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Patent applications and USPTO patent grants for M. Watanabe & Co., Ltd..The latest application filed is for "method for producing silica particles".
Patent | Date |
---|---|
Method for producing silica particles Grant 7,140,201 - Sugiyama , et al. November 28, 2 | 2006-11-28 |
Method of and apparatus for washing photomask and washing solution for photomask Grant 7,077,915 - Nagamura , et al. July 18, 2 | 2006-07-18 |
Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus Grant 6,888,041 - Nakamura May 3, 2 | 2005-05-03 |
Method and apparatus for cleaning photomask Grant 6,277,205 - Nagamura , et al. August 21, 2 | 2001-08-21 |
Method of and apparatus for washing photomask and washing solution for photomask Grant 6,209,553 - Nagamura , et al. April 3, 2 | 2001-04-03 |
Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus Grant 6,194,821 - Nakamura February 27, 2 | 2001-02-27 |
Process and apparatus for recovering a lower alcohol from a mixture thereof with water Grant 5,138,105 - Ninomiya , et al. August 11, 1 | 1992-08-11 |
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