| Patent | Date |
|---|
Frequency tuning for a matchless plasma source
Grant 11,437,219 - Long , et al. September 6, 2 | 2022-09-06 |
Rf Pulsing Within Pulsing For Semiconductor Rf Plasma Processing
App 20220254608 - Long; Maolin ; et al. | 2022-08-11 |
Systems And Methods For Multi-level Pulsing In Rf Plasma Tools
App 20220216038 - Wu; Ying ; et al. | 2022-07-07 |
Induction Coil Assembly for Plasma Processing Apparatus
App 20220208512 - Long; Maolin ; et al. | 2022-06-30 |
Configurable Faraday Shield
App 20220208529 - Long; Maolin | 2022-06-30 |
Directly Driven Hybrid ICP-CCP Plasma Source
App 20220208518 - Long; Maolin | 2022-06-30 |
Cooled Shield for ICP Source
App 20220208527 - Long; Maolin | 2022-06-30 |
Grid Assembly for Plasma Processing Apparatus
App 20220208514 - Long; Maolin | 2022-06-30 |
Workpiece Processing Apparatus with Outer Gas Channel Insert
App 20220208523 - Long; Maolin ; et al. | 2022-06-30 |
Electrostatic Chuck Assembly for Plasma Processing Apparatus
App 20220208591 - Long; Maolin | 2022-06-30 |
Dual-frequency, Direct-drive Inductively Coupled Plasma Source
App 20220199365 - Long; Maolin ; et al. | 2022-06-23 |
RF pulsing within pulsing for semiconductor RF plasma processing
Grant 11,342,159 - Long , et al. May 24, 2 | 2022-05-24 |
Matchless Plasma Source For Semiconductor Wafer Fabrication
App 20220117074 - Long; Maolin ; et al. | 2022-04-14 |
Plasma Strip Tool With Movable Insert
App 20220068611 - Long; Maolin ; et al. | 2022-03-03 |
Matchless plasma source for semiconductor wafer fabrication
Grant 11,224,116 - Long , et al. January 11, 2 | 2022-01-11 |
Metal Contamination Reduction In Substrate Processing Systems With Transformer Coupled Plasma
App 20210327689 - Long; Maolin ; et al. | 2021-10-21 |
Direct Frequency Tuning For Matchless Plasma Source In Substrate Processing Systems
App 20210210314 - WANG; Yuhou ; et al. | 2021-07-08 |
Metal contamination reduction in substrate processing systems with transformer coupled plasma
Grant 11,056,321 - Long , et al. July 6, 2 | 2021-07-06 |
Direct drive RF circuit for substrate processing systems
Grant 10,847,345 - Long , et al. November 24, 2 | 2020-11-24 |
Rf Pulsing Within Pulsing For Semiconductor Rf Plasma Processing
App 20200335305 - Long; Maolin ; et al. | 2020-10-22 |
RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate support
Grant 10,784,083 - Long , et al. Sept | 2020-09-22 |
Frequency Tuning for a Matchless Plasma Source
App 20200286713 - Long; Maolin ; et al. | 2020-09-10 |
Matchless Plasma Source For Semiconductor Wafer Fabrication
App 20200253034 - Kind Code | 2020-08-06 |
Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching
Grant 10,734,195 - Long , et al. | 2020-08-04 |
Radiofrequency (RF) filter for multi-frequency RF bias
Grant 10,715,095 - Long , et al. | 2020-07-14 |
Metal Contamination Reduction In Substrate Processing Systems With Transformer Coupled Plasma
App 20200219708 - LONG; Maolin ; et al. | 2020-07-09 |
Frequency tuning for a matchless plasma source
Grant 10,672,590 - Long , et al. | 2020-06-02 |
Cathode RF asymmetry detection probe for semiconductor RF plasma processing equipment
Grant 10,649,006 - Long , et al. | 2020-05-12 |
Matchless plasma source for semiconductor wafer fabrication
Grant 10,638,593 - Long , et al. | 2020-04-28 |
Direct Drive Rf Circuit For Substrate Processing Systems
App 20200111644 - LONG; Maolin ; et al. | 2020-04-09 |
Direct drive RF circuit for substrate processing systems
Grant 10,515,781 - Long , et al. Dec | 2019-12-24 |
Direct Drive Rf Circuit For Substrate Processing Systems
App 20190385821 - LONG; Maolin ; et al. | 2019-12-19 |
Powered grid for plasma chamber
Grant 10,431,434 - Long , et al. O | 2019-10-01 |
Frequency Tuning for a Matchless Plasma Source
