Mack; Chris A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mack; Chris A..The latest application filed is for "resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques".

Company Profile

0.13.12

Mack; Chris A. - Austin TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Overlay metrology and control method Grant 7,804,994 - Adel , et al. September 28, 2	2010-09-28
Method for determining lithographic focus and exposure Grant 7,656,512 - Mieher , et al. February 2, 2	2010-02-02
Feature printability optimization by optical tool Grant 7,566,517 - Adel , et al. July 28, 2	2009-07-28
Resolution Enhancement Techniques Combining Interference-assisted Lithography With Other Photolithography Techniques App 20090117491 - Hendel; Rudolf ; et al.	2009-05-07
Target acquisition and overlay metrology based on two diffracted orders imaging Grant 7,528,953 - Frommer , et al. May 5, 2	2009-05-05
Resolution Enhancement Techniques Combining Four Beam Interference-assisted Lithography With Other Photolithography Techniques App 20090111056 - Hendel; Rudolf ; et al.	2009-04-30
Method For Determining Lithographic Focus And Exposure App 20080192221 - Mieher; Walter ; et al.	2008-08-14
Method for determining lithographic focus and exposure Grant 7,382,447 - Mieher , et al. June 3, 2	2008-06-03
Measuring phase errors on phase shift masks Grant 7,368,208 - Adel , et al. May 6, 2	2008-05-06
Method for process optimization and control by comparison between 2 or more measured scatterometry signals Grant 7,352,453 - Mieher , et al. April 1, 2	2008-04-01
Systems and methods for modifying a reticle's optical properties Grant 7,303,842 - Watson , et al. December 4, 2	2007-12-04
Method for monitoring a reticle Grant 7,300,729 - Watson , et al. November 27, 2	2007-11-27
Method for determining and correcting reticle variations Grant 7,300,725 - Watson , et al. November 27, 2	2007-11-27
Systems and methods for mitigating variances on a patterned wafer using a prediction model Grant 7,297,453 - Watson , et al. November 20, 2	2007-11-20
Systems and methods for mitigating variances on a patterned wafer using a prediction model App 20060240336 - Watson; Sterling G. ; et al.	2006-10-26
Systems and methods for modifying a reticle's optical properties App 20060234139 - Watson; Sterling G. ; et al.	2006-10-19
Method for determining and correcting reticle variations App 20060234145 - Watson; Sterling G. ; et al.	2006-10-19
Method for monitoring a reticle App 20060234144 - Watson; Sterling G. ; et al.	2006-10-19
Diffraction order controlled overlay metrology App 20060197951 - Frommer; Aviv ; et al.	2006-09-07
Method and mark for metrology of phase errors on phase shift masks Grant 7,075,639 - Adel , et al. July 11, 2	2006-07-11
Method and mark for metrology of phase errors on phase shift masks App 20040212796 - Adel, Michael ; et al.	2004-10-28
Method for process optimization and control by comparison between 2 or more measured scatterometry signals App 20040190008 - Mieher, Walter D. ; et al.	2004-09-30
Overlay metrology and control method App 20030223630 - Adel, Michael ; et al.	2003-12-04
Method for determining lithographic focus and exposure App 20030048458 - Mieher, Walter ; et al.	2003-03-13
Photolithography exposure tool and method for in situ photoresist measurments and exposure control Grant 5,363,171 - Mack November 8, 1	1994-11-08

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