Mani; Radhika C.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Mani; Radhika C..The latest application filed is for "polysilicon over-etch using hydrogen diluted plasma for three-dimensional gate etch".
- Mani; Radhika C. - San Jose CA
- Mani, Radhika C. - Louisville KY
| Patent | Date |
|---|---|
| Methods for in-situ chamber clean utilized in an etching processing chamber Grant 9,533,332 - Sun , et al. January 3, 2 | 2017-01-03 |
| Polysilicon over-etch using hydrogen diluted plasma for three-dimensional gate etch Grant 9,305,797 - Mani , et al. April 5, 2 | 2016-04-05 |
| Polysilicon Over-etch Using Hydrogen Diluted Plasma For Three-dimensional Gate Etch App 20140199849 - Mani; Radhika C. ; et al. | 2014-07-17 |
| Methods For In-situ Chamber Clean Utilized In An Etching Processing Chamber App 20130087174 - Sun; Noel ; et al. | 2013-04-11 |
| Carbon nanopipettes methods of making and applications App 20050260119 - Sunkara, Mahendra Kumar ; et al. | 2005-11-24 |
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