Lu; Ping-Hung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lu; Ping-Hung.The latest application filed is for "negative-working photoresist compositions for laser ablation and use thereof".

Company Profile

0.19.20

Lu; Ping-Hung - Bridgewater NJ
Lu; Ping Hung - Port Lavaca TX
Lu; Ping-Hung - Bridgewate NJ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Negative-working photoresist compositions for laser ablation and use thereof Grant 10,705,424 - Chen , et al.	2020-07-07
Negative-working Photoresist Compositions For Laser Ablation And Use Thereof App 20170285475 - Chen; Chunwei ; et al.	2017-10-05
Negative-working Photoresist Compositions For Laser Ablation And Use Thereof App 20170176856 - Chen; Chunwei ; et al.	2017-06-22
Positive working photosensitive material Grant 8,841,062 - Liu , et al. September 23, 2	2014-09-23
Positive Working Photosensitive Material App 20140154624 - LIU; Weihong ; et al.	2014-06-05
Nanocomposite Negative Photosensitive Composition And Use Thereof App 20130105440 - LU; Ping-Hung ; et al.	2013-05-02
Nanocomposite Positive Photosensitive Composition And Use Thereof App 20130108956 - LU; Ping-Hung ; et al.	2013-05-02
Stripper for coating layer Grant 8,026,201 - Zhang , et al. September 27, 2	2011-09-27
Antireflective coating composition comprising fused aromatic rings Grant 8,017,296 - Houlihan , et al. September 13, 2	2011-09-13
Antireflective Coating Compositions App 20100151392 - Rahman; M. Dalil ; et al.	2010-06-17
Cross-laminated Elastic Film App 20090317650 - Yang; Haur-Horng ; et al.	2009-12-24
Nanocomposite photoresist composition for imaging thick films Grant 7,524,606 - Chen , et al. April 28, 2	2009-04-28
Antireflective Coating Composition Comprising Fused Aromatic Rings App 20080292995 - Houlihan; Francis ; et al.	2008-11-27
Stripper for Coating Layer App 20080161217 - Zhang; Ruzhi ; et al.	2008-07-03
Antireflective Coating Compositions Comprising Siloxane Polymer App 20070298349 - Zhang; Ruzhi ; et al.	2007-12-27
Photoresist composition for imaging thick films Grant 7,255,970 - Toukhy , et al. August 14, 2	2007-08-14
Nanocomposite photosensitive composition and use thereof Grant 7,247,419 - Chen , et al. July 24, 2	2007-07-24
Water soluble negative tone photoresist Grant 7,235,348 - Ho , et al. June 26, 2	2007-06-26
Nanocomposite Photosensitive Composition And Use Thereof App 20070141510 - Chen; Chunwei ; et al.	2007-06-21
Photoresist composition for imaging thick films App 20070015080 - Toukhy; Medhat A. ; et al.	2007-01-18
Nanocomposite photosensitive composition and use thereof App 20060228645 - Chen; Chunwei ; et al.	2006-10-12
Nanocomposite photoresist composition for imaging thick films App 20060228644 - Chen; Chunwei ; et al.	2006-10-12
Photosensitive composition and use thereof Grant 7,078,157 - Zhuang , et al. July 18, 2	2006-07-18
Water soluble negative tone photoresist App 20040234897 - Ho, Bang-Chein ; et al.	2004-11-25
Negative-acting aqueous photoresist composition Grant 6,800,415 - Lu , et al. October 5, 2	2004-10-05
Photosensitive composition and use thereof App 20040175653 - Zuang, Hong ; et al.	2004-09-09
Negative-acting chemically amplified photoresist composition Grant 6,576,394 - Xu , et al. June 10, 2	2003-06-10
Negative- acting aqueous photoresist composition App 20030077539 - Lu, Ping-Hung ; et al.	2003-04-24
Antireflective coating compositions for photoresist compositions and use thereof Grant 5,994,430 - Ding , et al. November 30, 1	1999-11-30
Positive photoresists containing novel photoactive compounds Grant 5,876,897 - Durham , et al. March 2, 1	1999-03-02
Antireflective coating for photoresist compositions Grant 5,733,714 - McCulloch , et al. March 31, 1	1998-03-31
Aqueous antireflective coatings for photoresist compositions Grant 5,652,297 - McCulloch , et al. July 29, 1	1997-07-29
Antireflective coatings for photoresist compositions Grant 5,652,317 - McCulloch , et al. July 29, 1	1997-07-29
Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone Grant 5,612,164 - Canize , et al. March 18, 1	1997-03-18
Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists Grant 5,476,750 - Rahman , et al. December 19, 1	1995-12-19

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