loadpatents
name:-0.051859140396118
name:-0.034165143966675
name:-0.025680065155029
Malik; Sanjay Patent Filings

Malik; Sanjay

Patent Applications and Registrations

Patent applications and USPTO patent grants for Malik; Sanjay.The latest application filed is for "dielectric film-forming composition".

Company Profile
18.24.39
  • Malik; Sanjay - Attleboro MA
  • Malik; Sanjay - Maharashtra IN
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dielectric Film-Forming Composition
App 20220127459 - De; Binod B. ;   et al.
2022-04-28
Dielectric Film Forming Compositions
App 20220017673 - Malik; Sanjay ;   et al.
2022-01-20
Dielectric Film-Forming Composition
App 20220002463 - De; Binod B. ;   et al.
2022-01-06
Polyimides
App 20210355279 - De; Binod B. ;   et al.
2021-11-18
Photosensitive stacked structure
Grant 11,175,582 - Malik , et al. November 16, 2
2021-11-16
Metal Deposition Processes
App 20210287939 - Malik; Sanjay
2021-09-16
Polyimides
Grant 11,061,327 - Reinerth , et al. July 13, 2
2021-07-13
Planarizing Process and Composition
App 20210104398 - Connell; Micheala ;   et al.
2021-04-08
Dielectric film forming composition
Grant 10,875,965 - Malik , et al. December 29, 2
2020-12-29
Polyimides
Grant 10,793,676 - Malik , et al. October 6, 2
2020-10-06
Polyimide compositions
Grant 10,781,341 - Malik , et al. Sept
2020-09-22
Polyimides
App 20200262978 - De; Binod B. ;   et al.
2020-08-20
Photosensitive Polyimide Compositions
App 20200218152 - De; Binod B. ;   et al.
2020-07-09
Cleaning composition
Grant 10,696,932 - Sakamuri , et al. June 30, 2
2020-06-30
Polymer and thermosetting composition containing same
Grant 10,604,628 - Malik , et al.
2020-03-31
Dielectric film forming composition
Grant 10,563,014 - Malik , et al. Feb
2020-02-18
Polyimides
App 20190263969 - Malik; Sanjay ;   et al.
2019-08-29
Stripping process
Grant 10,345,707 - Sakamuri , et al. July 9, 2
2019-07-09
Photosensitive Polyimide Compositions
App 20190171105 - Malik; Sanjay ;   et al.
2019-06-06
Polyimides
App 20190129303 - Reinerth; William A. ;   et al.
2019-05-02
Dielectric Film Forming Composition
App 20190077913 - Malik; Sanjay ;   et al.
2019-03-14
Dielectric Film Forming Composition
App 20190081001 - Malik; Sanjay ;   et al.
2019-03-14
Photosensitive Stacked Structure
App 20190018321 - Malik; Sanjay ;   et al.
2019-01-17
Cleaning Composition
App 20190016999 - Sakamuri; Raj ;   et al.
2019-01-17
Multilayer Structure
App 20180366419 - Malik; Sanjay ;   et al.
2018-12-20
Photosensitive polyimide compositions
Grant 10,036,952 - Malik , et al. July 31, 2
2018-07-31
Stripping Process
App 20180136563 - Sakamuri; Raj ;   et al.
2018-05-17
Process for the production of polyimide and polyamic ester polymers
Grant 9,777,117 - Reinerth , et al. October 3, 2
2017-10-03
Novel Polymer and Thermosetting Composition Containing Same
App 20170260330 - Malik; Sanjay ;   et al.
2017-09-14
Dry Film Structure
App 20170255100 - Malik; Sanjay ;   et al.
2017-09-07
Polymer and thermosetting composition containing same
Grant 9,695,284 - Malik , et al. July 4, 2
2017-07-04
Process For The Production Of Polyimide And Polyamic Ester Polymers
App 20170174837 - Reinerth; William A. ;   et al.
2017-06-22
Process for the production of polyimide and polyamic ester polymers
Grant 9,617,386 - Reinerth , et al. April 11, 2
2017-04-11
Photosensitive Polyimide Compositions
App 20160313641 - De; Binod B. ;   et al.
2016-10-27
Photosensitive Polyimide Compositions
App 20160313642 - Malik; Sanjay ;   et al.
2016-10-27
