| Patent | Date |
|---|
Multi-core transformer plasma source
Grant 7,363,876 - Lai , et al. April 29, 2 | 2008-04-29 |
Methods for the optimization of substrate etching in a plasma processing system
Grant 7,078,350 - Kim , et al. July 18, 2 | 2006-07-18 |
Methods and apparatus for inspecting contact openings in a plasma processing system
Grant 6,979,579 - Kim , et al. December 27, 2 | 2005-12-27 |
Methods and apparatus for the optimization of photo resist etching in a plasma processing system
Grant 6,949,469 - Cheng , et al. September 27, 2 | 2005-09-27 |
Methods for the optimization of substrate etching in a plasma processing system
App 20050205519 - Kim, Jisoo ; et al. | 2005-09-22 |
Multi-core transformer plasma source
App 20040226512 - Lai, Canfeng ; et al. | 2004-11-18 |
Multi-core transformer plasma source
App 20040226658 - Lai, Canfeng ; et al. | 2004-11-18 |
Multi-core transformer plasma source
App 20040226511 - Lai, Canfeng ; et al. | 2004-11-18 |
Multi-core transformer plasma source
App 20040182517 - Lai, Canfeng ; et al. | 2004-09-23 |
Multi-core transformer plasma source
App 20040185610 - Lai, Canfeng ; et al. | 2004-09-23 |
Multi-core transformer plasma source
Grant 6,755,150 - Lai , et al. June 29, 2 | 2004-06-29 |
Shaping a plasma with a magnetic field to control etch rate uniformity
Grant 6,673,199 - Yamartino , et al. January 6, 2 | 2004-01-06 |
Multi-core transformer plasma source
App 20030085205 - Lai, Canfeng ; et al. | 2003-05-08 |
Plasma energy control by inducing plasma instability
Grant 6,558,564 - Loewenhardt , et al. May 6, 2 | 2003-05-06 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma
Grant 6,402,885 - Loewenhardt , et al. June 11, 2 | 2002-06-11 |
Capacitive probe for in situ measurement of wafer DC bias voltage
Grant 6,356,097 - Loewenhardt , et al. March 12, 2 | 2002-03-12 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma
App 20010004920 - Loewenhardt, Peter K. ; et al. | 2001-06-28 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
Grant 6,248,250 - Hanawa , et al. June 19, 2 | 2001-06-19 |
Plasma reactor having a helicon wave high density plasma source
Grant 6,189,484 - Yin , et al. February 20, 2 | 2001-02-20 |
Magnetically confined plasma reactor for processing a semiconductor wafer
Grant 6,030,486 - Loewenhardt , et al. February 29, 2 | 2000-02-29 |
Lift pin for dechucking substrates
Grant 5,900,062 - Loewenhardt , et al. May 4, 1 | 1999-05-04 |
Plasma uniformity control for an inductive plasma source
Grant 5,897,712 - Hanawa , et al. April 27, 1 | 1999-04-27 |
Plasma process for etching multicomponent alloys
Grant 5,779,926 - Ma , et al. July 14, 1 | 1998-07-14 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
Grant 5,777,289 - Hanawa , et al. July 7, 1 | 1998-07-07 |
Composite diagnostic wafer for semiconductor wafer processing systems
Grant 5,451,784 - Loewenhardt , et al. September 19, 1 | 1995-09-19 |
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