Patent | Date |
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Euv Patterning Using Photomask Substrate Topography App 20190056651 - Verduijn; Erik ;   et al. | 2019-02-21 |
Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masks Grant 8,911,920 - Raghunathan , et al. December 16, 2 | 2014-12-16 |
Methods For Fabricating Euv Masks And Methods For Fabricating Integrated Circuits Using Such Euv Masks App 20140272677 - Raghunathan; Sudharshanan ;   et al. | 2014-09-18 |
EUV mask defect reconstruction and compensation repair Grant 8,739,098 - Clifford , et al. May 27, 2 | 2014-05-27 |
Task management in a workforce environment using an acoustic map constructed from aggregated audio Grant 8,706,540 - Mangat , et al. April 22, 2 | 2014-04-22 |
Extreme ultraviolet masks having annealed light-absorptive borders and associated fabrication methods Grant 8,592,103 - Mangat , et al. November 26, 2 | 2013-11-26 |
Extreme Ultraviolet Masks Having Annealed Light-absorptive Borders And Associated Fabrication Methods App 20130029253 - Mangat; Pawitter ;   et al. | 2013-01-31 |
Task Management In A Workforce Environment Using An Acoustic Map Constructed From Aggregated Audio App 20120150578 - Mangat; Pawitter ;   et al. | 2012-06-14 |
Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC Grant 7,378,197 - Wasson , et al. May 27, 2 | 2008-05-27 |
Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC Grant 7,026,076 - Wasson , et al. April 11, 2 | 2006-04-11 |
Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC App 20060057476 - Wasson; James R. ;   et al. | 2006-03-16 |
Attenuated phase shift mask for extreme ultraviolet lithography and method therefore Grant 6,986,974 - Han , et al. January 17, 2 | 2006-01-17 |
Method of patterning photoresist on a wafer using a transmission mask with a carbon layer Grant 6,939,650 - Wasson , et al. September 6, 2 | 2005-09-06 |
Attenuated phase shift mask for extreme ultraviolet lithography and method therefore App 20050084768 - Han, Sang-In ;   et al. | 2005-04-21 |
Method of patterning photoresist on a wafer using an attenuated phase shift mask Grant 6,875,546 - Wasson , et al. April 5, 2 | 2005-04-05 |
Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC App 20040175630 - Wasson, James R. ;   et al. | 2004-09-09 |
Method of patterning photoresist on a wafer using an attenuated phase shift mask App 20040175629 - Wasson, James R. ;   et al. | 2004-09-09 |
Method of patterning photoresist on a wafer using a transmission mask with a carbon layer App 20040142249 - Wasson, James R. ;   et al. | 2004-07-22 |
Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same Grant 6,749,968 - Mangat , et al. June 15, 2 | 2004-06-15 |
Method of making an integrated circuit using a reflective mask Grant 6,673,520 - Han , et al. January 6, 2 | 2004-01-06 |
Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask Grant 6,653,053 - Mangat , et al. November 25, 2 | 2003-11-25 |
Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask App 20030039923 - Mangat, Pawitter ;   et al. | 2003-02-27 |
Method of making an integrated circuit using a reflective mask App 20030039922 - Han, Sang-In ;   et al. | 2003-02-27 |
Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same App 20030031936 - Mangat, Pawitter ;   et al. | 2003-02-13 |
Membrane mask stress measurement apparatus and method therefor Grant 6,477,898 - Han , et al. November 12, 2 | 2002-11-12 |