Loeffler; Daniel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Loeffler; Daniel.The latest application filed is for "composition, its use and a process for selectively etching silicon-germanium material".

Company Profile

12.7.17

Loeffler; Daniel - Ludwigshafen DE
LOEFFLER; Daniel - Ludwigshafen am Rhein DE
- Ludwigshafen DE
Loeffler; Daniel - Birkenheide DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition, Its Use And A Process For Selectively Etching Silicon-germanium Material App 20220290050 - Lopez Villanueva; Francisco Javier ; et al.	2022-09-15
Composition For Avoiding Pattern Collapse When Treating Patterned Materials With Line-space Dimensions Of 50 Nm Or Below Comprising A Boron-type Additive App 20220187712 - Csihony; Szilard ; et al.	2022-06-16
Composition Comprising An Ammonia-activated Siloxane For Avoiding Pattern Collapse When Treating Patterned Materials With Line-space Dimensions Of 50 Nm Or Below App 20220169956 - Kao; Chi Yueh ; et al.	2022-06-02
Epoxy Resin Composition App 20210395513 - LINDNER; Jean-Pierre Berkan ; et al.	2021-12-23
Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below Grant 11,180,719 - Loeffler , et al. November 23, 2	2021-11-23
Use Of Compositions Comprising A Solvent Mixture For Avoiding Pattern Collapse When Treating Patterned Materials With Line-space Dimensions Of 50 Nm Or Below App 20210198602 - BRILL; Marcel ; et al.	2021-07-01
Process for the generation of thin inorganic films Grant 10,801,105 - Adermann , et al. October 13, 2	2020-10-13
Process for the generation of thin inorganic films Grant 10,787,738 - Abels , et al. September 29, 2	2020-09-29
Use Of Compositions Comprising A Siloxane-type Additive For Avoiding Pattern Collapse When Treating Patterned Materials With Line-space Dimensions Of 50 Nm Or Below App 20200255772A1 -	2020-08-13
Process for the generation of thin inorganic films Grant 10,669,297 - Adermann , et al.	2020-06-02
Process for the generation of metallic films Grant 10,570,514 - Abels , et al. Feb	2020-02-25
Process For Coating An Oxide Material App 20190393494 - KLEINE JAEGER; Frank ; et al.	2019-12-26
Process For The Generation Of Metal-containing Films App 20190360096 - SCHWEINFURTH; David Dominique ; et al.	2019-11-28
Process For The Generation Of Thin Inorganic Films App 20190248821 - LIMBURG; Carolin ; et al.	2019-08-15
Process for the generation of thin inorganic films Grant 10,344,381 - Strautmann , et al. July 9, 2	2019-07-09
Process For The Generation Of Thin Inorganic Films App 20190144999 - LIMBURG; Carolin ; et al.	2019-05-16
Process For The Generation Of Metallic Films App 20190144998 - ABELS; Falko ; et al.	2019-05-16
Process For The Generation Of Thin Inorganic Films App 20190003049 - ABELS; Falko ; et al.	2019-01-03
Process For The Generation Of Thin Inorganic Films App 20180346501 - ADERMANN; Torben ; et al.	2018-12-06
Process For The Generation Of Thin Inorganic Films App 20180320265 - ADERMANN; Torben ; et al.	2018-11-08
Process for the generation of thin inorganic films Grant 10,106,888 - Strautmann , et al. October 23, 2	2018-10-23
Process For The Generation Of Thin Inorganic Films App 20180044357 - SPIELMANN; Jan ; et al.	2018-02-15
Process For The Generation Of Thin Inorganic Films App 20170233865 - STRAUTMANN; Julia ; et al.	2017-08-17
Process For The Generation Of Thin Inorganic Films App 20170175267 - STRAUTMANN; Julia ; et al.	2017-06-22
Process For The Generation Of Thin Inorganic Films App 20160348243 - XU; Ke ; et al.	2016-12-01

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