loadpatents
Patent applications and USPTO patent grants for Lou; Jen-Chung.The latest application filed is for "method for forming ultra thin oxide layer by ozonated water".
Patent | Date |
---|---|
Method and apparatus for treating a substrate surface by bubbling Grant 7,202,175 - Kin , et al. April 10, 2 | 2007-04-10 |
Method for fabrication of polycrystalline silicon thin film transistors Grant 7,115,449 - Yeh , et al. October 3, 2 | 2006-10-03 |
Method for fabrication of polycrystallin silicon thin film transistors Grant 7,109,075 - Yeh , et al. September 19, 2 | 2006-09-19 |
Method for forming ultra thin oxide layer by ozonated water App 20060134927 - Chen; Yung-Yu ;   et al. | 2006-06-22 |
Method and apparatus for treating a substrate surface by bubbling App 20050101144 - Kin, Kon-Tsu ;   et al. | 2005-05-12 |
Method for fabrication of polycrystalline silicon thin film transistors App 20040266074 - Yeh, Ching-Fa ;   et al. | 2004-12-30 |
Method for fabrication of polycrystallin silicon thin film transistors App 20040241921 - Yeh, Ching-Fa ;   et al. | 2004-12-02 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.