Madriaga; Manuel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Madriaga; Manuel.The latest application filed is for "process control using ray tracing-based libraries and machine learning systems".

Company Profile

0.28.26

Madriaga; Manuel - San Jose CA
Madriaga; Manuel - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process control using ray tracing-based libraries and machine learning systems Grant 8,838,422 - Li , et al. September 16, 2	2014-09-16
Process Control Using Ray Tracing-based Libraries And Machine Learning Systems App 20130148130 - LI; SHIFANG ; et al.	2013-06-13
Optimization of ray tracing and beam propagation parameters Grant 8,289,527 - Li , et al. October 16, 2	2012-10-16
Etch process control using optical metrology and sensor devices Grant 8,193,007 - Madriaga , et al. June 5, 2	2012-06-05
Method of designing an etch stage measurement system Grant 8,173,450 - Tian , et al. May 8, 2	2012-05-08
Etch stage measurement system Grant 8,173,451 - Tian , et al. May 8, 2	2012-05-08
Optimization Of Ray Tracing And Beam Propagation Parameters App 20110246142 - LI; SHIFANG ; et al.	2011-10-06
Automated Process Control Using An Adjusted Metrology Output Signal App 20110245955 - LI; SHIFANG ; et al.	2011-10-06
Optimizing sensitivity of optical metrology measurements Grant 7,961,306 - Li , et al. June 14, 2	2011-06-14
Training a machine learning system to determine photoresist parameters Grant 7,949,618 - Bischoff , et al. May 24, 2	2011-05-24
Optimizing Sensitivity Of Optical Metrology Measurements App 20100245807 - LI; SHIFANG ; et al.	2010-09-30
Automated process control using an optical metrology system optimized with design goals Grant 7,761,178 - Tian , et al. July 20, 2	2010-07-20
Optical metrology system optimized with design goals Grant 7,761,250 - Tian , et al. July 20, 2	2010-07-20
Designing an optical metrology system optimized with signal criteria Grant 7,742,889 - Tian , et al. June 22, 2	2010-06-22
Apparatus for designing an optical metrology system optimized with signal criteria Grant 7,734,437 - Tian , et al. June 8, 2	2010-06-08
Auto Focus Array Detector Optimized For Operating Objectives App 20100118316 - MIHAYLOV; MIHAIL ; et al.	2010-05-13
Automated process control using optical metrology and a correlation between profile models and key profile shape variables Grant 7,667,858 - Chard , et al. February 23, 2	2010-02-23
Apparatus for auto focusing a workpiece using two or more focus parameters Grant 7,660,696 - Norton , et al. February 9, 2	2010-02-09
Automated process control using optical metrology with a photonic nanojet Grant 7,639,351 - Chen , et al. December 29, 2	2009-12-29
Automated Process Control Using An Optical Metrology System Optimized With Design Goals App 20090319075 - TIAN; XINKANG ; et al.	2009-12-24
Optical Metrology System Optimized With Design Goals App 20090319214 - TIAN; XINKANG ; et al.	2009-12-24
Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion Grant 7,636,649 - Li , et al. December 22, 2	2009-12-22
Automated process control using parameters determined with approximation and fine diffraction models Grant 7,627,392 - Liu , et al. December 1, 2	2009-12-01
Process Control Using An Optical Metrology System Optimized With Signal Criteria App 20090248341 - TIAN; XINKANG ; et al.	2009-10-01
Designing An Optical Metrology System Optimized With Signal Criteria App 20090248339 - TIAN; XINKANG ; et al.	2009-10-01
Apparatus For Designing An Optical Metrology System Optimized With Signal Criteria App 20090248340 - TIAN; XINKANG ; et al.	2009-10-01
Optical metrology system optimized with a plurality of design goals Grant 7,595,869 - Tian , et al. September 29, 2	2009-09-29
Apparatus For Designing An Optical Metrology System Optimized For Operating Time Budget App 20090240537 - TIAN; XINKANG ; et al.	2009-09-24
Method Of Designing An Optical Metrology System Optimized For Operating Time Budget App 20090234687 - TIAN; XINKANG ; et al.	2009-09-17
Process control using an optical metrology system optimized with signal criteria Grant 7,589,845 - Tian , et al. September 15, 2	2009-09-15
Controlling a fabrication tool using support vector machine Grant 7,567,352 - Jin , et al. July 28, 2	2009-07-28
Automated process control using optical metrology and photoresist parameters Grant 7,567,353 - Bischoff , et al. July 28, 2	2009-07-28
Managing and using metrology data for process and equipment control Grant 7,526,354 - Madriaga , et al. April 28, 2	2009-04-28
Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer Grant 7,522,295 - Vuong , et al. April 21, 2	2009-04-21
Automated Process Control Of A Fabrication Tool Using A Dispersion Function Relating Process Parameter To Dispersion App 20090082993 - LI; SHIFANG ; et al.	2009-03-26
Automated Process Control Using Parameters Determined With Approximation And Fine Diffraction Models App 20090063077 - LIU; WEI ; et al.	2009-03-05
Automated process control using parameters determined from a photomask covered by a pellicle Grant 7,480,062 - Li , et al. January 20, 2	2009-01-20
Automated Process Control Using Parameters Determined From A Photomask Covered By A Pellicle App 20080291429 - LI; SHIFANG ; et al.	2008-11-27
Optimized characterization of wafers structures for optical metrology Grant 7,444,196 - Scheer , et al. October 28, 2	2008-10-28
Controlling A Fabrication Tool Using Support Vector Machine App 20080252908 - JIN; Wen ; et al.	2008-10-16
Automated process control using optical metrology and photoresist parameters App 20080241975 - Bischoff; Joerg ; et al.	2008-10-02
Training a machine learning system to determine photoresist parameters App 20080243730 - Bischoff; Joerg ; et al.	2008-10-02
Automated process control using optical metrology with a photonic nanojet App 20080231863 - Chen; Zhigang ; et al.	2008-09-25
Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer Grant 7,417,750 - Vuong , et al. August 26, 2	2008-08-26
Automated process control using optical metrology and a correlation between profile models and key profile shape variables App 20080170241 - Chard; Jeffrey ; et al.	2008-07-17
Controlling a fabrication tool using support vector machine Grant 7,372,583 - Jin , et al. May 13, 2	2008-05-13
Consecutive Measurement Of Structures Formed On A Semiconductor Wafer Using An Angle-resolved Spectroscopic Scatterometer App 20080106729 - Vuong; Vi ; et al.	2008-05-08
Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer App 20080106728 - Vuong; Vi ; et al.	2008-05-08
Managing and using metrology data for process and equipment control App 20080009081 - Madriaga; Manuel ; et al.	2008-01-10
Optimized characterization of wafers structures for optical metrology App 20070250200 - Scheer; Steven ; et al.	2007-10-25
Parametric optimization of optical metrology model Grant 7,126,700 - Bao , et al. October 24, 2	2006-10-24
Parametric optimization of optical metrology model App 20050128489 - Bao, Junwei ; et al.	2005-06-16

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