Novel Polyimide Compositions
App 20150219990 - Malik; Sanjay ;   et al.
2015-08-06
Process For The Production Of Polyimide And Polyamic Ester Polymers
App 20140343223 - Reinerth; William A. ;   et al.
2014-11-20
Novel Polymer and Thermosetting Composition Containing Same
App 20140343199 - Malik; Sanjay ;   et al.
2014-11-20
High etch resistant underlayer compositions for multilayer lithographic processes
Grant 7,727,705 - De , et al. June 1, 2
2010-06-01
Process for highly purified polyhedral oligomeric silsesquioxane monomers
Grant 7,491,783 - Schwab , et al. February 17, 2
2009-02-17
High Etch Resistant Underlayer Compositions For Multilayer Lithographic Processes
App 20080206667 - De; Binod B. ;   et al.
2008-08-28
Thermally cured undercoat for lithographic application
Grant 7,416,821 - De , et al. August 26, 2
2008-08-26
Device manufacturing process utilizing a double patterning process
App 20080199814 - Brzozowy; Dave ;   et al.
2008-08-21
Photosensitive Compositions Employing Silicon-containing Additives
App 20080199805 - RUSHKIN; IL'YA ;   et al.
2008-08-21
Process for highly purified polyhedral oligomeric silsesquioxane monomers
App 20070065750 - Schwab; Joseph J. ;   et al.
2007-03-22
Thermally cured undercoat for lithographic application
App 20050238997 - De, Binod B. ;   et al.
2005-10-27
Thermally cured underlayer for lithographic application
Grant 6,924,339 - De , et al. August 2, 2
2005-08-02
Copolymer, photoresist compositions thereof and deep UV bilayer system thereof
Grant 6,916,543 - De , et al. July 12, 2
2005-07-12
Acetal protected polymers and photoresists compositions thereof
Grant 6,830,870 - Malik , et al. December 14, 2
2004-12-14
Process for producing anhydride-containing polymers for radiation sensitive compositions
Grant 6,803,434 - Dilocker , et al. October 12, 2
2004-10-12
Silicon-containing acetal protected polymers and photoresists compositions thereof
Grant 6,783,917 - Blakeney , et al. August 31, 2
2004-08-31
Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof
App 20040137362 - De, Binod B. ;   et al.
2004-07-15
Acetal protected polymers and photoresists compositions thereof
App 20040034160 - Malik, Sanjay ;   et al.
2004-02-19
Novel process for producing anhydride-containing polymers for radiation sensitive compositions
App 20030225233 - Dilocker, Stephanie ;   et al.
2003-12-04
Thermally cured underlayer for lithographic application
App 20030204035 - De, Binod B. ;   et al.
2003-10-30
Thermally cured underlayer for lithographic application
Grant 6,610,808 - De , et al. August 26, 2
2003-08-26
Free-acid containing polymers and their use in photoresists
App 20030064321 - Malik, Sanjay ;   et al.
2003-04-03
Silicon-containing acetal protected polymers and photoresists compositions thereof
App 20030065101 - Blakeney, Andrew J. ;   et al.
2003-04-03
Tertiary-butyl acrylate polymers and their use in photoresist compositions
App 20030022097 - Malik, Sanjay ;   et al.
2003-01-30
Thermally cured underlayer for lithographic application
App 20020173594 - De, Binod B. ;   et al.
2002-11-21
Wet etch compatible deep UV photoresist compositions
App 20020164548 - Malik, Sanjay ;   et al.
2002-11-07
Process for preparing a radiation-sensitive composition
Grant 6,027,853 - Malik , et al. February 22, 2
2000-02-22
Process for the preparation of a new polymer useful for drag reduction in hydrocarbon fluids in exceptionally dilute polymer solutions
Grant 5,080,121 - Malik , et al. January 14, 1
1992-01-14

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