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name:-0.0075349807739258
name:-0.0085780620574951
name:-0.00045394897460938
Lohokare; Shrikant P. Patent Filings

Lohokare; Shrikant P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lohokare; Shrikant P..The latest application filed is for "system and method for stress free conductor removal".

Company Profile
0.10.9
  • Lohokare; Shrikant P. - Fremont CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
System, method and apparatus for self-cleaning dry etch
Grant 8,211,238 - Bailey, III , et al. July 3, 2
2012-07-03
Method for stress free conductor removal
Grant 8,017,516 - Bailey, III , et al. September 13, 2
2011-09-13
Methods and arrangement for the reduction of byproduct deposition in a plasma processing system
Grant 7,959,984 - Lohokare , et al. June 14, 2
2011-06-14
Method for adjusting voltage on a powered Faraday shield
Grant 7,413,673 - Lohokare , et al. August 19, 2
2008-08-19
System and method for stress free conductor removal
App 20070190771 - Bailey; Andrew D. III ;   et al.
2007-08-16
System and method for surface reduction, passivation, corrosion prevention and activation of copper surface
Grant 7,232,766 - Bailey, III , et al. June 19, 2
2007-06-19
System and method for stress free conductor removal
Grant 7,217,649 - Bailey, III , et al. May 15, 2
2007-05-15
System, method and apparatus for self-cleaning dry etch
Grant 7,140,374 - Bailey, III , et al. November 28, 2
2006-11-28
Methods and systems for a stress-free cleaning a surface of a substrate
Grant 7,129,167 - Bailey, III , et al. October 31, 2
2006-10-31
System, method and apparatus for self-cleaning dry etch
App 20060219267 - Bailey; Andrew D. III ;   et al.
2006-10-05
Methods and arrangement for the reduction of byproduct deposition in a plasma processing system
App 20060130758 - Lohokare; Shrikant P. ;   et al.
2006-06-22
Method for adjusting voltage on a powered faraday shield
App 20050194355 - Lohokare, Shrikant P. ;   et al.
2005-09-08
System, method and apparatus for improved global dual-damascene planarization
Grant 6,939,796 - Lohokare , et al. September 6, 2
2005-09-06
System and method for stress free conductor removal
App 20050106848 - Bailey, Andrew D. III ;   et al.
2005-05-19
System, method and apparatus for self-cleaning dry etch
App 20050093012 - Bailey, Andrew D. III ;   et al.
2005-05-05
System and method for surface reduction, passivation, corrosion prevention and activation of copper surface
App 20050087759 - Bailey, Andrew D. III ;   et al.
2005-04-28
System, method and apparatus for improved global dual-damascene planarization
App 20040248408 - Lohokare, Shrikant P. ;   et al.
2004-12-09
System, method and apparatus for improved local dual-damascene planarization
Grant 6,821,899 - Lohokare , et al. November 23, 2
2004-11-23
System, method and apparatus for improved local dual-damascene planarization
App 20040180545 - Lohokare, Shrikant P. ;   et al.
2004-09-16

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