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Patent applications and USPTO patent grants for Lowe; Marie.The latest application filed is for "selective removal chemistries for semiconductor applications, methods of production and uses thereof".
Patent | Date |
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Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid Grant 7,291,565 - Hansen , et al. November 6, 2 | 2007-11-06 |
Selective removal chemistries for semiconductor applications, methods of production and uses thereof App 20060255315 - Yellowaga; Deborah L. ;   et al. | 2006-11-16 |
Etching and cleaning BPSG material using supercritical processing App 20060186088 - Jacobson; Gunilla ;   et al. | 2006-08-24 |
Method And System For Treating A Substrate With A High Pressure Fluid Using Fluorosilicic Acid App 20060180573 - Hansen; Brandon ;   et al. | 2006-08-17 |
Method and system for treating a substrate using a supercritical fluid App 20060102591 - Jacobson; Gunilla ;   et al. | 2006-05-18 |
Method For Treating A Substrate With A High Pressure Fluid Using A Preoxide-based Process Chemistry App 20060102590 - Kevwitch; Robert ;   et al. | 2006-05-18 |
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