| Patent | Date |
|---|
Unifying realtime and static data for presenting over a web service
Grant 10,516,767 - Singhee , et al. Dec | 2019-12-24 |
Method of simultaneous lithography and etch correction flow
Grant 9,910,348 - Han , et al. March 6, 2 | 2018-03-06 |
Unifying Realtime And Static Data For Presenting Over A Web Service
App 20170302764 - Singhee; Amith ; et al. | 2017-10-19 |
Method Of Simultaneous Lithography And Etch Correction Flow
App 20170004233 - Han; Geng ; et al. | 2017-01-05 |
Predicting process fail limits
Grant 9,471,743 - Han , et al. October 18, 2 | 2016-10-18 |
Predicting Process Fail Limits
App 20160292342 - Han; Geng ; et al. | 2016-10-06 |
Patterning assist feature to mitigate reactive ion etch microloading effect
Grant 9,252,022 - Dechene , et al. February 2, 2 | 2016-02-02 |
Pattern improvement in multiprocess patterning
Grant 9,087,739 - Dunn , et al. July 21, 2 | 2015-07-21 |
Decomposition with multiple exposures in a process window based OPC flow using tolerance bands
Grant 8,392,871 - Mansfield , et al. March 5, 2 | 2013-03-05 |
Generating cut mask for double-patterning process
Grant 8,365,108 - Baum , et al. January 29, 2 | 2013-01-29 |
Generating Cut Mask For Double-patterning Process
App 20120180006 - Baum; Zachary ; et al. | 2012-07-12 |
Multilayer OPC for design aware manufacturing
Grant 8,214,770 - Mukherjee , et al. July 3, 2 | 2012-07-03 |
Calibration of lithographic process models
Grant 8,174,681 - Graur , et al. May 8, 2 | 2012-05-08 |
Photomask design verification
Grant 8,166,423 - Mansfield , et al. April 24, 2 | 2012-04-24 |
Fast and accurate method to simulate intermediate range flare effects
Grant 8,161,422 - Mukherjee , et al. April 17, 2 | 2012-04-17 |
Short path customized mask correction
Grant 8,108,804 - Graur , et al. January 31, 2 | 2012-01-31 |
Decomposition With Multiple Exposures In A Process Window Based Opc Flow Using Tolerance Bands
App 20110271238 - Mansfield; Scott M. ; et al. | 2011-11-03 |
Integrated circuits and methods of design and manufacture thereof
Grant 8,039,203 - Wang , et al. October 18, 2 | 2011-10-18 |
Mask and method for patterning a semiconductor wafer
Grant 7,945,869 - Haffner , et al. May 17, 2 | 2011-05-17 |
Pattern Improvement in Multiprocess Patterning
App 20110091815 - Dunn; Derren N. ; et al. | 2011-04-21 |
Photomask Design Verification
App 20110061030 - Mansfield; Scott M. ; et al. | 2011-03-10 |
Test pattern based process model calibration
Grant 7,895,547 - Mansfield , et al. February 22, 2 | 2011-02-22 |
Method to check model accuracy during wafer patterning simulation
Grant 7,765,021 - Mansfield , et al. July 27, 2 | 2010-07-27 |
Short Path Customized Mask Correction
App 20100185999 - Graur; Ioana ; et al. | 2010-07-22 |
Fast And Accurate Method To Simulate Intermediate Range Flare Effects
App 20100175043 - Mukherjee; Maharaj ; et al. | 2010-07-08 |
Calibration Of Lithographic Process Models
App 20100171031 - Graur; Ioana ; et al. | 2010-07-08 |
Local coloring for hierarchical OPC
Grant 7,650,587 - Baum , et al. January 19, 2 | 2010-01-19 |
Method for separating optical and resist effects in process models
Grant 7,642,020 - Han , et al. January 5, 2 | 2010-01-05 |
Test Pattern Based Process Model Calibration
App 20090276736 - Mansfield; Scott M. ; et al. | 2009-11-05 |
Designer's intent tolerance bands for proximity correction and checking
Grant 7,607,114 - Mansfield , et al. October 20, 2 | 2009-10-20 |
Verifying mask layout printability using simulation with adjustable accuracy
Grant 7,565,633 - Mukherjee , et al. July 21, 2 | 2009-07-21 |
Method To Check Model Accuracy During Wafer Patterning Simulation
