LUBBEN; Daniel C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for LUBBEN; Daniel C..The latest application filed is for "self-ionized and inductively-coupled plasma for sputtering and resputtering".

Company Profile

0.11.13

LUBBEN; Daniel C. - San Jose CA
Lubben, Daniel C. - Saratoga CA
Lubben; Daniel C. - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Self-ionized And Inductively-coupled Plasma For Sputtering And Resputtering App 20180327893 - DING; Peijun ; et al.	2018-11-15
Self-ionized and inductively-coupled plasma for sputtering and resputtering Grant 10,047,430 - Ding , et al. August 14, 2	2018-08-14
Self-ionized And Inductively-coupled Plasma For Sputtering And Resputtering App 20140305802 - DING; Peijun ; et al.	2014-10-16
Prediction and compensation of erosion in a magnetron sputtering target Grant 8,764,949 - Miller , et al. July 1, 2	2014-07-01
Self-ionized and inductively-coupled plasma for sputtering and resputtering Grant 8,696,875 - Ding , et al. April 15, 2	2014-04-15
Self-ionized and inductively-coupled plasma for sputtering and resputtering Grant 8,668,816 - Ding , et al. March 11, 2	2014-03-11
Prediction and compensation of erosion in a magnetron sputtering target App 20130313107 - Miller; Keith A. ; et al.	2013-11-28
Method for predicting and compensating erosion in a magnetron sputtering target Grant 8,518,220 - Miller , et al. August 27, 2	2013-08-27
Method for Predicting and Compensating Erosion in a Magnetron Sputtering Target App 20120132518 - Miller; Keith A. ; et al.	2012-05-31
Prediction and compensation of erosion in a magnetron sputtering target Grant 8,133,360 - Miller , et al. March 13, 2	2012-03-13
Mechanism for varying the spacing between sputter magnetron and target Grant 7,674,360 - Hong , et al. March 9, 2	2010-03-09
Apparatus And Method For Uniform Deposition App 20090308732 - Cao; Yong ; et al.	2009-12-17
Self-ionized And Inductively-coupled Plasma For Sputtering And Resputtering App 20090233438 - DING; Peijun ; et al.	2009-09-17
Prediction And Compensation Of Erosion In A Magnetron Sputtering Target App 20090159428 - MILLER; KEITH A. ; et al.	2009-06-25
Self-ionized And Inductively-coupled Plasma For Sputtering And Resputtering App 20080110747 - DING; Peijun ; et al.	2008-05-15
Self-ionized and inductively-coupled plasma for sputtering and resputtering App 20050255691 - Ding, Peijun ; et al.	2005-11-17
Compensation of spacing between magnetron and sputter target App 20050133361 - Ding, Peijun ; et al.	2005-06-23
Mechanism for varying the spacing between sputter magnetron and target App 20050133365 - Hong, Ilyoung Richard ; et al.	2005-06-23
Small epicyclic magnetron with controlled radial sputtering profile Grant 6,852,202 - Miller , et al. February 8, 2	2005-02-08
Self-ionized and inductively-coupled plasma for sputtering and resputtering App 20050006222 - Ding, Peijun ; et al.	2005-01-13
Small epicyclic magnetron with controlled radial sputtering profile App 20030217914 - Miller, Michael Andrew ; et al.	2003-11-27

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