 | 2016-02-16 |
Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate
Grant 9,251,999 - Dhindsa , et al. February 2, 2 | 2016-02-02 |
Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system
Grant 9,245,720 - Marakhtanov , et al. January 26, 2 | 2016-01-26 |
Negative Ion Control For Dielectric Etch
App 20150357209 - Marakhtanov; Alexei ; et al. | 2015-12-10 |
Apparatus and methods for edge ring implementation for substrate processing
Grant 9,184,074 - Dhindsa , et al. November 10, 2 | 2015-11-10 |
Consumable isolation ring for movable substrate support assembly of a plasma processing chamber
Grant 9,171,702 - Kellogg , et al. October 27, 2 | 2015-10-27 |
Gas feed insert in a plasma processing chamber and methods therefor
Grant 9,111,731 - de la Llera , et al. August 18, 2 | 2015-08-18 |
Control of Impedance of RF Delivery Path
App 20150091441 - Marakhtanov; Alexei ; et al. | 2015-04-02 |
Control of Impedance of RF Return Path
App 20150091440 - Marakhtanov; Alexei ; et al. | 2015-04-02 |
Ion To Neutral Control For Wafer Processing With Dual Plasma Source Reactor
App 20150083582 - Dhindsa; Rajinder ; et al. | 2015-03-26 |
Methods for Selectively Modifying RF Current Paths in a Plasma Processing System
App 20150053644 - Nam; Sang Ki ; et al. | 2015-02-26 |
Methods and apparatus for selectively modifying RF current paths in a plasma processing system
Grant 8,911,588 - Nam , et al. December 16, 2 | 2014-12-16 |
Integrated capacitive and inductive power sources for a plasma etching chamber
Grant 8,911,590 - Dhindsa , et al. December 16, 2 | 2014-12-16 |
Plasma-enhanced substrate processing method and apparatus
Grant 8,911,637 - Dhindsa , et al. December 16, 2 | 2014-12-16 |
Chuck assembly for plasma processing
Grant 8,898,889 - Nam , et al. December 2, 2 | 2014-12-02 |
Plasma unconfinement sensor and methods thereof
Grant 8,894,804 - Booth , et al. November 25, 2 | 2014-11-25 |
System, method and apparatus for detecting DC bias in a plasma processing chamber
Grant 8,872,525 - Marakhtanov , et al. October 28, 2 | 2014-10-28 |
Movable grounding arrangements in a plasma processing chamber and methods therefor
Grant 8,847,495 - de la Llera , et al. September 30, 2 | 2014-09-30 |
C-shaped confinement ring for a plasma processing chamber
Grant 8,826,855 - Kellogg , et al. September 9, 2 | 2014-09-09 |
Control of Etch Rate Using Modeling, Feedback and Impedance Match
App 20140195033 - Lyndaker; Bradford J. ; et al. | 2014-07-10 |
Rf Ground Return In Plasma Processing Systems And Methods Therefor
App 20140060739 - Dhindsa; Rajinder ; et al. | 2014-03-06 |
Triode reactor design with multiple radiofrequency powers
Grant 8,652,298 - Dhindsa , et al. February 18, 2 | 2014-02-18 |
Apparatus For Plasma Processing System With Tunable Capacitance
App 20140034243 - Dhindsa; Rajinder ; et al. | 2014-02-06 |
Methods And Apparatus For Detecting Azimuthal Non-uniformity In A Plasma Processing System
App 20130327481 - Marakhtanov; Alexei ; et al. | 2013-12-12 |
Methods and arrangements for plasma processing system with tunable capacitance
Grant 8,563,619 - Dhindsa , et al. October 22, 2 | 2013-10-22 |
Multi-radiofrequency Impedance Control For Plasma Uniformity Tuning
App 20130260567 - Marakhtanov; Alexei ; et al. | 2013-10-03 |
Methods And Apparatus For Selectively Modulating Azimuthal Non-uniformity In A Plasma Processing System
App 20130240147 - Nam; Sang Ki ; et al. | 2013-09-19 |
Methods And Apparatus For Selectively Modifying Rf Current Paths In A Plasma Processing System
App 20130240482 - Nam; Sang Ki ; et al. | 2013-09-19 |
Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
Grant 8,518,209 - Hudson , et al. August 27, 2 | 2013-08-27 |
Arrangements For Controlling Plasma Processing Parameters
App 20130206337 - Dhindsa; Rajinder ; et al. | 2013-08-15 |
Movable ground ring for a plasma processing chamber
Grant 8,485,128 - Kellogg , et al. July 16, 2 | 2013-07-16 |
Gas Feed Insert In A Plasma Processing Chamber And Methods Therefor
App 20130134138 - de la Llera; Anthony ; et al. | 2013-05-30 |
