MACCRIMMON; Ruairidh

Patent Applications and Registrations

Patent applications and USPTO patent grants for MACCRIMMON; Ruairidh.The latest application filed is for "precision volumetric pump with a bellows hermetic seal".

Company Profile

0.10.12

MACCRIMMON; Ruairidh - Maynard MA
MacCrimmon; Ruairidh - Arlington MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Precision Volumetric Pump With A Bellows Hermetic Seal App 20210310477 - HEINTZELMAN; Dale ; et al.	2021-10-07
Gas cluster ion beam etching process for etching Si-containing, Ge-containing, and metal-containing materials Grant 9,324,567 - Tabat , et al. April 26, 2	2016-04-26
Gas Cluster Ion Beam Etching Process For Achieving Target Etch Process Metrics For Multiple Materials App 20130309872 - Tabat; Martin D. ; et al.	2013-11-21
Gas cluster ion beam etching process for metal-containing materials Grant 8,557,710 - Shao , et al. October 15, 2	2013-10-15
Gas cluster ion beam etching process for Si-containing and Ge-containing materials Grant 8,513,138 - Shao , et al. August 20, 2	2013-08-20
Gas cluster ion beam etching process for achieving target etch process metrics for multiple materials Grant 8,512,586 - Tabat , et al. August 20, 2	2013-08-20
Gas Cluster Ion Beam Etching Process for Etching Si-Containing, Ge-Containing, and Metal-Containing Materials App 20130196509 - Tabat; Martin D. ; et al.	2013-08-01
Gas Cluster Ion Beam Etching Process For Achieving Target Etch Process Metrics For Multiple Materials App 20130059446 - TABAT; Martin D. ; et al.	2013-03-07
Gas Cluster Ion Beam Etching Process For Metal-containing Materials App 20130059444 - SHAO; Yan ; et al.	2013-03-07
GAS CLUSTER ION BEAM ETCHING PROCESS FOR Si-CONTAINING and Ge-CONTAINING MATERIALS App 20130059445 - SHAO; Yan ; et al.	2013-03-07
Method and system for adjusting beam dimension for high-gradient location specific processing Grant 8,298,432 - MacCrimmon , et al. October 30, 2	2012-10-30
Method and system for multi-pass correction of substrate defects Grant 8,293,126 - MacCrimmon , et al. October 23, 2	2012-10-23
Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces Grant 7,564,024 - Hofmeester , et al. July 21, 2	2009-07-21
Method And System For Multi-pass Correction Of Substrate Defects App 20090084759 - MacCRIMMON; Ruairidh ; et al.	2009-04-02
Method And System For Adjusting Beam Dimension For High-gradient Location Specific Processing App 20090084672 - MacCRIMMON; Ruairidh ; et al.	2009-04-02
Methods And Apparatus For Assigning A Beam Intensity Profile To A Gas Cluster Ion Beam Used To Process Workpieces App 20090001282 - Hofmeester; Nicolaus J. ; et al.	2009-01-01

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