App 20190287764 - Long; Maolin ; et al. | 2019-09-19 |
Matchless Plasma Source For Semiconductor Wafer Fabrication
App 20190215942 - Long; Maolin ; et al. | 2019-07-11 |
Plasma processing systems including side coils and methods related to the plasma processing systems
Grant 10,340,121 - Long , et al. | 2019-07-02 |
Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network
Grant 10,332,725 - Sato , et al. | 2019-06-25 |
Matchless Plasma Source for Semiconductor Wafer Fabrication
App 20190116656 - Long; Maolin ; et al. | 2019-04-18 |
Matchless plasma source for semiconductor wafer fabrication
Grant 10,264,663 - Long , et al. | 2019-04-16 |
Cathode Rf Asymmetry Detection Probe For Semiconductor Rf Plasma Processing Equipment
App 20190107558 - Long; Maolin ; et al. | 2019-04-11 |
Radiofrequency (RF) Filter for Multi-Frequency RF Bias
App 20190109576 - Long; Maolin ; et al. | 2019-04-11 |
Rf Voltage Sensor Incorporating Multiple Voltage Dividers For Detecting Rf Voltages At A Pickup Device Of A Substrate Support
App 20190051497 - Long; Maolin ; et al. | 2019-02-14 |
Systems And Methods For Transformer Coupled Plasma Pulsing With Transformer Coupled Capacitive Tuning Switching
App 20180358205 - Long; Maolin ; et al. | 2018-12-13 |
Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systems
Grant 10,121,641 - Long , et al. November 6, 2 | 2018-11-06 |
TCCT match circuit for plasma etch chambers
Grant 10,056,231 - Long , et al. August 21, 2 | 2018-08-21 |
Powered Grid for Plasma Chamber
App 20180226233 - Long; Maolin ; et al. | 2018-08-09 |
Cathode With Improved Rf Power Efficiency For Semiconductor Processing Equipment With Rf Plasma
App 20180197722 - LONG; Maolin | 2018-07-12 |
Powered grid for plasma chamber
Grant 9,966,236 - Long , et al. May 8, 2 | 2018-05-08 |
Systems and Methods for Reverse Pulsing
App 20170372912 - Long; Maolin ; et al. | 2017-12-28 |
Electrostatic chuck with thermal choke
Grant 9,805,963 - Long , et al. October 31, 2 | 2017-10-31 |
Systems and methods for reverse pulsing
Grant 9,761,459 - Long , et al. September 12, 2 | 2017-09-12 |
Electrostatic Chuck With Thermal Choke
App 20170098566 - Long; Maolin ; et al. | 2017-04-06 |
Systems and methods for reverse pulsing
Grant 9,583,357 - Long , et al. February 28, 2 | 2017-02-28 |
Systems And Methods For Reverse Pulsing
App 20170040174 - Long; Maolin ; et al. | 2017-02-09 |
Systems And Methods For Reverse Pulsing
App 20170040176 - Long; Maolin ; et al. | 2017-02-09 |
Large Dynamic Range Rf Voltage Sensor And Method For Voltage Mode Rf Bias Application Of Plasma Processing Systems
App 20160358755 - Long; Maolin ; et al. | 2016-12-08 |
Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers
Grant 9,515,633 - Long , et al. December 6, 2 | 2016-12-06 |
Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coil
Grant 9,490,106 - Drewery , et al. November 8, 2 | 2016-11-08 |
Systems And Methods For Reversing Rf Current Polarity At One Output Of A Multpile Output Rf Matching Network
App 20160293382 - Sato; Arthur H. ; et al. | 2016-10-06 |
Plasma Processing Systems Including Side Coils And Methods Related To The Plasma Processing Systems
App 20160225584 - LONG; Maolin ; et al. | 2016-08-04 |
Hammerhead TCP coil support for high RF power conductor etch systems
Grant 9,384,948 - Long , et al. July 5, 2 | 2016-07-05 |
Faraday Shield Having Plasma Density Decoupling Structure Between TCP Coil Zones
App 20160163569 - Long; Maolin ; et al. | 2016-06-09 |
Plasma processing systems including side coils and methods related to the plasma processing systems
Grant 9,336,996 - Long , et al. May 10, 2 | 2016-05-10 |
Adjusting current ratios in inductively coupled plasma processing systems
Grant 9,305,750 - Long , et al. April 5, 2 | 2016-04-05 |
