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name:-0.0076780319213867
name:-0.00044989585876465
Lu; Hsiao-Ling Patent Filings

Lu; Hsiao-Ling

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lu; Hsiao-Ling.The latest application filed is for "chemical mechanical polishing process for forming shallow trench isolation structure".

Company Profile
0.6.5
  • Lu; Hsiao-Ling - Jhudong Township Hsinchu County TW
  • Lu; Hsiao-Ling - Hsin-Chu TW
  • Lu; Hsiao-Ling - Hsinchu TW
  • Lu, Hsiao-Ling - Chu-Tung Town TW
  • Lu; Hsiao-Ling - Taipei Hsien TW
  • Lu; Hsiao-Ling - Chung Ho TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Chemical mechanical polishing process for forming shallow trench isolation structure
Grant 7,544,305 - Hsu , et al. June 9, 2
2009-06-09
Chemical Mechanical Polishing Process For Forming Shallow Trench Isolation Structure
App 20080029478 - Hsu; Chia-Jung ;   et al.
2008-02-07
Chemical mechanical polishing process for forming shallow trench isolation structure
Grant 7,294,575 - Hsu , et al. November 13, 2
2007-11-13
Method for preventing edge peeling defect
App 20060172526 - Hsu; Chia-Lin ;   et al.
2006-08-03
Chemical mechanical polishing process for forming shallow trench isolation structure
App 20050148184 - Hsu, Chia-Rung ;   et al.
2005-07-07
Method for forming shallow trench isolation structure
Grant 6,913,978 - Chen , et al. July 5, 2
2005-07-05
Method for preventing edge peeling defect
App 20050085163 - Hsu, Chia-Lin ;   et al.
2005-04-21
Polishing pad and method of polishing wafer
App 20050054277 - Tsai, Teng-Chun ;   et al.
2005-03-10
Ti liner for copper interconnect with low-k dielectric
Grant 6,661,097 - Clevenger , et al. December 9, 2
2003-12-09
Method for testing leakage current caused self-aligned silicide
Grant 6,249,138 - Huang , et al. June 19, 2
2001-06-19
Method for fabricating semiconductor device
Grant 6,140,192 - Huang , et al. October 31, 2
2000-10-31

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