loadpatents
Patent applications and USPTO patent grants for Ma; Hsing-Chien.The latest application filed is for "double-metal euv mask absorber".
Patent | Date |
---|---|
Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel Grant 7,410,733 - Yan , et al. August 12, 2 | 2008-08-12 |
Mechanized retractable pellicles and methods of use Grant 7,102,127 - Ramamoorthy , et al. September 5, 2 | 2006-09-05 |
Double-metal EUV mask absorber App 20050227152 - Yan, Pei-Yang ;   et al. | 2005-10-13 |
Double-metal EUV mask absorber Grant 6,913,706 - Yan , et al. July 5, 2 | 2005-07-05 |
Mechanized retractable pellicles and methods of use App 20040229132 - Ramamoorthy, Arun ;   et al. | 2004-11-18 |
Double-metal EUV mask absorber App 20040124174 - Yan, Pei-Yang ;   et al. | 2004-07-01 |
Mechanized retractable pellicles and methods of use Grant 6,734,445 - Ramamoorthy , et al. May 11, 2 | 2004-05-11 |
Mechanized retractable pellicles and methods of use App 20020154285 - Ramamoorthy, Arun ;   et al. | 2002-10-24 |
Double layer photoresist technique for side-wall profile control in plasma etching processes Grant 4,645,562 - Liao , et al. February 24, 1 | 1987-02-24 |
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