Lomtscher; Patrick
Patent Applications and Registrations
Patent applications and USPTO patent grants for Lomtscher; Patrick.The latest application filed is for "wafer exposure method using wafer models and wafer fabrication assembly".
- Lomtscher; Patrick - Dresden DE
- Lomtscher; Patrick - Tiefenbach OT Marbach DE
| Patent | Date |
|---|---|
| Wafer exposure method using wafer models and wafer fabrication assembly Grant 11,092,901 - Buhl , et al. August 17, 2 | 2021-08-17 |
| Wafer Exposure Method Using Wafer Models and Wafer Fabrication Assembly App 20210191272 - Buhl; Stefan ; et al. | 2021-06-24 |
| Methods and Apparatus of Manufacturing a Semiconductor Device App 20090168034 - Staecker; Jens ; et al. | 2009-07-02 |
| Optimizing light path uniformity in inspection systems Grant 7,248,351 - Roberts , et al. July 24, 2 | 2007-07-24 |
| Optimizing focal plane fitting functions for an image field on a substrate App 20060192943 - Roberts; William ; et al. | 2006-08-31 |
| Optimizing light path uniformity in inspection systems App 20060192947 - Roberts; William ; et al. | 2006-08-31 |
| System for analyzing images of blazed phase grating samples App 20060193531 - Roberts; William ; et al. | 2006-08-31 |
| Run to run control for lens aberrations App 20060194130 - Roberts; William ; et al. | 2006-08-31 |
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