loadpatents
name:-0.0005028247833252
name:-0.022218942642212
name:-0.00046992301940918
Logan; Joseph S. Patent Filings

Logan; Joseph S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Logan; Joseph S..The latest application filed is for "guard ring electrostatic chuck".

Company Profile
0.21.0
  • Logan; Joseph S. - Jamestown RI
  • Logan; Joseph S. - Poughkeepsie NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Guard ring electrostatic chuck
Grant RE37,580 - Barnes , et al. March 12, 2
2002-03-12
Guard ring electrostatic chuck
Grant 5,612,851 - Barnes , et al. March 18, 1
1997-03-18
Electrostatic chuck with reference electrode
Grant 5,561,585 - Barnes , et al. October 1, 1
1996-10-01
Method of making electrostatic chuck with oxide insulator
Grant 5,535,507 - Barnes , et al. July 16, 1
1996-07-16
Electrostatic chuck with reference electrode
Grant 5,467,249 - Barnes , et al. November 14, 1
1995-11-14
Guard ring electrostatic chuck
Grant 5,463,525 - Barnes , et al. October 31, 1
1995-10-31
Method and apparatus for filing high aspect patterns with metal
Grant 5,302,266 - Grabarz , et al. April 12, 1
1994-04-12
Scanned electron cyclotron resonance plasma source
Grant 5,208,512 - Forster , et al. May 4, 1
1993-05-04
Ceramic electrostatic chuck
Grant 5,191,506 - Logan , et al. March 2, 1
1993-03-02
Temperature cycling ceramic electrostatic chuck
Grant 5,155,652 - Logan , et al. October 13, 1
1992-10-13
Method for fabricating a split-ring electrostatic chuck
Grant 5,099,571 - Logan , et al. March 31, 1
1992-03-31
Electrostatic chuck having tapered electrodes
Grant 5,055,964 - Logan , et al. October 8, 1
1991-10-08
Low contamination RF sputter deposition apparatus
Grant 4,818,359 - Jones , et al. April 4, 1
1989-04-04
Hollow cathode enhanced plasma for high rate reactive ion etching and deposition
Grant 4,637,853 - Bumble , et al. January 20, 1
1987-01-20
Planar multi-level metal process with built-in etch stop
Grant 4,447,824 - Logan , et al. May 8, 1
1984-05-08
Planar multi-level metal process with built-in etch stop
Grant 4,367,119 - Logan , et al. January 4, 1
1983-01-04
Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
Grant 4,362,611 - Logan , et al. December 7, 1
1982-12-07
Omission of thick Si.sub.3 N.sub.4 layers in ISA schemes
Grant 4,333,794 - Beyer , et al. June 8, 1
1982-06-08
Reactive ion etching of aluminum
Grant 3,994,793 - Harvilchuck , et al. November 30, 1
1976-11-30
Method For Sputtering A Film On An Irregular Surface
Grant 3,755,123 - Davidse , et al. August 28, 1
1973-08-28
Rf Sputtering Method And Apparatus For Producing Insulating Films Of Varied Physical Properties
Grant 3,617,459 - Logan November 2, 1
1971-11-02

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