Male; Mathias
Patent Applications and Registrations
Patent applications and USPTO patent grants for Male; Mathias.The latest application filed is for "substrate processing chamber and process gas flow deflector for use in the processing chamber".
- Male; Mathias - Lienz AT
| Patent | Date |
|---|---|
| Substrate Processing Chamber And Process Gas Flow Deflector For Use In The Processing Chamber App 20220018023 - Kuenle; Matthias ; et al. | 2022-01-20 |
| Wafer releasing Grant 10,186,445 - Male , et al. Ja | 2019-01-22 |
| Wafer Releasing App 20160322250 - Male; Mathias ; et al. | 2016-11-03 |
| Wafer releasing Grant 9,410,249 - Male , et al. August 9, 2 | 2016-08-09 |
| Wafer Releasing App 20150332951 - Male; Mathias ; et al. | 2015-11-19 |
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