Movable Grounding Arrangements In A Plasma Processing Chamber And Methods Therefor
App 20130134876 - de la Llera; Anthony ; et al. | 2013-05-30 |
Method and apparatus for inducing DC voltage on wafer-facing electrode
Grant 8,450,635 - Dhindsa , et al. May 28, 2 | 2013-05-28 |
Multi Zone Gas Injection Upper Electrode System
App 20130126486 - Bise; Ryan ; et al. | 2013-05-23 |
Dual Zone Temperature Control Of Upper Electrodes
App 20130126476 - Marakhtanov; Alexei ; et al. | 2013-05-23 |
System, Method And Apparatus For Detecting Dc Bias In A Plasma Processing Chamber
App 20130127476 - Marakhtanov; Alexei ; et al. | 2013-05-23 |
Triode Reactor Design With Multiple Radiofrequency Powers
App 20130126475 - Dhindsa; Rajinder ; et al. | 2013-05-23 |
Peripheral Rf Feed And Symmetric Rf Return With Rf Strap Input
App 20130127124 - Nam; Sang Ki ; et al. | 2013-05-23 |
Systems And Methods For Controlling A Plasma Edge Region
App 20130126513 - Marakhtanov; Alexei ; et al. | 2013-05-23 |
System, Method And Apparatus For Plasma Sheath Voltage Control
App 20130122711 - Marakhtanov; Alexei ; et al. | 2013-05-16 |
Pulsed Plasma Chamber in Dual Chamber Configuration
App 20130059448 - Marakhtanov; Alexei ; et al. | 2013-03-07 |
Negative Ion Control for Dielectric Etch
App 20130023064 - Marakhtanov; Alexei ; et al. | 2013-01-24 |
Apparatus For Processing A Substrate Using Plasma
App 20120312475 - Dhindsa; Rajinder ; et al. | 2012-12-13 |
Plasma-enhanced Substrate Processing Method And Apparatus
App 20120312780 - Dhindsa; Rajinder ; et al. | 2012-12-13 |
Showerhead electrodes
Grant 8,268,117 - Bettencourt , et al. September 18, 2 | 2012-09-18 |
Plasma-enhanced substrate processing method and apparatus
Grant 8,262,847 - Dhindsa , et al. September 11, 2 | 2012-09-11 |
Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
Grant 8,222,157 - Marakhtanov , et al. July 17, 2 | 2012-07-17 |
Method and apparatus for processing a substrate using plasma
Grant 8,222,156 - Dhindsa , et al. July 17, 2 | 2012-07-17 |
Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-rings
Grant 8,216,418 - Patrick , et al. July 10, 2 | 2012-07-10 |
Methods and arrangements for controlling plasma processing parameters
Grant 8,211,324 - Dhindsa , et al. July 3, 2 | 2012-07-03 |
Showerhead Electrodes
App 20120160941 - Bettencourt; Greg ; et al. | 2012-06-28 |
Electrode assembly and plasma processing chamber utilizing thermally conductive gasket
Grant 8,187,413 - Patrick , et al. May 29, 2 | 2012-05-29 |
Showerhead electrode assemblies and plasma processing chambers incorporating the same
Grant 8,152,954 - Bettencourt , et al. April 10, 2 | 2012-04-10 |
Modulated multi-frequency processing method
Grant 8,154,209 - Marakhtanov , et al. April 10, 2 | 2012-04-10 |
Consumable Isolation Ring For Movable Substrate Support Assembly Of A Plasma Processing Chamber
App 20120000605 - Kellogg; Michael C. ; et al. | 2012-01-05 |
Movable Ground Ring For A Plasma Processing Chamber
App 20120003836 - Kellogg; Michael C. ; et al. | 2012-01-05 |
C-shaped Confinement Ring For A Plasma Processing Chamber
App 20120000608 - Kellogg; Michael C. ; et al. | 2012-01-05 |
Methods for measuring a set of electrical characteristics in a plasma
Grant 7,994,794 - Kimball , et al. August 9, 2 | 2011-08-09 |
Plasma Unconfinement Sensor And Methods Thereof
App 20110128017 - Booth; Jean-Paul ; et al. | 2011-06-02 |
Apparatus And Methods For Edge Ring Implementation For Substrate Processing
App 20110070743 - Dhindsa; Rajinder ; et al. | 2011-03-24 |
Hybrid Rf Capacitively And Inductively Coupled Plasma Source Using Multifrequency Rf Powers And Methods Of Use Thereof
App 20110059615 - Marakhtanov; Alexei ; et al. | 2011-03-10 |
Methods And Arrangements For Controlling Plasma Processing Parameters
App 20110011535 - Dhindsa; Rajinder ; et al. | 2011-01-20 |
Adjustable height PIF probe
Grant 7,867,355 - Kimball , et al. January 11, 2 | 2011-01-11 |
Methods and apparatus for igniting a low pressure plasma
Grant 7,851,368 - Hudson , et al. December 14, 2 | 2010-12-14 |
Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
Grant 7,837,826 - Marakhtanov , et al. November 23, 2 | 2010-11-23 |
Edge ring arrangements for substrate processing
Grant 7,837,827 - Dhindsa , et al. November 23, 2 | 2010-11-23 |
Modulated Multi-frequency Processing Method
App 20100253224 - Marakhtanov; Alexei ; et al. | 2010-10-07 |
Multifrequency Capacitively Coupled Plasma Etch Chamber
App 20100252199 - Marakhtanov; Alexei ; et al. | 2010-10-07 |
Grounded Confinement Ring Having Large Surface Area
App 20100252200 - Marakhtanov; Alexei ; et al. | 2010-10-07 |
Methods For Measuring A Set Of Electrical Characteristics In A Plasma
App 20100229372 - Kimball; Christopher ; et al. | 2010-09-16 |
Methods and apparatus for substrate processing
Grant 7,758,764 - Dhindsa , et al. July 20, 2 | 2010-07-20 |
Plasma processing chamber with an apparatus for measuring a set of electrical characteristics in a plasma
Grant 7,723,994 - Kimball , et al. May 25, 2 | 2010-05-25 |
Apparatus For Determining The Endpoint Of A Cleaning Or Conditioning Process In A Plasma Processing System
App 20090277584 - Hudson; Eric ; et al. | 2009-11-12 |
Electrode Assembly And Plasma Processing Chamber Utilizing Thermally Conductive Gasket
App 20090236040 - Patrick; Roger ; et al. | 2009-09-24 |
Methods And Arrangements For Plasma Processing System With Tunable Capacitance
App 20090223810 - Dhindsa; Rajinder ; et al. | 2009-09-10 |
Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
Grant 7,578,301 - Hudson , et al. August 25, 2 | 2009-08-25 |
Methods And Apparatus For A Hybrid Capacitively-coupled And An Inductively-coupled Plasma Processing System
App 20090149028 - Marakhtanov; Alexei ; et al. | 2009-06-11 |
Adjustable Height Pif Probe
App 20090133836 - KIMBALL; Christopher ; et al. | 2009-05-28 |
Showerhead Electrode Assemblies And Plasma Processing Chambers Incorporating The Same
App 20090095424 - Bettencourt; Greg ; et al. | 2009-04-16 |
Methods And Apparatus For Substrate Processing
App 20090071938 - Dhindsa; Rajinder ; et al. | 2009-03-19 |
Methods And Apparatus For Igniting A Low Pressure Plasma
App 20090065148 - Hudson; Eric ; et al. | 2009-03-12 |
Adjustable height PIF probe
Grant 7,479,207 - Kimball , et al. January 20, 2 | 2009-01-20 |
Edge Ring Arrangements For Substrate Processing
App 20090000744 - Dhindsa; Rajinder ; et al. | 2009-01-01 |
Electrode Assembly And Plasma Processing Chamber Utilizing Thermally Conductive Gasket And O-rings
App 20080308229 - Patrick; Roger ; et al. | 2008-12-18 |
Method And Apparatus For Inducing Dc Voltage On Wafer-facing Electrode
App 20080237187 - Dhindsa; Rajinder ; et al. | 2008-10-02 |
Method And Apparatus For Dc Voltage Control On Rf-powered Electrode
App 20080241420 - Dhindsa; Rajinder ; et al. | 2008-10-02 |
Plasma-enhanced Substrate Processing Method And Apparatus
App 20080160776 - Dhindsa; Rajinder ; et al. | 2008-07-03 |
Method And Apparatus For Processing A Substrate Using Plasma
App 20080160775 - Dhindsa; Rajindra ; et al. | 2008-07-03 |
Plasma processing chamber with an apparatus for measuring set of electrical characteristics in a plasma
App 20080066861 - Kimball; Christopher ; et al. | 2008-03-20 |
Methods and apparatus for igniting a low pressure plasma
App 20080038925 - Hudson; Eric ; et al. | 2008-02-14 |
Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
App 20080020574 - Marakhtanov; Alexei ; et al. | 2008-01-24 |
Apparatus for measuring a set of electrical characteristics in a plasma
Grant 7,319,316 - Kimball , et al. January 15, 2 | 2008-01-15 |
Adjustable height PIF probe
App 20070215285 - Kimball; Christopher ; et al. | 2007-09-20 |
Integrated capacitive and inductive power sources for a plasma etching chamber
App 20070199658 - Dhindsa; Rajinder ; et al. | 2007-08-30 |
Apparatus for measuring a set of electrical characteristics in a plasma
App 20070000843 - Kimball; Christopher ; et al. | 2007-01-04 |
Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
App 20060216406 - Hudson; Eric ; et al. | 2006-09-28 |
| 