Mahoney; Leonard J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mahoney; Leonard J..The latest application filed is for "adaptive controller for ion source".

Company Profile

0.8.12

Mahoney; Leonard J. - Fort Collins CO
Mahoney; Leonard J. - Madison WI

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sensor array for measuring plasma characteristics in plasma processing environments Grant 8,545,669 - Mahoney , et al. October 1, 2	2013-10-01
Adaptive controller for ion source Grant 7,853,364 - Deakins , et al. December 14, 2	2010-12-14
Adaptive Controller For Ion Source App 20080129209 - Deakins; James D. ; et al.	2008-06-05
Wafer probe for measuring plasma and surface characteristics in plasma processing environments Grant 7,192,505 - Roche , et al. March 20, 2	2007-03-20
Application of in-situ plasma measurements to performance and control of a plasma processing system App 20060180570 - Mahoney; Leonard J.	2006-08-17
Diagnostic plasma sensors for endpoint and end-of-life detection App 20060171848 - Roche; Gregory A. ; et al.	2006-08-03
Electrically floating diagnostic plasma probe with ion property sensors App 20060043063 - Mahoney; Leonard J. ; et al.	2006-03-02
Diagnostic plasma measurement device having patterned sensors and features App 20050284570 - Doran, Daniel B. ; et al.	2005-12-29
Techniques for packaging and encapsulating components of diagnostic plasma measurement devices App 20050217796 - Carter, Daniel C. ; et al.	2005-10-06
Sensor array for measuring plasma characteristics in plasma processing environments App 20050151544 - Mahoney, Leonard J. ; et al.	2005-07-14
Sensor array for measuring plasma characteristics in plasma processing environments Grant 6,902,646 - Mahoney , et al. June 7, 2	2005-06-07
Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments App 20050039852 - Roche, Gregory A. ; et al.	2005-02-24
Sensor array for measuring plasma characteristics in plasma processing enviroments App 20050034811 - Mahoney, Leonard J. ; et al.	2005-02-17
Wafer probe for measuring plasma and surface characteristics in plasma processing environments App 20050034812 - Roche, Gregory A. ; et al.	2005-02-17
Wafer probe for measuring plasma and surface characteristics in plasma processing environments App 20050011611 - Mahoney, Leonard J. ; et al.	2005-01-20
Wafer probe for measuring plasma and surface characteristics in plasma processing environments Grant 6,830,650 - Roche , et al. December 14, 2	2004-12-14
Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments App 20040007326 - Roche, Gregory A. ; et al.	2004-01-15
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof Grant 6,432,260 - Mahoney , et al. August 13, 2	2002-08-13
Method and apparatus for plasma surface treatment of the interior of hollow forms Grant 5,521,351 - Mahoney May 28, 1	1996-05-28

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