loadpatents
Patent applications and USPTO patent grants for Lyndaker; Bradford J..The latest application filed is for "adjustment of power and frequency based on three or more states".
Patent | Date |
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Adjustment Of Power And Frequency Based On Three Or More States App 20220277934 - Valcore, Jr.; John C. ;   et al. | 2022-09-01 |
Adjustment of power and frequency based on three or more states Grant 11,361,942 - Valcore, Jr. , et al. June 14, 2 | 2022-06-14 |
Multiple-Output Radiofrequency Matching Module and Associated Methods App 20210313948 - Leeser; Karl ;   et al. | 2021-10-07 |
Multiple-output radiofrequency matching module and associated methods Grant 11,038,483 - Leeser , et al. June 15, 2 | 2021-06-15 |
Three or more states for achieving high aspect ratio dielectric etch Grant 10,861,708 - Yanagawa , et al. December 8, 2 | 2020-12-08 |
Adjustment Of Power And Frequency Based On Three Or More States App 20200243304 - Valcore, JR.; John C. ;   et al. | 2020-07-30 |
Multiple-Output Radiofrequency Matching Module and Associated Methods App 20200244244 - Leeser; Karl ;   et al. | 2020-07-30 |
Using modeling to determine ion energy associated with a plasma system Grant 10,707,056 - Valcore, Jr. , et al. | 2020-07-07 |
Multiple-output radiofrequency matching module and associated methods Grant 10,666,218 - Leeser , et al. | 2020-05-26 |
Adjustment of power and frequency based on three or more states Grant 10,629,413 - Valcore, Jr. , et al. | 2020-04-21 |
Three Or More States For Achieving High Aspect Ratio Dielectric Etch App 20200090948 - Yanagawa; Takumi ;   et al. | 2020-03-19 |
Three or more states for achieving high aspect ratio dielectric etch Grant 10,504,744 - Yanagawa , et al. Dec | 2019-12-10 |
Control Of Etch Rate Using Modeling, Feedback And Impedance Match App 20190318919 - Lyndaker; Bradford J. ;   et al. | 2019-10-17 |
Control of etch rate using modeling, feedback and impedance match Grant 10,381,201 - Lyndaker , et al. A | 2019-08-13 |
Using modeling to determine wafer bias associated with a plasma system Grant 10,340,127 - Valcore, Jr. , et al. | 2019-07-02 |
Determining a malfunctioning device in a plasma system Grant 10,319,570 - Valcore, Jr. , et al. | 2019-06-11 |
Systems and methods for increasing efficiency of delivered power of a megahertz radio frequency generator in the presence of a kilohertz radio frequency generator Grant 10,256,078 - Howald , et al. | 2019-04-09 |
State-based adjustment of power and frequency Grant 10,231,321 - Valcore, Jr. , et al. | 2019-03-12 |
Systems and Methods for Increasing Efficiency of Delivered Power of a Megahertz Radio Frequency Generator in the Presence of a Kilohertz Radio Frequency Generator App 20190027342 - Howald; Arthur M. ;   et al. | 2019-01-24 |
Methods And Apparatus For Controlling Plasma In A Plasma Processing System App 20180323038 - Valcore, JR.; John C. ;   et al. | 2018-11-08 |
Multiple-Output Radiofrequency Matching Module and Associated Methods App 20180309424 - Leeser; Karl ;   et al. | 2018-10-25 |
Sub-Pulsing During a State App 20180294140 - Valcore, JR.; John C. ;   et al. | 2018-10-11 |
Adjustment of power and frequency based on three or more states Grant 10,074,520 - Valcore, Jr. , et al. September 11, 2 | 2018-09-11 |
Methods and apparatus for controlling plasma in a plasma processing system Grant 10,032,605 - Valcore, Jr. , et al. July 24, 2 | 2018-07-24 |
Systems and methods for increasing efficiency of delivered power of a megahertz radio frequency generator in the presence of a kilohertz radio frequency generator Grant 10,020,168 - Howald , et al. July 10, 2 | 2018-07-10 |
Determining a value of a variable on an RF transmission model Grant 10,008,371 - Valcore, Jr. , et al. June 26, 2 | 2018-06-26 |
