Ma; Ce

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ma; Ce.The latest application filed is for "cylinder valves and methods for inhibiting the formation of contaminants in cylnders and cylinder valves".

Company Profile

0.9.30

Ma; Ce - Apex NC
MA; Ce - Munich US
Ma; Ce - San Diego CA US
Ma; Ce - Cary NC
Ma; Ce - US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cylinder Valves And Methods For Inhibiting The Formation Of Contaminants In Cylnders And Cylinder Valves App 20210262619 - Mittonette; Paul ; et al.	2021-08-26
Direct Liquid Injection Of Solution Based Precursors For Atomic Layer Deposition App 20150211126 - Ma; Ce	2015-07-30
Solution based precursors Grant 8,710,253 - Ma , et al. April 29, 2	2014-04-29
Low-volatility Compounds For Use In Forming Deposited Layers App 20130125788 - AITCHISON; Kenneth ; et al.	2013-05-23
Method And Apparatus For Using Solution Based Precursors For Atomic Layer Deposition App 20120294753 - MA; Ce ; et al.	2012-11-22
Method And Apparatus For Using Solution Based Precursors For Atomic Layer Deposition App 20120295038 - Ma; Ce ; et al.	2012-11-22
Container for precursors used in deposition processes Grant 8,261,908 - Ma September 11, 2	2012-09-11
Solution Based Precursors App 20120178953 - Ma; Ce ; et al.	2012-07-12
Formation of graphene wafers on silicon substrates Grant 7,947,581 - Ma May 24, 2	2011-05-24
Low-volatility Compounds For Use In Forming Deposited Layers App 20110048283 - Aitchison; Kenneth ; et al.	2011-03-03
Formation Of Graphene Wafers On Silicon Substrates App 20110034011 - MA; Ce	2011-02-10
Solution Based Lanthanide And Group Iii Precursors For Atomic Layer Deposition App 20100290968 - MA; Ce ; et al.	2010-11-18
Solution Based Zirconium Precursors For Atomic Layer Deposition App 20100290945 - MA; Ce ; et al.	2010-11-18
Methods And Apparatus For The Vaporization And Delivery Of Solution Precursors For Atomic Layer Deposition App 20100151261 - Ma; Ce ; et al.	2010-06-17
Container For Precursors Used In Deposition Processes App 20100140120 - MA; Ce	2010-06-10
Precursors For Atomic Layer Deposition App 20100055321 - Ma; Ce ; et al.	2010-03-04
Methods For Atomic Layer Deposition App 20100036144 - Ma; Ce ; et al.	2010-02-11
Single Precursors For Atomic Layer Deposition App 20090305504 - Ma; Ce ; et al.	2009-12-10
Method And Apparatus For Using Solution Precursors For Atomic Layer Deposition App 20090220374 - MA; Ce ; et al.	2009-09-03
Solution Based Lanthanum Precursors For Atomic Layer Deposition App 20090117274 - Ma; Ce ; et al.	2009-05-07
Method and apparatus for using solution based precursors for atomic layer deposition Grant 7,514,119 - Ma , et al. April 7, 2	2009-04-07
Method and apparatus for the production of high purity tungsten hexafluoride App 20090068086 - Hogle; Richard Allen ; et al.	2009-03-12
Method of forming low dielectric constant layer App 20070077778 - Ma; Ce ; et al.	2007-04-05
Method and apparatus for using solution based precursors for atomic layer deposition App 20060269667 - Ma; Ce ; et al.	2006-11-30
Low temperature selective epitaxial growth of silicon germanium layers App 20060071213 - Ma; Ce ; et al.	2006-04-06
Method and apparatus for maintaining by-product volatility in deposition process App 20050250347 - Bailey, Christopher M. ; et al.	2005-11-10
Methods for forming low-k dielectric films Grant 6,936,537 - Hogle , et al. August 30, 2	2005-08-30
Acid copper electroplating solutions App 20040187731 - Wang, Qing Min ; et al.	2004-09-30
Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric film Grant 6,649,540 - Wang , et al. November 18, 2	2003-11-18
Asymmetric organocyclosiloxanes and their use for making organosilicon polymer low-k dielectric film Grant 6,572,923 - Ma , et al. June 3, 2	2003-06-03
Methods for forming low-k dielectric films App 20020192980 - Hogle, Richard A. ; et al.	2002-12-19
Asymmetric organocyclosiloxanes and their use for making organosilicon polymer low-k dielectric film App 20020132408 - Ma, Ce ; et al.	2002-09-19
Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric film App 20020076944 - Wang, Qing Min ; et al.	2002-06-20
Low-k dielectric CVD precursors and uses thereof App 20020072220 - Wang, Qing Min ; et al.	2002-06-13
Method and apparatus for measuring metallic impurities contained within a fluid Grant 6,012,325 - Ma January 11, 2	2000-01-11

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