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Patent applications and USPTO patent grants for Lou; Limin (Eric).The latest application filed is for "method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same".
Patent | Date |
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Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same Grant 7,241,538 - Zhang , et al. July 10, 2 | 2007-07-10 |
Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same App 20070099093 - Zhang; Feng-Hong ;   et al. | 2007-05-03 |
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