Maeng; Chang Ho

Patent Applications and Registrations

Patent applications and USPTO patent grants for Maeng; Chang Ho.The latest application filed is for "siloxane and organic-based mol contact patterning".

Company Profile

0.7.8

Maeng; Chang Ho - Cohoes NY
Maeng; Chang Ho - Malta NY
MAENG; Chang Ho - Ballston Spa NY
Maeng; Chang Ho - Clifton Park NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods of forming field effect transistors (FETS) with gate cut isolation regions between replacement metal gates Grant 10,090,402 - Park , et al. October 2, 2	2018-10-02
Siloxane and organic-based MOL contact patterning Grant 10,056,458 - Maeng , et al. August 21, 2	2018-08-21
Embedded silicon carbide block patterning Grant 9,922,972 - Qiu , et al. March 20, 2	2018-03-20
Siloxane And Organic-based Mol Contact Patterning App 20170200792 - MAENG; Chang Ho ; et al.	2017-07-13
Methods For Producing Integrated Circuits With Air Gaps And Integrated Circuits Produced From Such Methods App 20170162430 - Dai; Xintuo ; et al.	2017-06-08
Semiconductor Structures With Coplanar Recessed Gate Layers And Fabrication Methods App 20160049495 - TREVINO; Kristina ; et al.	2016-02-18
Semiconductor structures with coplanar recessed gate layers and fabrication methods Grant 9,252,238 - Trevino , et al. February 2, 2	2016-02-02
Integrated circuits having replacement metal gates with improved threshold voltage performance and methods for fabricating the same Grant 9,147,680 - Trevino , et al. September 29, 2	2015-09-29
Selective removal of gate structure sidewall(s) to facilitate sidewall spacer protection Grant 8,993,445 - Choi , et al. March 31, 2	2015-03-31
Integrated Circuits Having Replacement Metal Gates With Improved Threshold Voltage Performance And Methods For Fabricating The Same App 20150021694 - Trevino; Kristina ; et al.	2015-01-22
Methods For Forming Integrated Circuits With Reduced Replacement Metal Gate Height Variability App 20150024584 - Wells; Gabriel Padron ; et al.	2015-01-22
Reducing gate height variance during semiconductor device formation Grant 8,900,940 - Jha , et al. December 2, 2	2014-12-02
Selective Removal Of Gate Structure Sidewall(s) To Facilitate Sidewall Spacer Protection App 20140199845 - CHOI; Dae-Han ; et al.	2014-07-17
Reducing Gate Height Variance During Semiconductor Device Formation App 20140193957 - Jha; Ashish K. ; et al.	2014-07-10
Method Of Forming Semiconductor Fins App 20140148011 - Choi; Dae-han ; et al.	2014-05-29

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