App 20090182448 - Mansfield; Scott M. ; et al. | 2009-07-16 |
Multilayer Opc For Design Aware Manufacturing
App 20090125868 - Mukherjee; Maharaj ; et al. | 2009-05-14 |
Integrated Circuits and Methods of Design and Manufacture Thereof
App 20090081563 - Wang; Helen ; et al. | 2009-03-26 |
Multilayer OPC for design aware manufacturing
Grant 7,503,028 - Mukherjee , et al. March 10, 2 | 2009-03-10 |
Mask and Method for Patterning a Semiconductor Wafer
App 20090053654 - Haffner; Henning ; et al. | 2009-02-26 |
Verifying Mask Layout Printability Using Simulation With Adjustable Accuracy
App 20080163153 - Mukherjee; Maharaj ; et al. | 2008-07-03 |
Local Coloring For Hierarchical Opc
App 20080134130 - Baum; Zachary ; et al. | 2008-06-05 |
Closed-loop Design For Manufacturability Process
App 20080127029 - Graur; Ioana ; et al. | 2008-05-29 |
Method for improving optical proximity correction
Grant 7,350,183 - Cui , et al. March 25, 2 | 2008-03-25 |
Optical proximity correction using progressively smoothed mask shapes
Grant 7,343,582 - Mukherjee , et al. March 11, 2 | 2008-03-11 |
Method For Separating Optical And Resist Effects In Process Models
App 20080044748 - Han; Geng ; et al. | 2008-02-21 |
Designer's Intent Tolerance Bands For Proximity Correction And Checking
App 20070261013 - Mansfield; Scott M. ; et al. | 2007-11-08 |
Multilayer OPC for Design Aware Manufacturing
App 20070220476 - Mukherjee; Maharaj ; et al. | 2007-09-20 |
Designer's intent tolerance bands for proximity correction and checking
Grant 7,266,798 - Mansfield , et al. September 4, 2 | 2007-09-04 |
System and method of smoothing mask shapes for improved placement of sub-resolution assist features
Grant 7,261,981 - Lavin , et al. August 28, 2 | 2007-08-28 |
Designer's Intent Tolerance Bands For Proximity Correction And Checking
App 20070083847 - Mansfield; Scott M. ; et al. | 2007-04-12 |
Optical proximity correction using progressively smoothed mask shapes
App 20060271905 - Mukherjee; Maharaj ; et al. | 2006-11-30 |
Method For Improving Optical Proximity Correction
App 20060101370 - Cui; Yuping ; et al. | 2006-05-11 |
Optimized Placement Of Sub-resolution Assist Features Within Two-dimensional Environments
App 20050202326 - Gordon, Ronald L. ; et al. | 2005-09-15 |
System And Method Of Smoothing Mask Shapes For Improved Placement Of Sub-resolution Assist Features
App 20050153212 - Lavin, Mark A. ; et al. | 2005-07-14 |
Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures
Grant 6,541,166 - Mansfield , et al. April 1, 2 | 2003-04-01 |
Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures
App 20020094482 - Mansfield, Scott M. ; et al. | 2002-07-18 |
Semiconductor device fabrication using a photomask with assist features
Grant 6,421,820 - Mansfield , et al. July 16, 2 | 2002-07-16 |
Method for incorporating sub resolution assist features in a photomask layout
Grant 6,413,683 - Liebmann , et al. July 2, 2 | 2002-07-02 |
Process and apparatus to adjust exposure dose in lithography systems
Grant 6,346,979 - Ausschnitt , et al. February 12, 2 | 2002-02-12 |
Exact transmission balanced alternating phase-shifting mask for photolithography
Grant 5,932,377 - Ferguson , et al. August 3, 1 | 1999-08-03 |
Optical recording system employing a solid immersion lens
Grant 5,125,750 - Corle , et al. June 30, 1 | 1992-06-30 |
Lithography system employing a solid immersion lens
Grant 5,121,256 - Corle , et al. June 9, 1 | 1992-06-09 |
Near field and solid immersion optical microscope
Grant 5,004,307 - Kino , et al. April 2, 1 | 1991-04-02 |
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