Lucas; Kevin D.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lucas; Kevin D..The latest application filed is for "method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process".

Company Profile

0.10.10

Lucas; Kevin D. - Austin TX
Lucas; Kevin D. - Meylan FR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process Grant 8,312,394 - Ban , et al. November 13, 2	2012-11-13
Method And Apparatus For Determining Mask Layouts For A Spacer-is-dielectric Self-aligned Double-patterning Process App 20120137261 - Ban; Yonchan ; et al.	2012-05-31
Method And Apparatus For Modeling A Vectorial Polarization Effect In An Optical Lithography System App 20090070730 - Zhang; Qiaolin ; et al.	2009-03-12
Method of Making an Integrated Circuit App 20080250374 - Lucas; Kevin D. ; et al.	2008-10-09
Layout modification using multilayer-based constraints Grant 7,284,231 - Lucas , et al. October 16, 2	2007-10-16
Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure field App 20060199087 - Lucas; Kevin D. ; et al.	2006-09-07
Layout modification using multilayer-based constraints App 20060136861 - Lucas; Kevin D. ; et al.	2006-06-22
Non-resolving mask tiling method for flare reduction Grant 6,989,229 - Lucas , et al. January 24, 2	2006-01-24
Semiconductor device and method of forming the same Grant 6,933,227 - Adetutu , et al. August 23, 2	2005-08-23
Semiconductor device and method of forming the same App 20050087870 - Adetutu, Olubunmi O. ; et al.	2005-04-28
Method of designing a reticle and forming a semiconductor device therewith App 20040248016 - Lucas, Kevin D. ; et al.	2004-12-09
Photolithography reticle design Grant 6,818,362 - Lucas , et al. November 16, 2	2004-11-16
Non-resolving mask tiling method for flare reduction App 20040188383 - Lucas, Kevin D. ; et al.	2004-09-30
Lithography correction method and device Grant 6,783,904 - Strozewski , et al. August 31, 2	2004-08-31
Lithography correction method and device App 20030213613 - Strozewski, Kirk J. ; et al.	2003-11-20
Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer Grant 6,649,452 - Lucas , et al. November 18, 2	2003-11-18
Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer and structure thereof App 20030162329 - Lucas, Kevin D. ; et al.	2003-08-28
Process for forming a combination hardmask and antireflective layer Grant 6,287,951 - Lucas , et al. September 11, 2	2001-09-11
Two dimensional lithographic proximity correction using DRC shape functions Grant 5,920,487 - Reich , et al. July 6, 1	1999-07-06
Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same Grant 5,849,440 - Lucas , et al. December 15, 1	1998-12-15

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