Mandal; Robert P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mandal; Robert P..The latest application filed is for "very low dielectric constant plasma-enhanced cvd films".

Company Profile

0.34.25

Mandal; Robert P. - Saratoga CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Very low dielectric constant plasma-enhanced CVD films Grant 7,825,042 - Mandal November 2, 2	2010-11-02
Very Low Dielectric Constant Plasma-Enhanced CVD Films App 20100081291 - Mandal; Robert P.	2010-04-01
Very low dielectric constant plasma-enhanced CVD films Grant 7,633,163 - Mandal December 15, 2	2009-12-15
Very low dielectric constant plasma-enhanced CVD films Grant 7,601,631 - Mandal October 13, 2	2009-10-13
Plasma processes for depositing low dielectric constant films Grant 7,560,377 - Cheung , et al. July 14, 2	2009-07-14
Very low dielectric constant plasma-enhanced CVD films Grant 7,399,697 - Mandal July 15, 2	2008-07-15
Ionic additives for extreme low dielectric constant chemical formulations Grant 7,265,062 - Mandal , et al. September 4, 2	2007-09-04
Very low dielectric constant plasma-enhanced CVD films Grant 7,205,224 - Mandal April 17, 2	2007-04-17
Very Low Dielectric Constant Plasma-enhanced Cvd Films App 20060240652 - Mandal; Robert P.	2006-10-26
Very Low Dielectric Constant Plasma-enhanced Cvd Films App 20060226548 - Mandal; Robert P.	2006-10-12
Very low dielectric constant plasma-enhanced CVD films Grant 7,094,710 - Mandal August 22, 2	2006-08-22
Method of uniformly coating a substrate Grant 7,030,039 - Gurer , et al. April 18, 2	2006-04-18
Method of uniformly coating a substrate Grant 7,018,943 - Emir , et al. March 28, 2	2006-03-28
Very low dielectric constant plasma-enhanced CVD films Grant 7,012,030 - Mandal March 14, 2	2006-03-14
Method of uniformly coating a substrate Grant 6,977,098 - Gurer , et al. December 20, 2	2005-12-20
Plasma processes for depositing low dielectric constant films App 20050191846 - Cheung, David ; et al.	2005-09-01
Plasma processes for depositing low dielectric constant films Grant 6,930,061 - Cheung , et al. August 16, 2	2005-08-16
Very low dielectric constant plasma-enhanced CVD films App 20050153574 - Mandal, Robert P.	2005-07-14
Very low dielectric constant plasma-enhanced CVD films App 20050136240 - Mandal, Robert P.	2005-06-23
Ionic additives for extreme low dielectric constant chemical formulations Grant 6,896,955 - Mandal , et al. May 24, 2	2005-05-24
Very low dielectric constant plasma-enhanced CVD films Grant 6,890,639 - Mandal May 10, 2	2005-05-10
Integrally formed bake plate unit for use in wafer fabrication system Grant 6,891,134 - Mandal May 10, 2	2005-05-10
Plasma processes for depositing low dielectric constant films Grant 6,869,896 - Cheung , et al. March 22, 2	2005-03-22
Very low dielectric constant plasma-enhanced CVD films App 20040235291 - Mandal, Robert P.	2004-11-25
Integrally formed bake plate unit for use in wafer fabrication system App 20040155026 - Mandal, Robert P.	2004-08-12
Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment App 20040157430 - Mandal, Robert P.	2004-08-12
Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms Grant 6,770,424 - Mandal , et al. August 3, 2	2004-08-03
Wafer Track Apparatus And Methods For Dispensing Fluids With Rotatable Dispense Arms App 20040115567 - Mandal, Robert P. ; et al.	2004-06-17
Plasma processes for depositing low dielectric constant films Grant 6,734,115 - Cheung , et al. May 11, 2	2004-05-11
Ionic additives for extreme low dielectric constant chemical formulations App 20040087184 - Mandal, Robert P. ; et al.	2004-05-06
Plasma processes for depositing low dielectric constant films App 20040082199 - Cheung, David ; et al.	2004-04-29
Plasma processes for depositing low dielectric constant films App 20040038545 - Cheung, David ; et al.	2004-02-26
Plasma processes for depositing low dielectric constant films Grant 6,660,656 - Cheung , et al. December 9, 2	2003-12-09
Very low dielectric constant plasma-enhanced CVD films App 20030211728 - Mandal, Robert P.	2003-11-13
Very low dielectric constant plasma-enhanced CVD films Grant 6,596,627 - Mandal July 22, 2	2003-07-22
Plasma processes for depositing low dielectric constant films Grant 6,596,655 - Cheung , et al. July 22, 2	2003-07-22
Plasma processes for depositing low dielectric constant films Grant 6,562,690 - Cheung , et al. May 13, 2	2003-05-13
Mesoporous silica films with mobile ion gettering and accelerated processing Grant 6,559,070 - Mandal May 6, 2	2003-05-06
Plasma processes for depositing low dielectric constant films App 20030064610 - Cheung, David ; et al.	2003-04-03
Very low dielectric constant plasma-enhanced CVD films Grant 6,541,367 - Mandal April 1, 2	2003-04-01
Plasma processes for depositing low dielectric constant films Grant 6,541,282 - Cheung , et al. April 1, 2	2003-04-01
Ionic additives for extreme low dielectric constant chemical formulations App 20030008525 - Mandal, Robert P. ; et al.	2003-01-09
Very low dielectric constant plasma-enhanced CVD films App 20020197849 - Mandal, Robert P.	2002-12-26
Very low dielectric constant plasma-enhanced CVD films App 20020142585 - Mandal, Robert P.	2002-10-03
Method of uniformly coating a substrate App 20020127334 - Gurer, Emir ; et al.	2002-09-12
Method of uniformly coating a substrate App 20020098283 - Gurer, Emir ; et al.	2002-07-25
Plasma processes for depositing low dielectric constant films App 20020045361 - Cheung, David ; et al.	2002-04-18
Ionic additives for extreme low dielectric constant chemical formulations App 20020042210 - Mandal, Robert P. ; et al.	2002-04-11
Plasma processes for depositing low dielectric constant films Grant 6,348,725 - Cheung , et al. February 19, 2	2002-02-19
Method of uniformly coating a substrate App 20020004100 - Gurer, Emir ; et al.	2002-01-10
Plasma processes for depositing low dielectric constant films Grant 6,303,523 - Cheung , et al. October 16, 2	2001-10-16
Plasma Processes For Depositing Low Dielectric Constant Films App 20010005546 - CHEUNG, DAVID ; et al.	2001-06-28
Plasma Processes For Depositing Low Dielectric Constant Films App 20010004479 - CHEUNG, DAVID ; et al.	2001-06-21
Method of uniformly coating a substrate Grant 6,238,735 - Mandal , et al. May 29, 2	2001-05-29
CVD nanoporous silica low dielectric constant films Grant 6,171,945 - Mandal , et al. January 9, 2	2001-01-09
Dispense nozzle design and dispense method Grant 6,013,315 - Mandal January 11, 2	2000-01-11
Apparatus for uniformly coating a substrate Grant 5,954,878 - Mandal , et al. September 21, 1	1999-09-21
Method of uniformly coating a substrate Grant 5,670,210 - Mandal , et al. September 23, 1	1997-09-23
Process for electrically interconnecting chips with substrates employing gold alloy bumps and magnetic materials therein Grant 3,986,255 - Mandal October 19, 1	1976-10-19