MAHOROWALA; Arpan Pravin

Patent Applications and Registrations

Patent applications and USPTO patent grants for MAHOROWALA; Arpan Pravin.The latest application filed is for "extreme ultraviolet (euv) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generation".

Company Profile

2.7.10

MAHOROWALA; Arpan Pravin - West Linn OR
Mahorowala; Arpan Pravin - Bronxville NY
Mahorowala; Arpan Pravin - White Plains NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Extreme Ultraviolet (euv) Lithography Using An Intervening Layer Or A Multi-layer Stack With Varying Mean Free Paths For Secondary Electron Generation App 20220197147 - LIANG; Andrew ; et al.	2022-06-23
Tin Oxide Thin Film Spacers In Semiconductor Device Manufacturing App 20220005694 - Smith; David Charles ; et al.	2022-01-06
Selective Deposition Of Etch-stop Layer For Enhanced Patterning App 20210358753 - Shankar; Nagraj ; et al.	2021-11-18
Selective deposition of etch-stop layer for enhanced patterning Grant 11,094,542 - Shankar , et al. August 17, 2	2021-08-17
Tin Oxide Thin Film Spacers In Semiconductor Device Manufacturing App 20210242019 - Smith; David Charles ; et al.	2021-08-05
Selective Deposition Of Etch-stop Layer For Enhanced Patterning App 20200168466 - Shankar; Nagraj ; et al.	2020-05-28
Selective deposition of etch-stop layer for enhanced patterning Grant 10,566,194 - Shankar , et al. Feb	2020-02-18
Selective Deposition Of Etch-stop Layer For Enhanced Patterning App 20190341256 - Shankar; Nagraj ; et al.	2019-11-07
Attenuated embedded phase shift photomask blanks Grant 6,979,518 - Angelopoulos , et al. December 27, 2	2005-12-27
Attenuated embedded phase shift photomask blanks App 20040170907 - Angelopoulos, Marie ; et al.	2004-09-02
Attenuated embedded phase shift photomask blanks Grant 6,730,445 - Angelopoulos , et al. May 4, 2	2004-05-04
Attenuated embedded phase shift photomask blanks Grant 6,682,860 - Angelopoulos , et al. January 27, 2	2004-01-27
Attenuated embedded phase shift photomask blanks App 20030194569 - Angelopoulos, Marie ; et al.	2003-10-16
Attenuated embedded phase shift photomask blanks App 20030194568 - Angelopoulos, Marie ; et al.	2003-10-16
Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof Grant 6,514,667 - Angelopoulos , et al. February 4, 2	2003-02-04
Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof App 20020012876 - Angelopoulos, Marie ; et al.	2002-01-31
Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof Grant 6,316,167 - Angelopoulos , et al. November 13, 2	2001-11-13

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