| Patent | Date |
|---|
Methods and structures for protecting one area while processing another area on a chip
Grant 9,059,000 - Kim , et al. June 16, 2 | 2015-06-16 |
Process of making a lithographic structure using antireflective materials
Grant 8,609,322 - Angelopoulos , et al. December 17, 2 | 2013-12-17 |
Process Of Making A Lithographic Structure Using Antireflective Materials
App 20130017486 - Angelopoulos; Marie ; et al. | 2013-01-17 |
Process of making a lithographic structure using antireflective materials
Grant 8,293,454 - Angelopoulos , et al. October 23, 2 | 2012-10-23 |
Process of making a semiconductor device using multiple antireflective materials
Grant 7,968,270 - Angelopoulos , et al. June 28, 2 | 2011-06-28 |
Antireflective hardmask and uses thereof
Grant 7,648,820 - Babich , et al. January 19, 2 | 2010-01-19 |
Techniques for patterning features in semiconductor devices
Grant 7,545,041 - Allen , et al. June 9, 2 | 2009-06-09 |
Process Of Making A Lithographic Structure Using Antireflective Materials
App 20090061355 - Angelopoulos; Marie ; et al. | 2009-03-05 |
Methods and structures for protecting one area while processing another area on a chip
Grant 7,497,959 - Kim , et al. March 3, 2 | 2009-03-03 |
Process of making a semiconductor device using multiple antireflective materials
Grant 7,485,573 - Angelopoulos , et al. February 3, 2 | 2009-02-03 |
Process Of Making A Semiconductor Device Using Multiple Antireflective Materials
App 20080311508 - Angelopoulos; Marie ; et al. | 2008-12-18 |
Methods and structures for protecting one area while processing another area on a chip
App 20080261128 - Kim; Deok-kee ; et al. | 2008-10-23 |
Techniques for Patterning Features in Semiconductor Devices
App 20080187731 - Allen; Scott D. ; et al. | 2008-08-07 |
Method and apparatus for multilayer photoresist dry development
App 20080128388 - BALASUBRAMANIAM; Vaidyanathan ; et al. | 2008-06-05 |
Antireflective composition and process of making a lithographic structure
Grant 7,326,442 - Babich , et al. February 5, 2 | 2008-02-05 |
Process of making a semiconductor device using multiple antireflective materials
App 20070196748 - Angelopoulos; Marie ; et al. | 2007-08-23 |
Lithographic antireflective hardmask compositions and uses thereof
Grant 7,223,517 - Babich , et al. May 29, 2 | 2007-05-29 |
Antireflective Hardmask and Uses Thereof
App 20070105363 - Babich; Katherina E. ; et al. | 2007-05-10 |
Water and aqueous base soluble antireflective coating/hardmask materials
Grant 7,175,966 - Babich , et al. February 13, 2 | 2007-02-13 |
Antireflective hardmask and uses thereof
Grant 7,172,849 - Babich , et al. February 6, 2 | 2007-02-06 |
Method and system for etching a film stack
Grant 7,172,969 - Xia , et al. February 6, 2 | 2007-02-06 |
Antireflective composition and process of making a lithographic structure
App 20070015083 - Babich; Katherina E. ; et al. | 2007-01-18 |
Process of making a lithographic structure using antireflective materials
App 20070015082 - Angelopoulos; Marie ; et al. | 2007-01-18 |
Etch selectivity enhancement for tunable etch resistant anti-reflective layer
Grant 7,077,903 - Babich , et al. July 18, 2 | 2006-07-18 |
Method For Reducing Feature Line Edge Roughness
App 20060154184 - Mahorowala; Arpan P. ; et al. | 2006-07-13 |
Techniques for patterning features in semiconductor devices
App 20060118785 - Allen; Scott D. ; et al. | 2006-06-08 |
Techniques for patterning features in semiconductor devices
Grant 7,030,008 - Allen , et al. April 18, 2 | 2006-04-18 |
Method and system for etching a film stack
App 20060051964 - Xia; Annie ; et al. | 2006-03-09 |
Method and system for etching a gate stack
App 20060049139 - Xia; Annie ; et al. | 2006-03-09 |
Methods And Structures For Protecting One Area While Processing Another Area On A Chip
App 20050255386 - Kim, Deok-kee ; et al. | 2005-11-17 |
Method and apparatus for etching an organic layer
App 20050136666 - Balasubramaniam, Vaidyanathan ; et al. | 2005-06-23 |
In-situ plasma etch for TERA hard mask materials
Grant 6,903,023 - Wise , et al. June 7, 2 | 2005-06-07 |
Etch selectivity enhancement for tunable etch resistant anti-reflective layer
App 20050098091 - Babich, Katherina E. ; et al. | 2005-05-12 |
Water and aqueous base soluble antireflective coating/hardmask materials
App 20050064322 - Babich, Katherina E. ; et al. | 2005-03-24 |
Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials
Grant 6,869,542 - Desphande , et al. March 22, 2 | 2005-03-22 |
Lateral-only photoresist trimming for sub-80 nm gate stack
Grant 6,869,899 - Mahorowala , et al. March 22, 2 | 2005-03-22 |
Techniques for patterning features in semiconductor devices
App 20050056823 - Allen, Scott D. ; et al. | 2005-03-17 |
Antireflective hardmask and uses thereof
App 20050042538 - Babich, Katherina ; et al. | 2005-02-24 |
Lithographic antireflective hardmask compositions and uses thereof
App 20050031964 - Babich, Katherina ; et al. | 2005-02-10 |
Method to prevent pattern collapse in features etched in sulfur dioxide-containing plasmas
Grant 6,849,389 - Mahorowala February 1, 2 | 2005-02-01 |
Method For Image Reversal Of Implant Resist Using A Single Photolithography Exposure And Structures Formed Thereby
App 20040256698 - Holmes, Steven J. ; et al. | 2004-12-23 |
Method and apparatus for multilayer photoresist dry development
App 20040180269 - Balasubramaniam, Vaidyanathan ; et al. | 2004-09-16 |
Method for image reversal of implant resist using a single photolithography exposure and structures formed thereby
Grant 6,780,736 - Holmes , et al. August 24, 2 | 2004-08-24 |
Antireflective SiO-containing compositions for hardmask layer
Grant 6,730,454 - Pfeiffer , et al. May 4, 2 | 2004-05-04 |
In-situ plasma etch for TERA hard mask materials
App 20040053504 - Wise, Richard S. ; et al. | 2004-03-18 |
Process for forming a damascene structure
Grant 6,649,531 - Cote , et al. November 18, 2 | 2003-11-18 |
Antireflective SiO-containing compositions for hardmask layer
App 20030198877 - Pfeiffer, Dirk ; et al. | 2003-10-23 |
Process for forming a damascene structure
App 20030100190 - Cote, William J. ; et al. | 2003-05-29 |
Etch improved resist systems containing acrylate (or methacrylate) silane monomers
App 20030049561 - Angelopoulos, Marie ; et al. | 2003-03-13 |
Method to prevent pattern collapse in features etched in sulfur dioxide-containing plasmas
App 20030017420 - Mahorowala, Arpan P. | 2003-01-23 |
Lateral-only photoresist trimming for sub-80 nm gate stack
App 20030017711 - Mahorowala, Arpan P. ; et al. | 2003-01-23 |
Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography
Grant 6,482,566 - Hofer , et al. November 19, 2 | 2002-11-19 |
Mask-making using resist having SIO bond-containing polymer
Grant 6,420,084 - Angelopoulos , et al. July 16, 2 | 2002-07-16 |
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