Tcct Match Circuit For Plasma Etch Chambers
App 20150235810 - Long; Maolin ; et al. | 2015-08-20 |
TCCT match circuit for plasma etch chambers
Grant 9,059,678 - Long , et al. June 16, 2 | 2015-06-16 |
Hammerhead TCP Coil Support for High RF Power Conductor Etch Systems
App 20140367045 - Long; Maolin ; et al. | 2014-12-18 |
Radio frequency (RF) power filters and plasma processing systems including RF power filters
Grant 8,742,666 - Long , et al. June 3, 2 | 2014-06-03 |
Current control in plasma processing systems
Grant 8,736,175 - Long , et al. May 27, 2 | 2014-05-27 |
Faraday Shield Having Plasma Density Decoupling Structure Between TCP Coil Zones
App 20130186568 - Long; Maolin ; et al. | 2013-07-25 |
Tcct Match Circuit For Plasma Etch Chambers
App 20130135058 - Long; Maolin ; et al. | 2013-05-30 |
Powered Grid For Plasma Chamber
App 20120322270 - Long; Maolin ; et al. | 2012-12-20 |
Internal Faraday Shield Having Distributed Chevron Patterns and Correlated Positioning Relative to External Inner and Outer TCP Coil
App 20120273130 - Drewery; John ; et al. | 2012-11-01 |
Plasma Processing Systems Including Side Coils And Methods Related To The Plasma Processing Systems
App 20120217222 - Long; Maolin ; et al. | 2012-08-30 |
Radio Frequency (rf) Power Filters And Plasma Processing Systems Including Rf Power Filters
App 20120032756 - LONG; Maolin ; et al. | 2012-02-09 |
Current Control In Plasma Processing Systems
App 20110115379 - Long; Maolin ; et al. | 2011-05-19 |
Adjusting Current Ratios In Inductively Coupled Plasma Processing Systems
App 20100314048 - Long; Maolin ; et al. | 2010-12-16 |
Base-band digital pre-distortion-based method for improving efficiency of RF power amplifier
Grant 7,782,979 - Long August 24, 2 | 2010-08-24 |
Side RF coil and side heater for plasma processing apparatus
Grant 7,776,156 - Long , et al. August 17, 2 | 2010-08-17 |
Gas temperature control for a plasma process
Grant 7,531,061 - Long May 12, 2 | 2009-05-12 |
Plasma chamber wall segment temperature control
App 20070131650 - Mitrovic; AndrejS ; et al. | 2007-06-14 |
Plasma chamber wall segment temperature control
App 20070114206 - Mitrovic; Andrej S. ; et al. | 2007-05-24 |
Plasma chamber wall segment temperature control
App 20070113976 - Mitrovic; Andrej S. ; et al. | 2007-05-24 |
Base-band digital pre-distortion-based method for improving efficiency of rf power amplifier
App 20070075770 - Long; Maolin | 2007-04-05 |
Plasma chamber wall segment temperature control
Grant 7,186,313 - Mitrovic , et al. March 6, 2 | 2007-03-06 |
Measuring plasma uniformity in-situ at wafer level
Grant 7,091,503 - Johnson , et al. August 15, 2 | 2006-08-15 |
Side RF coil and side heater for plasma processing apparatus
App 20060174834 - Long; Maolin ; et al. | 2006-08-10 |
Magnetic-field concentration in inductively coupled plasma reactors
App 20060075967 - Lu; Siqing ; et al. | 2006-04-13 |
Adjustable segmented electrode apparatus and method
Grant 6,916,401 - Long July 12, 2 | 2005-07-12 |
Gas temperature control for a plasma process
App 20050028736 - Long, Maolin | 2005-02-10 |
Gas temperature control for a plasma process
Grant 6,811,651 - Long November 2, 2 | 2004-11-02 |
Measuring plasma uniformity in-situ at wafer level
App 20040021094 - Johnson, Wayne L ; et al. | 2004-02-05 |
Wafer bias drive for plasma source
App 20040018127 - Long, Maolin ; et al. | 2004-01-29 |
Adjustable segmented electrode apparatus and method
App 20030103877 - Long, Maolin | 2003-06-05 |
Gas temperature control for a plasma process
App 20030084848 - Long, Maolin | 2003-05-08 |
Multi-zone RF electrode for field/plasma uniformity control in capacitive plasma sources
App 20030079983 - Long, Maolin ; et al. | 2003-05-01 |
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