Maemori; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Maemori; Satoshi.The latest application filed is for "resist composition and method of forming resist pattern".

Company Profile

0.10.12

Maemori; Satoshi - Kawasaki JP
Maemori; Satoshi - Kanagawa JP
Maemori; Satoshi - Kawasaki-shi JP
Maemori; Satoshi - Sagamihara-shi JP
Maemori; Satoshi - Sagamihara JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resist composition and method of forming resist pattern Grant 9,012,125 - Kumada , et al. April 21, 2	2015-04-21
Resist surface modifying liquid, and method for formation of resist pattern using the same Grant 8,349,549 - Maemori , et al. January 8, 2	2013-01-08
Resist Composition And Method Of Forming Resist Pattern App 20120196226 - Kumada; Shinji ; et al.	2012-08-02
Protective film-removing solvent and method of photoresist patterning with it App 20100151395 - Ishiduka; Keita ; et al.	2010-06-17
Resist surface modifying liquid, and method for formation of resist pattern using the same App 20100129758 - Maemori; Satoshi ; et al.	2010-05-27
Positive photoresist composition and method of forming resist pattern Grant 7,629,105 - Yamazaki , et al. December 8, 2	2009-12-08
Positive-working photoresist composition and photosensitive material using same App 20070122744 - Maemori; Satoshi ; et al.	2007-05-31
Positive photoresist composition and method of forming resist pattern App 20060210916 - Yamazaki; Akiyoshi ; et al.	2006-09-21
Method for decreasing surface defects of patterned resist layer Grant 7,094,924 - Nitta , et al. August 22, 2	2006-08-22
Method for the preparation of a semiconductor device Grant 6,818,380 - Maemori , et al. November 16, 2	2004-11-16
Method for the preparation of a semiconductor device Grant 6,777,158 - Maemori , et al. August 17, 2	2004-08-17
Positive-working photoresist composition App 20040072103 - Sato, Kazufumi ; et al.	2004-04-15
Method for the preparation of a semiconductor device App 20040067615 - Maemori, Satoshi ; et al.	2004-04-08
Positive-working photoresist composition Grant 6,677,103 - Sato , et al. January 13, 2	2004-01-13
Method for decreasing surface defects of patterned resist layer Grant 6,605,417 - Nitta , et al. August 12, 2	2003-08-12
Method for decreasing surface defects of patterned resist layer App 20030138736 - Nitta, Kazuyuki ; et al.	2003-07-24
Positive-working photoresist composition Grant 6,444,394 - Sato , et al. September 3, 2	2002-09-03
Positive-working photoresist composition App 20020110750 - Sato, Kazufumi ; et al.	2002-08-15
Positive-working photoresist composition and photosensitive material using same App 20020058202 - Maemori, Satoshi ; et al.	2002-05-16
Method for the preparation of a semiconductor device App 20020045133 - Maemori, Satoshi ; et al.	2002-04-18
Method for decreasing surface defects of patterned resist layer App 20010014431 - Nitta, Kazuyuki ; et al.	2001-08-16

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.