Sub-pulsing during a state Grant 9,997,333 - Valcore, Jr. , et al. June 12, 2 | 2018-06-12 |
Impedance-based adjustment of power and frequency Grant 9,960,015 - Valcore, Jr. , et al. May 1, 2 | 2018-05-01 |
Multiple-output radiofrequency matching module and associated methods Grant 9,954,508 - Leeser , et al. April 24, 2 | 2018-04-24 |
Edge ramping Grant 9,947,513 - Valcore, Jr. , et al. April 17, 2 | 2018-04-17 |
Using Modeling To Determine Ion Energy Associated With A Plasma System App 20180068834 - Valcore, JR.; John C. ;   et al. | 2018-03-08 |
Sub-Pulsing During a State App 20180033596 - Valcore, Jr.; John C. ;   et al. | 2018-02-01 |
Using modeling to determine ion energy associated with a plasma system Grant 9,842,725 - Valcore, Jr. , et al. December 12, 2 | 2017-12-12 |
Adjustment Of Power And Frequency Based On Three Or More States App 20170330732 - Valcore, JR.; John C. ;   et al. | 2017-11-16 |
Sub-pulsing during a state Grant 9,812,294 - Valcore, Jr. , et al. November 7, 2 | 2017-11-07 |
Edge Ramping App 20170263419 - Valcore, JR.; John C. ;   et al. | 2017-09-14 |
Systems and methods for providing characteristics of an impedance matching model for use with matching networks Grant 9,720,022 - Howald , et al. August 1, 2 | 2017-08-01 |
Control Of Etch Rate Using Modeling, Feedback And Impedance Match App 20170194130 - Lyndaker; Bradford J. ;   et al. | 2017-07-06 |
Impedance-based Adjustment Of Power And Frequency App 20170178864 - Valcore, JR.; John C. ;   et al. | 2017-06-22 |
Determining A Malfunctioning Device in A Plasma System App 20170178873 - Valcore, JR.; John C. ;   et al. | 2017-06-22 |
Edge ramping Grant 9,673,026 - Valcore, Jr. , et al. June 6, 2 | 2017-06-06 |
Multiple-Output Radiofrequency Matching Module and Associated Methods App 20170117869 - Leeser; Karl ;   et al. | 2017-04-27 |
Tuning a parameter associated with plasma impedance Grant 9,627,182 - Valcore, Jr. , et al. April 18, 2 | 2017-04-18 |
Determining a malfunctioning device in a plasma system Grant 9,620,337 - Valcore, Jr. , et al. April 11, 2 | 2017-04-11 |
Control of etch rate using modeling, feedback and impedance match Grant 9,620,334 - Lyndaker , et al. April 11, 2 | 2017-04-11 |
Impedance-based adjustment of power and frequency Grant 9,607,810 - Valcore, Jr. , et al. March 28, 2 | 2017-03-28 |
Using Modeling To Determine Wafer Bias Associated With A Plasma System App 20170032945 - Valcore, JR.; John C. ;   et al. | 2017-02-02 |
Systems And Methods For Providing Characteristics Of An Impedance Matching Model For Use With Matching Networks App 20160343548 - Howald; Arthur M. ;   et al. | 2016-11-24 |
Using modeling to determine wafer bias associated with a plasma system Grant 9,502,216 - Valcore, Jr. , et al. November 22, 2 | 2016-11-22 |
Adjustment Of Power And Frequency Based On Three Or More States App 20160336152 - Valcore, JR.; John C. ;   et al. | 2016-11-17 |
Edge Ramping App 20160322202 - Valcore, JR.; John C. ;   et al. | 2016-11-03 |
Adjustment of power and frequency based on three or more states Grant 9,462,672 - Valcore, Jr. , et al. October 4, 2 | 2016-10-04 |
Sub-pulsing During A State App 20160276137 - Valcore, JR.; John C. ;   et al. | 2016-09-22 |
Methods And Apparatus For Synchronizing Rf Pulses In A Plasma Processing System App 20160268100 - Valcore, JR.; John C. ;   et al. | 2016-09-15 |
Edge ramping Grant 9,408,288 - Valcore, Jr. , et al. August 2, 2 | 2016-08-02 |
Sub-pulsing during a state Grant 9,390,893 - Valcore, Jr. , et al. July 12, 2 | 2016-07-12 |
Determining A Value Of A Variable On An Rf Transmission Model App 20160189937 - Valcore, JR.; John C. ;   et al. | 2016-06-30 |
Tuning A Parameter Associated With Plasma Impedance App 20160189932 - Valcore, JR.; John C. ;   et al. | 2016-06-30 |
Methods and apparatus for synchronizing RF pulses in a plasma processing system Grant 9,368,329 - Valcore, Jr. , et al. June 14, 2 | 2016-06-14 |
Tuning a parameter associated with plasma impedance Grant 9,320,127 - Valcore, Jr. , et al. April 19, 2 | 2016-04-19 |
Determining a value of a variable on an RF transmission model Grant 9,320,126 - Valcore, Jr. , et al. April 19, 2 | 2016-04-19 |
State-based Adjustment Of Power And Frequency App 20160044775 - Valcore, JR.; John C. ;   et al. | 2016-02-11 |
Frequency enhanced impedance dependent power control for multi-frequency RF pulsing Grant 9,236,228 - Valcore, Jr. , et al. January 12, 2 | 2016-01-12 |
Impedance-based Adjustment Of Power And Frequency App 20160005573 - Valcore, JR.; John C. ;   et al. | 2016-01-07 |
State-based adjustment of power and frequency Grant 9,197,196 - Valcore, Jr. , et al. November 24, 2 | 2015-11-24 |
Methods And Apparatus For Controlling Plasma In A Plasma Processing System App 20150311041 - Valcore, JR.; John C. ;   et al. | 2015-10-29 |
Impedance-based adjustment of power and frequency Grant 9,171,699 - Valcore, Jr. , et al. October 27, 2 | 2015-10-27 |
Tuning a parameter associated with plasma impedance Grant 9,155,182 - Valcore, Jr. , et al. October 6, 2 | 2015-10-06 |
Methods and apparatus for controlling plasma in a plasma processing system Grant 9,114,666 - Valcore, Jr. , et al. August 25, 2 | 2015-08-25 |
Frequency Enhanced Impedance Dependent Power Control for Multi-Frequency RF Pulsing App 20150214012 - Valcore, JR.; John C. ;   et al. | 2015-07-30 |
Tuning A Parameter Associated With Plasma Impedance App 20150206717 - Valcore, JR.; John C. ;   et al. | 2015-07-23 |
Frequency enhanced impedance dependent power control for multi-frequency RF pulsing Grant 9,030,101 - Valcore, Jr. , et al. May 12, 2 | 2015-05-12 |
Sub-pulsing During A State App 20150048740 - Valcore, JR.; John C. ;   et al. | 2015-02-19 |
Using Modeling to Determine Wafer Bias Associated With A Plasma System App 20140214350 - Valcore, JR.; John C. ;   et al. | 2014-07-31 |
Using Modeling to Determine Ion Energy Associated with A Plasma System App 20140214351 - Valcore, JR.; John C. ;   et al. | 2014-07-31 |
Determining A Malfunctioning Device in A Plasma System App 20140210508 - Valcore, JR.; John C. ;   et al. | 2014-07-31 |
Tuning A Parameter Associated With Plasma Impedance App 20140197731 - Valcore, JR.; John C. ;   et al. | 2014-07-17 |
Control of Etch Rate Using Modeling, Feedback and Impedance Match App 20140195033 - Lyndaker; Bradford J. ;   et al. | 2014-07-10 |
Determining A Value Of A Variable On An Rf Transmission Model App 20140172335 - Valcore, JR.; John C. ;   et al. | 2014-06-19 |
Edge Ramping App 20140076713 - Valcore, JR.; John C. ;   et al. | 2014-03-20 |
Adjustment of Power and Frequency Based on Three or More States App 20140009073 - Valcore, JR.; John C. ;   et al. | 2014-01-09 |
Methods And Apparatus For Controlling Plasma In A Plasma Processing System App 20130213934 - Valcore, JR.; John C. ;   et al. | 2013-08-22 |
State-based Adjustment Of Power And Frequency App 20130213573 - Valcore, JR.; John C. ;   et al. | 2013-08-22 |
Frequency Enhanced Impedance Dependent Power Control For Multi-frequency Rf Pulsing App 20130214682 - Valcore, JR.; John C. ;   et al. | 2013-08-22 |
Methods And Apparatus For Synchronizing Rf Pulses In A Plasma Processing System App 20130214828 - Valcore, JR.; John C, ;   et al. | 2013-08-22 |
Impedance-Based Adjustment of Power and Frequency App 20130214683 - Valcore, JR.; John C. ;   et al. | 2013-08-22 |
Reducing plasma ignition pressure Grant 7,193,173 - Wiepking , et al. March 20, 2 | 2007-03-20 |
Reducing plasma ignition pressure App 20060011590 - Wiepking; Mark ;   et al. | 2006-01-19 |
Gain stability arrangement for HV MOSFET power amplifier Grant 5,537,080 - Chawla , et al. July 16, 1 | 1996-07-16 |
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